Reflection-transmission type liquid crystal display device and method for manufacturing the same

• US 7,023,508 B2
• Filed: 08/14/2002
• Issued: 04/04/2006
• Est. Priority Date: 11/02/2001
• Status: Active Grant

• Current Assignee: Samsung Display Company Limited (Samsung Electronics Co. Ltd.)
• Original Assignee: Samsung Electronics Co. Ltd.
• Inventors: You, Chun-Gi
• Primary Examiner(s): NGO, HUYEN LE
• Application Number:
  US10/218,549
• Publication Number:
  US 20030086046A1
• Time in Patent Office: 1,329 Days
• Field of Search: 349/103, 349/42, 349/114, 349/113, 257/59, 345/92
• US Class Current: 349/113
• CPC Class Codes: G02F 1/133388 with constructional differences between the display region and the peripheral region
• CPC Class Codes: G02F 1/133555 Transflectors
• CPC Class Codes: G02F 1/1345 Conductors connecting electrodes to cell terminals
• CPC Class Codes: G02F 1/13454 Drivers integrated on the active matrix substrate G02F1/136277 takes precedence
• CPC Class Codes: G02F 1/13458 Terminal pads
• CPC Class Codes: G02F 1/136213 Storage capacitors associated with the pixel electrode
• CPC Class Codes: G02F 1/136227 Through-hole connection of the pixel electrode to the active element through an insulation layer
• CPC Class Codes: G02F 1/136236 using a grey or half tone lithographic process
• CPC Class Codes: G02F 1/13685 Top gates
• CPC Class Codes: H01L 27/1248 with a particular composition or shape of the interlayer dielectric specially adapted to the circuit arrangement

Abstract

A liquid crystal display device includes a substrate having a display region on which thin film transistors are formed and a pad region located in a periphery of the display region. The display region has a transparent electrode, the pad region has a pad electrode, and the transparent electrode and the pad electrode formed from a same layer. A barrier metal layer pattern is formed on the transparent electrode, and a reflective electrode is formed on the barrier metal layer. The reflective electrode has a transmission window for exposing a portion of the transparent electrode, wherein the barrier metal layer is comprised of material having an etching rate that is similar to an etching rate of the reflective electrode.

Claims

1. A liquid crystal display device comprising:

a substrate having a display region on which thin film transistors are formed, a pad region located in a periphery of the display region, and a passivation layer having an inorganic passivation layer and an organic passivation layer stacked on the inorganic passivation layer, the organic passivation layer formed on the display region excluding the pad region, the display region having a transparent electrode, the pad region having a pad electrode, the transparent electrode and the pad electrode formed from a same layer;

a barrier metal layer pattern formed on the transparent electrode; and

a reflective electrode formed on the barrier metal layer pattern, the reflective electrode having a transmission window for exposing a portion of the transparent electrode, wherein the barrier metal layer pattern is comprised of material having an etching rate that is similar to an etching rate of the reflective electrode.

2. The liquid crystal display device as claimed in claim 1, wherein the barrier metal layer pattern has substantially the same shape as the reflective electrode.

3. The liquid crystal display device as claimed in claim 1, wherein the transparent electrode is comprised of indium tin oxide (ITO), the reflective electrode is comprised of aluminum-neodymium (Al—

Nd), and the barrier metal layer pattern is comprised of molybdenum-tungsten (Mo—

W).

4. The liquid crystal display device as claimed in claim 1, wherein each of the thin film transistors is an amorphous silicon type thin film transistor.

5. The liquid crystal display device as claimed in claim 1, wherein each of the thin film transistors is a polysilicon type thin film transistor.

6. The liquid crystal display device of claim 1, wherein the barrier metal layer pattern is formed only on the transparent electrode.

7. The liquid crystal display device of claim 1, wherein the barrier metal layer pattern is spaced apart from the thin film transistor and the passivation layer by the transparent electrode.

8. The liquid crystal display device of claim 1, wherein the organic passivation layer comprises a photosensitive organic material.

9. A liquid crystal display device comprising:

a substrate having a display region and a pad region located in a periphery of the display region;

a thin film transistor formed on the substrate of the display region, the thin film transistor including a gate electrode, first and second electrodes and an active pattern;

a passivation layer formed on the thin film transistor and the substrate and having a hole exposing the second electrode, the passivation layer having an inorganic passivation layer and an organic passivation layer stacked on the inorganic passivation layer, the organic passivation layer being formed on the display region excluding the pad region;

a transparent electrode formed on the passivation layer of the display region;

a pad electrode formed on the passivation layer of the pad region, the pad electrode being formed from a same layer of the transparent electrode;

a barrier metal layer pattern formed on the transparent electrode; and

a reflective electrode formed on the barrier metal layer pattern such that the reflective electrode has a same shape as that of the barrier metal layer pattern, wherein the barrier metal layer pattern is comprised of material having an etching rate that is similar to an etching rate of the reflective electrode.

10. The liquid crystal display device as claimed in claim 9, wherein the transparent electrode is formed on the hole and the passivation layer so as to be connected to the second electrode through the hole.

11. The liquid crystal display device of claim 9, wherein the barrier metal layer pattern is formed only on the transparent electrode.

12. The liquid crystal display device of claim 9, wherein the transparent electrode is comprised of indium tin oxide (ITO), the reflective electrode is comprised of aluminum-neodymium (Al—

Nd), and the barrier metal layer pattern is comprised of molybdenum-tungsten (Mo—

W).

13. The liquid crystal display device of claim 9, wherein the barrier metal layer pattern is spaced apart from the second electrode and the organic passivation layer by the transparent electrode.

14. The liquid crystal display device of claim 9, wherein the organic passivation layer comprises a photosensitive organic material.