Characterizing aberrations in an imaging lens and applications to visual testing and integrated circuit mask analysis

• US 7,030,997 B2
• Filed: 09/10/2002
• Issued: 04/18/2006
• Est. Priority Date: 09/11/2001
• Status: Expired due to Fees

• Current Assignee: Regents of the University of California (University of California)
• Original Assignee: Regents of the University of California (University of California)
• Inventors: Neureuther, Andrew R., Gennari, Frank E., Adam, Kostas, Robins, Garth C.
• Primary Examiner(s): Toatley, Jr., Gregory J.
• Assistant Examiner(s): Merlino, Amanda
• Application Number:
  US10/241,242
• Publication Number:
  US 20030103189A1
• Time in Patent Office: 1,316 Days
• Field of Search: 356/124, 356515-516, 356/521
• US Class Current: 356/515
• CPC Class Codes: G01M 11/0264 by using targets or reference patterns
• CPC Class Codes: G03F 7/706 Aberration measurement

Abstract

Aberrations in a lens and lens system are identified by projecting an optical beam through a mask having an opening (probe) and a surrounding open geometry (pattern) and through the lens to an image plane. Lens aberrations are identified from the combined intensity of the beam in the image plane. In one embodiment the pattern is a plurality of rings concentric with the probe. Spillover between the probe and the geometry becomes intermixed in passing through the lens and alters the light intensity in the image plane. Vision of a patient can be tested by providing a plurality of probe openings and surrounding geometries that are illuminated. The patient then compares the images for brighter and darker probes as a measure of pupil aberrations. Areas in an integrated circuit mask layout impacted by aberrations in projection printing can be identified by sequentially comparing an aberration function to a mask layout, which can then be used to modify the mask layout.

Claims

1. A method of detecting aberrations in a lens comprising the steps of:

a) providing a mask having an opening probe and a surrounding open geometry pattern wherein the surrounding pattern corresponds to the inverse Fourier transform of an aberration representation,

b) projecting a beam through the mask and a lens to an image plane of the lens, and

c) identifying lens aberrations from the combined intensity of the beam passing through the probe and the surrounding pattern in the image plane without the need for Fourier analysis of the projection beam.

2. The method as defined by claim 1 wherein the beam is selected from the group consisting of optical, electromagnetic acoustic, surface wave, and particle.

3. The method as defined by claim 2 wherein the beam projecting through the mask is coherent through the surrounding pattern.

4. The method as defined by claim 1 wherein each surrounding pattern comprises a plurality of rings concentric with a probe.

5. The method as defined by claim 1 wherein the aberrations is selected from the consisting of coma, astigmatism, spherical and trifoil.

6. The method as defined by claim 1 wherein the aberrations include at least one term in a general mathematical representation.

7. The method as defined by claim 1 wherein step c) includes comparing an image intensity in the image plane with known intensity for an aberration.

8. The method as defined by claim 1 wherein the aberrations include at least one of coma, astigmatism, spherical, and trifoil or any term or combination of terms in a general representation.

9. The method as defined by claim 7 wherein a combined intensity pattern of the image includes spillover between the probe and the surrounding pattern which becomes intermixed in passing through the lens.

10. The method as defined by claim 9 wherein the beam comprises a collimated light beam.

11. The method as defined by claim 9 wherein the lens comprises a plurality of lenses in a lens system.

12. The method as defined by claim 9 wherein the surrounding pattern comprises a plurality of rings concentric with the probe.

13. The method as defined by claim 12 wherein the rings are modulated in phase in an azimuthal direction in accordance with the rotational order of a Zernike polynomial.

14. The method as defined by claim 1 wherein the lens comprises a plurality of lenses in a lens system.

15. The method as defined by claim 1 wherein step c) includes measuring the combined image intensity and comparing the measurements to an individual image of the probe and surrounding pattern without aberrations.

16. The method as defined by claim 15 wherein the aberrations include coma, astigmatism, spherical, and trifoil.

17. The method as defined by claim 15 wherein the aberrations include at least one term in a general mathematical representation.

18. The method as defined by claim 15 wherein a combined intensity pattern of the image includes spillover between the probe and the surrounding pattern which became intermixed in passing through the lens, the probe providing an interferometric reference.

19. The method as defined by claim 18 wherein the beam comprises a collimated light beam.

20. The method as defined by claim 18 wherein the lens comprises a plurality of lenses in a lens system.

21. The method as defined by claim 18 wherein the surrounding pattern comprises a plurality of rings concentric with the probe.

22. The method as defined by claim 15 wherein the measurements are obtained indirectly.

23. The method as defined by claim 22 wherein indirect measurements are taken from photoresist which is exposed to the probe and surrounding pattern.

24. The method as defined by claim 15 wherein the measurements are obtained directly from image intensity.

25. The method as defined by claim 15 wherein the surrounding pattern comprises a plurality of rings concentric with the probe.