Microstructures comprising a dielectric layer and a thin conductive layer
First Claim
Patent Images
1. A micromachined apparatus comprising:
- a substrate; and
a released microstructure disposed on the substrate, comprising;
a dielectric layer, anda conductive polysilicon layer attached to the dielectric layer, wherein the polysilicon layer has a thickness less than ⅕
the dielectric layer thickness.
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Abstract
Surface micromachined structures having a relatively thick dielectric layer and a relatively thin conductive layer bonded together.
50 Citations
20 Claims
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1. A micromachined apparatus comprising:
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a substrate; and a released microstructure disposed on the substrate, comprising; a dielectric layer, and a conductive polysilicon layer attached to the dielectric layer, wherein the polysilicon layer has a thickness less than ⅕
the dielectric layer thickness. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A micromachined apparatus comprising:
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a substrate; and a released microstructure disposed on the substrate, comprising; a dielectric layer, and a conductive layer attached to the dielectric layer, wherein the conductive layer has a thickness less than ⅕
the dielectric layer thickness, and wherein the conductive layer is disposed between the substrate and the dielectric layer,wherein the released microstructure is electrically deflectable with respect to the substrate. - View Dependent Claims (12, 17, 18, 19)
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13. A micromachined apparatus comprising:
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a substrate; and a released microstructure disposed on the substrate, comprising; a dielectric layer, and a conductive layer attached to the dielectric layer, wherein the conductive layer has a thickness less than ⅕
the dielectric layer thickness, and wherein the conductive layer is enclosed within the dielectric layer,wherein the released microstructure is electrically deflectable with respect to the substrate.
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14. A micromachined apparatus comprising:
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a substrate; and a released microstructure disposed on the substrate, comprising; a dielectric layer, a first conductive layer attached to the dielectric layer, wherein the conductive layer has a thickness less than ⅕
the dielectric layer thickness, anda second conductive layer attached to the dielectric layer, and wherein the dielectric layer is sandwiched between the conductive layers, wherein the released microstructure is electrically deflectable with respect to the substrate. - View Dependent Claims (15)
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16. A micromachined apparatus comprising:
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a substrate; and a released microstructure disposed on the substrate, comprising; a dielectric layer comprising a via hole, and a conductive layer attached to the dielectric layer, wherein the conductive layer has a thickness less than ⅕
the dielectric layer thickness,wherein the released microstructure is electrically deflectable with respect to the substrate.
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20. A micromachined apparatus comprising:
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a substrate; and a released microstructure disposed on the substrate, comprising; a silicon carbide dielectric layer, and a conductive layer attached to the dielectric layer, wherein the conductive layer has a thickness less than ⅕
the dielectric layer thickness, and wherein the conductive layer is disposed between the substrate and the dielectric layer,wherein the released microstructure is electrically deflectable with respect to the substrate.
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Specification