Method for determining a position of a robot
First Claim
1. A method of determining a position of a robot, the method comprising:
- recording at least one robot positional attribute in response to a first triggering event;
recording at least one robot positional attribute in response to a second subsequent triggering event; and
resolving the position of the robot due to thermal expansion of the robot using the positional attributes recorded at the first and second triggering events.
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Accused Products
Abstract
Generally, a method of determining a position of a robot is provided. In one embodiment, a method of determining a position of a robot comprises acquiring a first set of positional metrics, acquiring a second set of positional metrics and resolving the position of the robot due to thermal expansion using the first set and the second set of positional metrics. Acquiring the first and second set of positional metrics may occur at the same location within a processing system, or may occur at different locations. For example, in another embodiment, the method may comprise acquiring a first set of positional metrics at a first location proximate a processing chamber and acquiring a second set of positional metrics in another location. In another embodiment, substrate center information is corrected using the determined position of the robot.
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Citations
47 Claims
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1. A method of determining a position of a robot, the method comprising:
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recording at least one robot positional attribute in response to a first triggering event;
recording at least one robot positional attribute in response to a second subsequent triggering event; and
resolving the position of the robot due to thermal expansion of the robot using the positional attributes recorded at the first and second triggering events. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23)
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24. A method of determining a position of a robot in a semiconductor processing system having a plurality of ports through which a substrate is passed, at least one process chamber coupled to one of the ports, the method comprising:
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determining a center position of the substrate;
adjusting the position by the relative position of the center position;
recording at least one robot positional attribute in response to a first triggering event;
recording at least one robot positional attribute in response to a second subsequent triggering event;
resolving the position of the robot due to thermal expansion of the robot using the positional attributes recorded at the first and second triggering events; and
adjusting the position by the resolved change in position. - View Dependent Claims (25, 26)
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27. A computer-readable medium having stored thereon a plurality of instructions, the plurality of instructions including instructions which, when executed by a processor, determines a change in position of a robot in a semiconductor processing system comprising:
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recording at least one robot positional attribute in response to a first triggering event;
recording at least one robot positional attribute in response to a second subsequent triggering event; and
resolving the position of the robot due to thermal expansion of the robot using the positional attributes recorded at the first and second triggering events. - View Dependent Claims (28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47)
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Specification