Column simultaneously focusing a partilce beam and an optical beam

• US 7,045,791 B2
• Filed: 03/19/2001
• Issued: 05/16/2006
• Est. Priority Date: 03/20/2000
• Status: Expired due to Fees

• Current Assignee: Orsay-Physics, S.A. (Tescan Orsay Holding, A.S.), DCG Systems Incorporated (Thermo Fisher Scientific Incorporated)
• Original Assignee: Credence Systems Corporation (COHU Incorporated), Orsay-Physics, S.A. (Tescan Orsay Holding, A.S.)
• Inventors: Sudraud, Pierre, Bouchet, Patrick, Corbin, Antoine, Benas-Sayag, Gérard
• Primary Examiner(s): Font, Frank G.
• Assistant Examiner(s): EL SHAMMAA, MARY A
• Application Number:
  US10/239,293
• Publication Number:
  US 20030102436A1
• Time in Patent Office: 1,884 Days
• Field of Search: 313/542, 355/68, 250/201.3, 250/559.45, 250/492.24, 250/306, 250/310, 250/396.R, 250/397, 250/492, 250/492.2, 250/492.3, 250/428, 250/311, 250/309, 250/398
• US Class Current: 250/396.00R
• CPC Class Codes: G02B 17/082 using three curved mirrors G02B17/0864, G02B17/0896 take precedence
• CPC Class Codes: H01J 2237/121 characterised by shape
• CPC Class Codes: H01J 2237/2482 Optical means
• CPC Class Codes: H01J 2237/31749 Focused ion beam
• CPC Class Codes: H01J 37/12 electrostatic
• CPC Class Codes: H01J 37/228 whereby illumination or light collection take place in the same area of the discharge
• CPC Class Codes: H01J 37/304 Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
• CPC Class Codes: H01J 37/3056 for microworking, e. g. etching of gratings or trimming of electrical components

Abstract

The invention concerns a column for producing a focused particle beam comprising: a device (100) focusing particles including an output electrode (130) with an output hole (131) for allowing through a particle beam (A); an optical focusing device (200) for simultaneously focusing an optical beam (F) including an output aperture (230). The invention is characterized in that said output aperture (230) is transparent to the optical beam (F), while said output electrode (130) is formed by a metallic insert (130) maintained in said aperture (230) and bored with a central hole (131) forming said output orifice.

Claims

1. A process for treating a sample with a charged particle beam, comprising the steps of

providing a column having

a particle focusing device including an output electrode having an output aperture for the passage of a focused particle beam, and

an optical focusing device having an outlet aperture for the passage of an optical beam.

wherein the output electrode is supported at the outlet aperture and wherein the outlet aperture is sufficiently large to permit the optical beam to pass adjacent to the output electrode

locating a sample on the path of a particle beam produced by said column and

treating a sample by the charged particle beam, using information supplied by the optical beam.

2. A process for treating a sample, comprising the steps of

providing a column having

a particle focusing device including an output electrode having an output aperture for the passage of a focused particle beam, and

an optical focusing device having an outlet aperture for the passage of an optical beam,

wherein the output electrode is supported at the outlet aperture and wherein the outlet aperture is sufficiently large to permit the optical beam to pass adjacent to the output electrode

locating a sample on the path of a light beam produced by said column and

treating a sample by the light beam, said light beam being a laser focused onto said sample.

3. A process for analyzing an integrated circuit, comprising the steps of

providing a column having

a particle focusing device including an output electrode having an output aperture for the passage of a focused particle beam, and

an optical focusing device having an outlet aperture for the passage of an optical beam,

wherein the output electrode is supported at the outlet aperture and wherein the outlet aperture is sufficiently large to permit the optical beam to pass adjacent to the output electrode

locating an integrated circuit on the path of a light beam and of a particle beam produced by said column,

said particle beam comprising an electron beam and said light beam comprising an infra-red microscopy beam.

