Apparatus and method for fabricating arrays of atomic-scale contacts and gaps between electrodes and applications thereof
First Claim
1. A nanosensor, comprising:
- a first electrode; and
a second electrode, separated from the first electrode by a first gap, wherein a second gap was decreased to form the first gap by;
electrically coupling a resistor in series with the second electrode to form a circuit including the first electrode, the second electrode and the resistor;
applying a bias voltage across the circuit, the bias voltage having a magnitude sufficient to etch ions from the first electrode and deposit the etched ions onto the second electrode; and
maintaining the application of the bias voltage at least until the etching and deposition of the ions substantially ceases.
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Accused Products
Abstract
A method for forming atomic-scale contacts and atomic-scale gaps between two electrodes is disclosed. The method provides for applying a voltage between two electrodes in a circuit with a resistor. The applied voltage etches metal ions off one electrode and deposits the metal ions onto the second electrode. The metal ions are deposited on the sharpest point of the second electrode, causing the second electrode to grow towards the first electrode until an atomic-scale contact is formed. By increasing the magnitude of the resistor, the etching and deposition process will terminate prior to contact, forming an atomic-scale gap. The atomic-scale contacts and gaps formed according to this method are useful as a variety of nanosensors including chemical sensors, biosensors, hydrogen ion sensors, heavy metal ion sensors, magnetoresistive sensors, and molecular switches.
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Citations
16 Claims
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1. A nanosensor, comprising:
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a first electrode; and a second electrode, separated from the first electrode by a first gap, wherein a second gap was decreased to form the first gap by; electrically coupling a resistor in series with the second electrode to form a circuit including the first electrode, the second electrode and the resistor; applying a bias voltage across the circuit, the bias voltage having a magnitude sufficient to etch ions from the first electrode and deposit the etched ions onto the second electrode; and maintaining the application of the bias voltage at least until the etching and deposition of the ions substantially ceases. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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Specification