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Column simultaneously focusing a partilce beam and an optical beam

  • US 7,045,791 B2
  • Filed: 03/19/2001
  • Issued: 05/16/2006
  • Est. Priority Date: 03/20/2000
  • Status: Expired due to Fees
First Claim
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1. A process for treating a sample with a charged particle beam, comprising the steps ofproviding a column having a particle focusing device including an output electrode having an output aperture for the passage of a focused particle beam, and an optical focusing device having an outlet aperture for the passage of an optical beam. wherein the output electrode is supported at the outlet aperture and wherein the outlet aperture is sufficiently large to permit the optical beam to pass adjacent to the output electrode locating a sample on the path of a particle beam produced by said column and treating a sample by the charged particle beam, using information supplied by the optical beam.

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