4. A process for analyzing an integrated circuit, comprising the steps of

providing a column having

a particle focusing device including an output electrode having an output aperture for the passage of a focused particle beam, and

an optical focusing device having an outlet aperture for the passage of an optical beam.

wherein the output electrode is supported at the outlet aperture and wherein the outlet aperture is sufficiently large to permit the optical beam to pass adjacent to the output electrode

locating an integrated circuit on the path of a light beam and of a particle beam produced by said column,

said particle beam comprising an ion beam and said light beam comprising an infra-red microscopy beam.

5. A process for engraving an integrated circuit, comprising the steps of

providing a column having

a particle focusing device including an output electrode having an output aperture for the passage of a focused particle beam, and

an optical focusing device having an outlet aperture for the passage of an optical beam.

wherein the output electrode is supported at the outlet aperture and wherein the outlet aperture is sufficiently large to permit the optical beam to pass adjacent to the output electrode

locating an integrated circuit on the path of a laser beam and of an ionic beam produced by said column,

engraving said integrated circuit by laser chemical etching and milling by ionic beam.

6. A process for engraving an integrated circuit, comprising the steps of

providing a column having

a particle focusing device including an output electrode having an output aperture for the passage of a focused particle beam, and

an optical focusing device having an outlet aperture for the passage of an optical beam.

wherein the output electrode is supported at the outlet aperture and wherein the outlet aperture is sufficiently large to permit the optical beam to pass adjacent to the output electrode

locating an integrated circuit on the path of a laser beam and of an electron beam produced by said column,

engraving said integrated circuit by laser chemical etching while probing said integrated circuit with the electron beam.

7. A column for simultaneously producing a focused particle beam and a focused light beam, the column comprising:

a particle focusing device including an output electrode having an output aperture for the passage of a focused particle beam, and

an optical focusing device having an outlet aperture for the passage of an optical beam,

wherein the output electrode is supported at the outlet aperture and wherein the outlet aperture is sufficiently large to permit the optical beam to pass adjacent to the output electrode.

8. The column according to claim 7, wherein the particle-beam focusing device has an axis and the optical focusing device focuses the optical beam coaxially with the focused particle beam onto a sample.

9. The column according to claim 7, wherein the output electrode is formed by a metal insert.

10. The column according to claim 7, wherein said optical focusing device includes

an objective lens with at least two mirrors,

curved electrically-conducting tabs retaining a unit formed by a mirror of said objective lens and the second intermediate electrode.

11. The column according to claim 7, wherein said particle focusing device comprises a two-part intermediate electrode having a first intermediate electrode and a second intermediate electrode, wherein said second intermediate electrode is arranged close to said output electrode and wherein said optical focusing device is located between said first intermediate electrode and second intermediate electrode.

12. The column according to claim 11, wherein said particle focusing device comprises an input electrode arranged close to said first intermediate electrode, wherein said input electrode and output electrode are grounded and wherein said intermediate electrode is brought to a non-zero potential.

13. The column according to claim 11, further comprising a first mirror located on an axis of said particle beam between the first intermediate electrode and the second intermediate electrode, wherein said first mirror is inclined with respect to said axis and deflects said optical beam laterally towards a second mirror and wherein said first mirror is provided with an aperture for the passage of said particle beam.

14. The column according to claim 9, wherein said outlet opening includes a set of electrically-conducting legs retaining said metal insert.

15. The column according to claim 9, wherein said particle focusing device includes an intermediate electrode and wherein sa d metal insert projects from said outlet aperture towards said intermediate electrode.

16. The column according to claim 9, wherein said outlet opening includes a set of electrically-conducting tabs retaining said metal insert.

17. The column according to claim 9, wherein said outlet aperture includes a window retaining said metal insert.

18. The column according to claim 17, wherein said window comprises a glass plate, covered with at least one thin layer of an electrically-conducting material transparent to photons.

19. The column according to claim 17, wherein said window comprises a plate of a photon-transparent material, covered with at least one thin layer of an electrically-conducting material transparent to photons.

20. The column according to claim 17, wherein said window comprises a transparent and electrically-conducting bulk material.