Method and device for photo-electrochemically etching a semiconductor sample, especially gallium nitride
First Claim
1. A method for photo-electrochemically etching a semiconductor sample, comprising the steps of:
- bringing a semiconductor sample in contact with an electrolyte liquid, thereby forming a contact area,irradiating the contact area of the semiconductor sample repeatedly through the electrolyte liquid with UV light irradiation for a predetermined time, whereby a waiting time is generated between each of said UV light irradiations, thereby generating a photo current during each of said UV light irradiations,measuring the photo current, andrepeatedly subjecting the contact area to a jet of fresh electrolyte liquid, wherein said jet of fresh electrolyte liquid is applied to said contact area in said waiting time between two of said UV light irradiations.
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Abstract
In a method for photo-electrochemical etching of a semiconductor sample, the semiconductor sample is brought in contact with an electrolyte liquid. The contact area formed thereby is illuminated through the electrolyte liquid with UV light. The photo-current created by UV light irradiation at the contact area is measured. To increase the etching quality, a jet of fresh electrolyte liquid is repeatedly applied to the contact area. A device for carrying out the method includes a container to be filled with an electrolyte liquid, a UV source for illuminating the semiconductor sample with UV light through the electrolyte liquid, and a measuring instrument for measuring the photo-current created during UV light irradiation of the contact area. Further provided are an inlet for supplying fresh electrolyte liquid, directed towards the semiconductor sample, and a device attached to the inlet for repeated production of electrolyte fluid jets, directed towards the semiconductor sample.
9 Citations
12 Claims
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1. A method for photo-electrochemically etching a semiconductor sample, comprising the steps of:
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bringing a semiconductor sample in contact with an electrolyte liquid, thereby forming a contact area, irradiating the contact area of the semiconductor sample repeatedly through the electrolyte liquid with UV light irradiation for a predetermined time, whereby a waiting time is generated between each of said UV light irradiations, thereby generating a photo current during each of said UV light irradiations, measuring the photo current, and repeatedly subjecting the contact area to a jet of fresh electrolyte liquid, wherein said jet of fresh electrolyte liquid is applied to said contact area in said waiting time between two of said UV light irradiations. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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Specification