Micromachined sensor with quadrature suppression
First Claim
1. A micromachined sensor with quadrature suppression comprising:
- a quadrature suppression electrode; and
a resonator mass positioned adjacent to the quadrature suppression electrode, the resonator mass capable of moving substantially parallel to the quadrature suppression electrode, the resonator mass including a notch formed adjacent to a portion of the quadrature suppression electrode such that a length of the resonator mass that is directly adjacent to the quadrature suppression electrode varies as the resonator mass moves relative to the quadrature suppression electrode, wherein the quadrature suppression electrode is capable of producing a lateral force on the resonator mass that varies based on the length of the resonator mass that is directly adjacent to the quadrature suppression electrode.
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Accused Products
Abstract
Quadrature suppression is provided by placing a resonator mass adjacent to a quadrature suppression electrode. The resonator mass is capable of moving substantially parallel to the quadrature suppression electrode and includes a notch formed adjacent to a portion of the quadrature suppression electrode such that a length of resonator mass that is directly adjacent to the quadrature suppression electrode varies as the resonator mass moves relative to the quadrature suppression electrode. The quadrature suppression electrode is capable of producing a lateral force on the resonator mass that varies based on the length of resonator mass that is directly adjacent to the quadrature suppression electrode. Such quadrature suppression can be used in sensors having one or more resonator masses.
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Citations
22 Claims
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1. A micromachined sensor with quadrature suppression comprising:
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a quadrature suppression electrode; and a resonator mass positioned adjacent to the quadrature suppression electrode, the resonator mass capable of moving substantially parallel to the quadrature suppression electrode, the resonator mass including a notch formed adjacent to a portion of the quadrature suppression electrode such that a length of the resonator mass that is directly adjacent to the quadrature suppression electrode varies as the resonator mass moves relative to the quadrature suppression electrode, wherein the quadrature suppression electrode is capable of producing a lateral force on the resonator mass that varies based on the length of the resonator mass that is directly adjacent to the quadrature suppression electrode. - View Dependent Claims (2, 3, 4, 5)
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6. A micromachined sensor with quadrature suppression comprising:
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a plurality of quadrature suppression electrodes; and a plurality of resonator masses, each resonator mass positioned adjacent to a respective one of the quadrature suppression electrodes and capable of moving substantially parallel to the resonator mass'"'"' respective quadrature suppression electrode, each resonator mass including a notch formed adjacent to a portion of the resonator mass'"'"' respective quadrature suppression electrode such that a length of the resonator mass that is directly adjacent to the quadrature suppression electrode varies as the resonator mass moves relative to the quadrature suppression electrode, wherein each quadrature suppression electrode is capable of producing a lateral force on the adjacent resonator mass that varies based on the length of the resonator mass that is directly adjacent to the quadrature suppression electrode. - View Dependent Claims (7, 8, 9, 10)
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11. A micromachined sensor with quadrature suppression comprising:
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a substrate; a frame suspended above and substantially parallel to the substrate by a first plurality of suspension flexures disposed along an outer perimeter of the frame, the first plurality of suspension flexures affixed to the substrate and formed so as to substantially prevent translational movement of the frame relative to the substrate within a plane of the frame and to permit rotational movement of the frame about an axis perpendicular to the frame and the substrate; a plurality of quadrature suppression electrodes; and a plurality of resonator structures disposed within an inner perimeter of the frame, the resonator structures operating substantially within the plane of the frame, the resonator structures including a plurality of resonator masses, each resonator mass positioned adjacent to a respective one of the quadrature suppression electrodes and capable of moving substantially parallel to the resonator mass'"'"' respective quadrature suppression electrode, each resonator mass including a notch formed adjacent to a portion of the resonator mass'"'"' respective quadrature suppression electrode such that a length of resonator mass that is directly adjacent to the quadrature suppression electrode varies as the resonator mass moves relative to the quadrature suppression electrode, wherein each quadrature suppression electrode is capable of producing a lateral force on the adjacent resonator mass that varies based on the length of the resonator mass that is directly adjacent to the quadrature suppression electrode. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22)
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Specification