Photomask and method for producing the same
First Claim
Patent Images
1. A photomask comprising on a transparent substrate:
- a semi-light-shielding portion having a light-shielding property with respect to exposure light;
a light-transmitting portion surrounded by the semi-light-shielding portion and having a light-transmitting property with respect to exposure light; and
a peripheral portion surrounded by the semi-light-shielding portion and positioned in a periphery of the light-transmitting portion,wherein the semi-light-shielding portion and the light-transmitting portion transmit the exposure light in a same phase,the peripheral portion transmits the exposure light in a phase opposite to that of the semi-light-shielding portion and the light-transmitting portion, and is spaced apart from the light-transmitting portion by a predetermined distance,a surface of the transparent substrate in a formation region for the light-transmitting portion is exposed,a first phase shift film that transmits the exposure light in a phase opposite to that of the light-transmitting portion is formed on the transparent substrate in a formation region for the peripheral portion,the first phase shift film and a second phase shift film that transmits the exposure light in a phase opposite to that of the light-transmitting portion are laminated sequentially on the transparent substrate in a formation region for the semi-light-shielding portion, anda multilayered structure of the first phase shift film and the second phase shift film has a transmittance that allows the exposure light to be transmitted partially and transmits the exposure light in a same phase as that of the light-transmitting portion.
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Accused Products
Abstract
A photomask has a semi-light-shielding portion having a light-shielding property and a light-transmitting portion surrounded by the semi-light-shielding portion, and a peripheral portion positioned in the periphery of the light-transmitting portion. The semi-light-shielding portion and the light-transmitting portion transmit exposure light in the same phase, whereas the peripheral portion transmits exposure light in a phase opposite to that of the light-transmitting portion.
14 Citations
35 Claims
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1. A photomask comprising on a transparent substrate:
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a semi-light-shielding portion having a light-shielding property with respect to exposure light; a light-transmitting portion surrounded by the semi-light-shielding portion and having a light-transmitting property with respect to exposure light; and a peripheral portion surrounded by the semi-light-shielding portion and positioned in a periphery of the light-transmitting portion, wherein the semi-light-shielding portion and the light-transmitting portion transmit the exposure light in a same phase, the peripheral portion transmits the exposure light in a phase opposite to that of the semi-light-shielding portion and the light-transmitting portion, and is spaced apart from the light-transmitting portion by a predetermined distance, a surface of the transparent substrate in a formation region for the light-transmitting portion is exposed, a first phase shift film that transmits the exposure light in a phase opposite to that of the light-transmitting portion is formed on the transparent substrate in a formation region for the peripheral portion, the first phase shift film and a second phase shift film that transmits the exposure light in a phase opposite to that of the light-transmitting portion are laminated sequentially on the transparent substrate in a formation region for the semi-light-shielding portion, and a multilayered structure of the first phase shift film and the second phase shift film has a transmittance that allows the exposure light to be transmitted partially and transmits the exposure light in a same phase as that of the light-transmitting portion. - View Dependent Claims (2, 3, 4, 5, 19, 20)
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6. A photomask comprising on a transparent substrate:
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a semi-light-shielding portion having a light-shielding property with respect to exposure light; a light-transmitting portion surrounded by the semi-light-shielding portion and having a light-transmitting property with respect to exposure light; and a peripheral portion surrounded by the semi-light-shielding portion and positioned in a periphery of the light-transmitting portion, wherein the semi-light-shielding portion and the light-transmitting portion transmit the exposure light in a same phase, the peripheral portion transmits the exposure light in a phase opposite to that of the semi-light-shielding portion and the light-transmitting portion, and is spaced apart from the light-transmitting portion by a predetermined distance, a surface of the transparent substrate in a formation region for the light-transmitting portion is exposed, a semi-light-shielding film that has a transmittance allowing the exposure light to be transmitted partially and transmits the exposure light in a same phase to that of the light-transmitting portion is formed on the transparent substrate in the semi-light-shielding portion formation region, and the semi-light-shielding film with a reduced thickness is formed on the transparent substrate in a formation region for the peripheral portion, the thickness being such an extent that the exposure light is transmitted in a phase opposite to that of the light-transmitting portion. - View Dependent Claims (7, 8, 9, 21, 22)
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10. A photomask comprising on a transparent substrate:
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a semi-light-shielding portion having a light-shielding property with respect to exposure light; a light-transmitting portion surrounded by the semi-light-shielding portion and having a light-transmitting property with respect to exposure light; and a peripheral portion surrounded by the semi-light-shielding portion and positioned in a periphery of the light-transmitting portion, wherein the semi-light-shielding portion and the light-transmitting portion transmit the exposure light in a same phase, the peripheral portion transmits the exposure light in a phase opposite to that of the semi-light-shielding portion and the light-transmitting portion, a surface of the transparent substrate in a formation region for the light-transmitting portion is exposed, a semi-light-shielding film that has a transmittance that allows the exposure light to be transmitted partially and transmits the exposure light in a same phase as that of the light-transmitting portion is formed on the transparent substrate in the semi-light-shielding portion, and the transparent substrate in a formation region for the peripheral portion is dug down such that a thickness thereof is such an extent that the exposure light is transmitted in a phase opposite to that of the light-transmitting portion. - View Dependent Claims (11, 12, 13, 14, 23, 24, 25, 26)
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15. A method for producing a photomask comprising:
