Methods and systems for precisely relatively positioning a waist of a pulsed laser beam and method and system for controlling energy delivered to a target structure
First Claim
1. A method for precisely relatively positioning a waist of a pulsed laser material processing beam to compensate for microscopic positional variations of predetermined target material to be laser processed, the target material being supported on a semiconductor substrate, the method comprising:
- obtaining three-dimensional information at a plurality of predetermined locations about the target material, the locations being a combination of at least one predetermined location at which an alignment target is formed and at least one other predetermined location at which an alignment target is not formed and which is suitable for an optical measurement;
predicting the location of the target material relative to a laser beam waist position based on the three-dimensional information including three-dimensional information obtained at the at least one other predetermined location to obtain a three-dimensional location prediction;
inducing motion of the target material relative to a laser beam waist position based on the prediction;
generating a laser beam including at least one pulse; and
irradiating the at least one pulse into a spot on the target material to process the target material.
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Accused Products
Abstract
A method and system for locally processing a predetermined microstructure formed on a substrate without causing undesirable changes in electrical or physical characteristics of the substrate or other structures formed on the substrate are provided. The method includes providing information based on a model of laser pulse interactions with the predetermined microstructure, the substrate and the other structures. At least one characteristic of at least one pulse is determined based on the information. A pulsed laser beam is generated including the at least one pulse. The method further includes irradiating the at least one pulse having the at least one determined characteristic into a spot on the predetermined microstructure. The at least one determined characteristic and other characteristics of the at least one pulse are sufficient to locally process the predetermined microstructure without causing the undesirable changes.
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Citations
28 Claims
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1. A method for precisely relatively positioning a waist of a pulsed laser material processing beam to compensate for microscopic positional variations of predetermined target material to be laser processed, the target material being supported on a semiconductor substrate, the method comprising:
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obtaining three-dimensional information at a plurality of predetermined locations about the target material, the locations being a combination of at least one predetermined location at which an alignment target is formed and at least one other predetermined location at which an alignment target is not formed and which is suitable for an optical measurement;
predicting the location of the target material relative to a laser beam waist position based on the three-dimensional information including three-dimensional information obtained at the at least one other predetermined location to obtain a three-dimensional location prediction;
inducing motion of the target material relative to a laser beam waist position based on the prediction;
generating a laser beam including at least one pulse; and
irradiating the at least one pulse into a spot on the target material to process the target material. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A system for precisely relatively positioning a waist of a pulsed laser, material processing beam to compensate for microscopic positional variations of predetermined target material to be laser processed, the target material being supported on a semiconductor substrate, the system comprising:
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means for obtaining three-dimensional information at a plurality of predetermined locations about the target material, the locations being a combination of at least one predetermined location at which an alignment target is formed and at least one other predetermined location at which an alignment target is not formed and which is suitable for an optical measurement;
means for predicting the location of the target material relative to a laser beam waist position based on the three-dimensional information to obtain a three-dimensional location prediction;
means for inducing motion of the target material relative to a laser beam waist position based on the prediction;
means for generating a laser beam including at least one pulse; and
means for irradiating the at least one pulse into a spot on the target material to process the target material. - View Dependent Claims (16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28)
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Specification