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Exposure apparatus and exposure method

  • US 7,039,487 B2
  • Filed: 07/07/2003
  • Issued: 05/02/2006
  • Est. Priority Date: 12/18/2002
  • Status: Expired due to Fees
First Claim
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1. An exposure apparatus, comprising:

  • a means for applying a charged particle beam or a light onto a sample, and exposing a desired pattern onto the sample;

    a data processing means for bitmapping the shape of the pattern, and generating the pattern shape data in the bitmap format; and

    a means for controlling the application of the charged beam or light onto the sample using the pattern shape data in the bitmap format;

    wherein the data processing means comprises a function of rasterizing a pattern vertex data defining the pattern shape by a unit of a respective row area of the bitmap, a function of rejecting an overlap area between patterns, and a function of generating the pattern shape data in the bitmap format by the unit of a respective row area of the bitmap in a parallel pipeline manner, based on the result of the overlap rejection function.

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