System and method for dose control in a lithographic system

• US 7,046,413 B2
• Filed: 07/29/2005
• Issued: 05/16/2006
• Est. Priority Date: 05/29/2003
• Status: Active Grant

• Current Assignee: ASML Holding NV
• Original Assignee: ASML Holding NV
• Inventors: Bleeker, Arno Jan, Hintersteiner, Jason D., van der Mast, Karel
• Primary Examiner(s): Ben, Loha
• Application Number:
  US11/192,188
• Publication Number:
  US 20050270613A1
• Time in Patent Office: 291 Days
• Field of Search: 359/237, 359/224, 359/290, 359/291, 359/298, 359/618, 359/619, 359/622, 359/627, 359/637, 345/697, 355/53, 355/55, 355/67, 355/69, 385/140, 250/548, 250/492.1, 250/599.3, 430/5, 430/22, 430/30, 422/129, 422/131
• US Class Current: 359/237
• CPC Class Codes: G03F 7/70041 by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
• CPC Class Codes: G03F 7/70558 Dose control, i.e. achievement of a desired dose

Abstract

A system and method are used for pulse to pulse dose control in an illumination system, used, for example, in a lithography or a maskless lithography machine. The system and method can be used to decrease effective laser pulse-to-pulse variability in lithographic lasers, allowing adequate dose control using a minimum number of pulses (e.g. as little as one pulse).

Claims

1. An apparatus, comprising:

an illumination system comprising,

a light source; and

an adjusting system including an optical attenuator that adjusts light output from the light source to produce a desired light output signal; and

a spatial light modulator arranged to receive the light output signal.

2. The apparatus of claim 1, wherein the spatial light modulator comprises an array of spatial light modulators arranged to receive the light output signal.

3. The apparatus of claim 1, wherein the optical attenuator comprises a non-linear attenuator.

4. The apparatus of claim 3, wherein:

the light source produces a beam above a predetermined energy level; and

the non-linear attenuator is used to limit the light energy of the beam substantially at the predetermined energy level.

5. The apparatus of claim 3, wherein the adjusting system further comprises:

an adjustable attenuator located after the non-linear attenuator.

6. The apparatus of claim 3, further comprising:

a beam splitter that splits the light output from the light source into a first beam that is diverted from the adjusting system and a second beam that is transmitted through the adjusting system, wherein the first beam has substantially less energy than the second beam; and

a summing device that combines the first beam and the second beam, after the second beam has passed through the adjusting system, to produce the desired light output signal.

7. The apparatus of claim 6, wherein the adjusting system further comprises:

a sensor that generates a sensor signal based on an energy level of the second beam;

a processor that generates a control signal based on the sensor signal, wherein the control signal is used to control the adjusting system.

8. The apparatus of claim 1, wherein the light source comprises:

a first laser generating a first light beam having a first energy value;

a delay device in a light path of the first light beam; and

a second laser generating a second light beam having a second energy value, the first energy value being higher than the second energy value,

wherein the first light beam is passed through the adjusting system to adjust the second energy value, and

wherein the delay device delays transmission of the first light beam relative to the second light beam.

9. The system of claim 8, further comprising:

a summer that combines the first light beam and the adjusted second light beam to produce the desired light output signal.

10. An illumination system, comprising:

a light source including,

a first light source that produces a first light beam having an energy value with an energy variation value; and

a second light source that produces a second light beam having an energy value about equal to the energy variation value.

11. A lithography apparatus comprising the illumination system of claim 10.

12. The apparatus of claim 11, wherein the lithography apparatus further comprises:

a spatial light modulator arranged to receive light from the light source.

13. The illumination system of claim 10, wherein the first light source produces light beams with an energy of about 100 mJ with an energy variation value of about 1 mJ.

14. A method, comprising:

generating a first beam of light with a first light source;

measuring an energy level of the first beam of light;

comparing the measured energy level with a desired energy level;

generating a second beam of light with a second light source that has an energy level that compensates for the difference between the measured energy level and the desired energy level; and

summing the first beam of light and the second beam of light to produce a summed beam of light.

15. The method of claim 14, further comprising:

delaying propagation of the first beam of light for a predetermined time period.

16. The method of claim 14, wherein the first light source and the second light source are lasers.

17. The method of claim 14, wherein the second light beam is about equal to an energy variation value of the first beam of light.

18. The method of claim 14, further comprising:

patterning the summed beam of light.

19. The method of claim 18, wherein the patterning is effected with a spatial light modulator or an array of spatial light modulators.

20. The method of claim 19, further comprising:

exposing a substrate to the patterned beam of light.

21. The method of claim 18, further comprising:

exposing a substrate to the patterned beam of light.

22. The method of claim 21, wherein the substrate is a wafer.

23. Forming an article using the method of claim 14.