Deflectable spacer for use as an interspinous process implant and method
First Claim
Patent Images
1. An implant adapted to be placed between spinous processes comprising:
- a body having a shaft extending therefrom;
a spacer that is rotatably mounted on the shaft;
wherein said spacer is comprised of a deflectable material; and
wherein said spacer is comprised of;
an inner spacer that is rotatably mounted about the shaft and an outer spacer that is mounted on said inner spacer.
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Accused Products
Abstract
The present invention is a interspinous process device with a deflectable spacer which can be placed between adjacent spinous processes to limit the movement of the vertebrae. The device limits the range of motion of the spinous processes.
315 Citations
49 Claims
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1. An implant adapted to be placed between spinous processes comprising:
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a body having a shaft extending therefrom;
a spacer that is rotatably mounted on the shaft;
wherein said spacer is comprised of a deflectable material; and
wherein said spacer is comprised of;
an inner spacer that is rotatably mounted about the shaft and an outer spacer that is mounted on said inner spacer. - View Dependent Claims (2, 3, 4, 5, 6)
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7. An implant adapted to be placed between spinous processes comprising:
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a body having a shaft extending therefrom;
a spacer that is rotatably mounted on the shaft;
wherein said spacer is comprised of a deflectable material; and
wherein said spacer is comprised of an inner spacer that is rotatably mounted about the shaft; and
an outer spacer that is movably mounted relative to said inner spacer. - View Dependent Claims (8)
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9. An implant adapted to be placed between spinous processes comprising:
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a body having a shaft extending therefrom;
a spacer that is rotatably mounted on the shaft;
wherein said spacer is comprised of a deflectable material; and
wherein said spacer is comprised of;
an inner spacer that is rotatably mounted about the shaft; and
an outer spacer that is mounted on said inner spacer; and
at least one of said inner spacer and said outer spacer is comprised of one of the group consisting of polyetheretherketone and polyetherketoneketone.
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10. An implant adapted to be placed between spinous processes comprising:
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a body having a shaft extending therefrom;
a spacer that is rotatably mounted on the shaft; and
wherein said spacer is comprised of;
an inner spacer that is rotatably mounted about the shaft; and
an outer spacer that is mounted on said inner spacer. - View Dependent Claims (11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40)
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41. A spacer for use with an interspinous implant comprising:
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an inner spacer adapted to be rotatably mounted on a shaft of the implant; and
an outer spacer mounted on the inner spacer;
wherein the outer spacer is movable mounted over the inner spacer.
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42. An implant adapted to be placed between spinous processes comprising;
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a body having a shaft extending therefrom;
a spacer that is mounted on the shaft; and
wherein said spacer is comprised of;
an inner spacer that is mounted on said shaft; and
an outer spacer that is mounted on said inner spacer;
wherein at least one of said inner spacer and said outer spacer is selected from the group consisting of polyetheretherketone and polyetherketoneketone.
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43. In an implant that is locatable between spinous processes, the improvement comprising:
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a spacer with an inner spacer that is rotabably mounted on a shaft of the implant; and
said spacer having an outer spacer mounted on the inner spacer;
wherein;
said inner spacer has flattened upper and lower portions and rounded first and second end, and said outer spacer has flattened upper and lower portions and rounded first and second ends.
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44. In an implant that is locatable between spinous processes, the improvement comprising:
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a spacer with an inner spacer that is rotabably mounted on a shaft of the implant; and
said spacer having an outer spacer mounted on the inner spacer;
wherein;
said inner spacer has flattened upper and lower portions; and
said outer spacer has flattened upper and lower portions; and
wherein said upper portion of said outer spacer is spaced from the upper portion of said inner spacer; and
wherein said lower portion of said outer spacer is spaced from the lower portion of said inner spacer; and
wherein said spacer is comprised of a material that is sufficiently deflectable so that said flattened upper and lower portion of said outer spacer can be urged into contact with the respective flattened upper and lower portions of said inner spacer within the implant placed between spinous processes of a human and with the human bending backwards.
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45. In an implant that is locatable between spinous processes, the improvement comprising:
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a spacer with an inner spacer that is rotabably mounted on a shaft of the implant; and
said spacer having an outer spacer mounted on the inner spacer;
wherein at least one of said inner spacer and said outer spacer is selected from the group consisting of polyetheretherketone and polyetherketoneketone.
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46. In an implant that is locatable between spinous processes, the improvement comprising:
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a spacer with an inner spacer that is rotabably mounted on a shaft of the implant; and
said spacer having an outer spacer mounted on the inner spacer;
wherein;
said inner spacer has upper and lower outer portions; and
said outer spacer has upper and lower inner portions; and
wherein said upper portion of said outer spacer are spaced from the lower portion of said inner spacer.
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47. A spacer for use with an interspinous implant comprising:
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an inner spacer adapted to be rotatably mounted on a shaft of the implant; and
an outer spacer mounted on the inner spacer;
wherein the spacer is translucent to x-rays.
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48. An implant adapted to be placed between spinous processes comprising:
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a body having a shaft extending therefrom;
a spacer that is mounted on the shaft; and
wherein said spacer is comprised of;
an inner spacer that is mounted on said shaft; and
an outer spacer that is mounted on said inner spacer;
wherein the spacer is radio-translucent.
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49. An implant adapted to be placed between spinous processes comprising:
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a body having a shaft extending therefrom;
a spacer that is mounted on the shaft; and
wherein said spacer is comprised of;
an inner spacer that is mounted on said shaft; and
an outer spacer that is mounted on said inner spacer;
wherein the spacer is transparent to x-rays.
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Specification