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Semiconductor mechanical sensor

  • US 7,040,165 B2
  • Filed: 02/22/2005
  • Issued: 05/09/2006
  • Est. Priority Date: 08/21/1992
  • Status: Expired due to Fees
First Claim
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1. A semiconductor mechanical quantity sensor comprising:

  • a first layer formed by a silicon substrate;

    a second layer formed by an insulation layer disposed on said first layer;

    a third layer formed by a silicon layer disposed on said second layer;

    a fourth layer formed by an insulation layer disposed on said third layer; and

    a fifth layer formed by a silicon layer disposed on said fourth layer, wherein;

    said third layer is formed by a polysilicon layer being doped with high density impurities and configured with a predetermined pattern in a direction parallel with said first layer,said fifth layer is provided with a weight being movable due to the effect of the mechanical quantity, a movable electrode formed on said weight, a fixed electrode facing said movable electrode, and electric routing paths being separated from said weight and extending in a direction perpendicular to said first layer, andsaid polysilicon layer and said electric routing paths are electrically connected via a bottom contact for an electric connection, the bottom contact being formed at a predetermined position on said fourth layer while passing through the fourth layer.

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