Cooling system for a semiconductor device and method of fabricating same
First Claim
1. A method of forming cooling elements in a semiconductor substrate, comprising:
- coating a backside of the semiconductor substrate with a first mask layer;
forming a plurality of trench patterns in the first mask layer;
etching the semiconductor substrate to form a plurality of trenches along the plurality of trench patterns;
depositing thermally conductive material in the plurality of trenches;
forming a first diffusion layer in the semiconductor substrate;
forming a second diffusion layer in the first diffusion layer; and
doping the second diffusion layer with a dopant having a polarity opposite a polarity of the semiconductor substrate.
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Accused Products
Abstract
A cooling system for a semiconductor substrate incudes a plurality of trenches formed from a backside of the semiconductor substrate, and thermally conductive material deposited in the plurality of trenches. A method of forming cooling elements in a semiconductor substrate, includes coating a backside of the semiconductor substrate with a first mask layer, forming a plurality of trench patterns in the first mask layer, etching the semiconductor substrate to form a plurality of trenches along the plurality of trench patterns, and depositing thermally conductive material in the plurality of trenches. Trenches constructed from the backside of a wafer improve efficiency of heat transfer from a front-side to the backside of an integrated-circuit chip. The fabrication of trenches from the backside of the wafer allows for increases in the depth and number of trenches, and provides a means to attach passive and active cooling devices directly to the backside of a wafer.
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Citations
35 Claims
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1. A method of forming cooling elements in a semiconductor substrate, comprising:
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coating a backside of the semiconductor substrate with a first mask layer; forming a plurality of trench patterns in the first mask layer; etching the semiconductor substrate to form a plurality of trenches along the plurality of trench patterns; depositing thermally conductive material in the plurality of trenches; forming a first diffusion layer in the semiconductor substrate; forming a second diffusion layer in the first diffusion layer; and doping the second diffusion layer with a dopant having a polarity opposite a polarity of the semiconductor substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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18. A method of forming an active cooling apparatus on a semiconductor substrate, comprising:
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coating the backside of a first semiconductor substrate with a mask layer; patterning the mask layer; etching a first continuous trench into the backside of the first semiconductor substrate; forming at least one opening in the first continuous trench for allowing coolant supplied from the active cooling apparatus to exit or enter the first continuous trench; and positioning the active cooling apparatus on the backside of the first semiconductor substrate. - View Dependent Claims (19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29)
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30. A method of forming cooling elements in a semiconductor substrate, comprising:
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etching the semiconductor substrate from a backside of the semiconductor substrate to form a plurality of trenches; depositing thermally conductive material in the plurality of trenches; forming a diffusion layer in the semiconductor substrate; and doping the diffusion layer with a dopant having a polarity opposite a polarity of the semiconductor substrate.
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31. A method of forming an active cooling apparatus on a semiconductor substrate, comprising:
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coating the backside of a semiconductor substrate with a mask layer; patterning the mask layer; etching a continuous trench into the backside of the semiconductor substrate; forming two openings in the continuous trench for respectively allowing coolant supplied from the active cooling apparatus to exit and enter the continuous trench; and positioning the active cooling apparatus on the backside of the semiconductor substrate. - View Dependent Claims (32, 33, 34)
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35. A method of forming an active cooling apparatus on a semiconductor substrate, comprising:
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etching a continuous trench having a plurality of channels into the backside of the semiconductor substrate; forming an opening in the continuous trench, wherein coolant supplied from the active cooling apparatus passes through the opening; and positioning the active cooling apparatus on the backside of the semiconductor substrate.
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Specification