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a semi-light-shielding portion having a light-shielding property with respect to exposure light; a light-transmitting portion surrounded by the semi-light-shielding portion and having a light-transmitting property with respect to exposure light; and a peripheral portion surrounded by the semi-light-shielding portion and positioned in a periphery of the light-transmitting portion on a transparent substrate, the method comprising; a first step of forming a first phase shift film that transmits the exposure light in a phase opposite to that of the light-transmitting portion on the transparent substrate; a second step of forming a second phase shift film that transmits the exposure light in a phase opposite to that of the light-transmitting portion on the first phase shift film; a third step of removing the second phase shift film in a formation region for the light-transmitting portion and a formation region for the peripheral portion; and a fourth step of removing the first phase shift film in the light-transmitting portion formation region after the third step, wherein a multilayered structure of the first phase shift film and the second phase shift film formed on the transparent substrate in the semi-light-shielding portion formation region has a transmittance that allows the exposure light to be transmitted partially and transmits the exposure light in a same phase as that of the light-transmitting portion, and the peripheral portion is spaced apart from the light-transmitting portion by a predetermined distance. - View Dependent Claims (16)
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17. A method for producing a photomask comprising:
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a semi-light-shielding portion having a light-shielding property with respect to exposure light; a light-transmitting portion surrounded by the semi-light-shielding portion and having a light-transmitting property with respect to exposure light; and a peripheral portion surrounded by the semi-light-shielding portion and positioned in a periphery of the light-transmitting portion on a transparent substrate, the method comprising; a first step of forming a first phase shift film that transmits the exposure light in a phase opposite to that of the light-transmitting portion on the transparent substrate; a second step of forming a second phase shift film that transmits the exposure light in a phase opposite to that of the light-transmitting portion on the first phase shift film; a third step of removing the second phase shift film in a formation region for the peripheral portion; and a fourth step of removing the second phase shift film and the first phase shift film in the light-transmitting portion formation region sequentially after the third step, wherein a multilayered structure of the first phase shift film and the second phase shift film formed on the transparent substrate in the semi-light-shielding portion formation region has a transmittance that allows the exposure light to be transmitted partially and transmits the exposure light in a same phase as that of the light-transmitting portion, and a peripheral portion is spaced apart from the light-transmitting portion by a predetermined distance. - View Dependent Claims (18)
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27. A photomask comprising on a transparent substrate:
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a semi-light-shielding portion having a light-shielding property with respect to exposure light; a light-transmitting portion surrounded by the semi-light-shielding portion and having a light-transmitting property with respect to exposure light; and a peripheral portion surrounded by the semi-light-shielding portion and positioned in a periphery of the light-transmitting portion, wherein the light-transmitting portion has a polygonal shape, the peripheral portion is composed of a plurality of rectangular regions, each region being positioned so as to face each side of the light-transmitting portion, the semi-light-shielding portion and the light-transmitting portion transmit the exposure light in a same phase, the peripheral portion transmits the exposure light in a phase opposite to that of the semi-light-shielding portion and the light-transmitting portion, a surface of the transparent substrate in a formation region for the light-transmitting portion is exposed, a first phase shift film that transmits the exposure light in a phase opposite to that of the light-transmitting portion is formed on the transparent substrate in a formation region for the peripheral portion, the first phase shift film and a second phase shift film that transmit the exposure light in a phase opposite to that of the light-transmitting portion are laminated sequentially on the transparent substrate in a formation region for the semi-light-shielding portion, and a multilayered structure of the first phase shift film and the second phase shift film has a transmittance that allows the exposure light to be transmitted partially and transmits the exposure light in a same phase as that of the light-transmitting portion. - View Dependent Claims (28, 29, 30, 31)
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32. A method for producing a photomask comprising:
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a semi-light-shielding portion having a light-shielding property with respect to exposure light; a light-transmitting portion surrounded by the semi-light-shielding portion and having a light-transmitting property with respect to exposure light; and a peripheral portion surrounded by the semi-light-shielding portion and positioned in a periphery of the light-transmitting portion on a transparent substrate, the method comprising; a first step of forming a semi-light-shielding film that has a transmittance allowing the exposure light to be transmitted partially and transmits the exposure light in the same phase as that of the light-transmitting portion; a second step of digging down the transparent substrate in a formation region for the peripheral portion so as to have a thickness that transmits the exposure light in a phase opposite to that of the light-transmitting portion, after removing the semi-light-shielding film in the peripheral portion formation region; and a third step of removing the semi-light-shielding film in a formation region for the light-transmitting portion to expose a surface of the transparent substrate after the second step, wherein the semi-light-shielding portion is composed of the semi-light-shielding film which is formed on the transparent substrate in a formation region for the semi-light-shielding portion. - View Dependent Claims (33)
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34. A method for producing a photomask comprising:
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a semi-light-shielding portion having a light-shielding property with respect to exposure light; a light-transmitting portion surrounded by the semi-light-shielding portion and having a light-transmitting property with respect to exposure light; and a peripheral portion surrounded by the semi-light-shielding portion and positioned in a periphery of the light-transmitting portion on a transparent substrate, the method comprising; a first step of forming a first phase shift film that transmits the exposure light in a phase opposite to that of the light-transmitting portion on the transparent substrate; a second step of forming a second phase shift film that transmits the exposure light in a phase opposite to that of the light-transmitting portion on the first phase shift film; a third step of removing the second phase shift film in a formation region for the light-transmitting portion and a formation region for the peripheral portion; and a fourth step of removing the first phase shift film in the light-transmitting portion formation region after the third step, wherein a multilayered structure of the first phase shift film and the second phase shift film formed on the transparent substrate in the semi-light-shielding portion formation region has a transmittance that allows the exposure light to be transmitted partially and transmits the exposure light in a same phase as that of the light-transmitting portion, the light-transmitting portion has a polygonal shape, and the peripheral portion is composed of a plurality of rectangular regions, each region being positioned so as to face each side of the light-transmitting portion. - View Dependent Claims (35)
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Specification