Device and method for cleaning articles used in the production of semiconductor components
First Claim
1. A cleaning apparatus for semiconductor component production object, which is provided with two feed devices, each of which can be used to guide a fluid medium over a respective surface of the object which is to be cleaned so that a first and a second surface of the object can be cleaned simultaneously, the first surface being on a separate plane than the second surface, at least two gas feed devices for introducing a cleaning gas which is under superatmospheric pressure opening out into a cleaning chamber one of the at least two gas feed devices having an outlet for directing a gas stream onto the first surface of the object and another of the at least two gas feed devices having an outlet for directing a gas stream onto the second surface of the object, where the first and second surfaces are to be cleaned, the gas streams impinging the first and second surfaces of the object at an angle of less than 90°
- , at least two suction means, by means of which gas which has been introduced into the cleaning chamber can be discharged, leading out of the cleaning chamber, and a support being present for holding the object in the cleaning chamber, in which apparatusat least one object positioning gap in the cleaning chamber,at least two ionization means, in each case one ionization means being located between in each case one directing means and one suction means, wherein each of the two ionization means is separated from the directing means.
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Accused Products
Abstract
A cleaning device for use in the production of semiconductor components comprises two feed devices with which a fluid medium is guided across a respective surface of an object to be cleaned so that different faces of the object are simultaneously cleaned. At least two gas feeding devices, having one means each for directing a gas flow onto the surface of the object to be cleaned, open into a cleaning chamber supplying a pressurized cleaning gas. At least two extraction means are connected to the outside of the cleaning chamber for discharging the gas fed to the cleaning chamber. The object can be introduced into the cleaning chamber through at least one gap. At least two ionization means are used to ionize the gas and the particles that are present in the cleaning chamber. One ionization means each is mounted between a direction means and an extraction means.
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Citations
18 Claims
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1. A cleaning apparatus for semiconductor component production object, which is provided with two feed devices, each of which can be used to guide a fluid medium over a respective surface of the object which is to be cleaned so that a first and a second surface of the object can be cleaned simultaneously, the first surface being on a separate plane than the second surface, at least two gas feed devices for introducing a cleaning gas which is under superatmospheric pressure opening out into a cleaning chamber one of the at least two gas feed devices having an outlet for directing a gas stream onto the first surface of the object and another of the at least two gas feed devices having an outlet for directing a gas stream onto the second surface of the object, where the first and second surfaces are to be cleaned, the gas streams impinging the first and second surfaces of the object at an angle of less than 90°
- , at least two suction means, by means of which gas which has been introduced into the cleaning chamber can be discharged, leading out of the cleaning chamber, and a support being present for holding the object in the cleaning chamber, in which apparatus
at least one object positioning gap in the cleaning chamber, at least two ionization means, in each case one ionization means being located between in each case one directing means and one suction means, wherein each of the two ionization means is separated from the directing means. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
- , at least two suction means, by means of which gas which has been introduced into the cleaning chamber can be discharged, leading out of the cleaning chamber, and a support being present for holding the object in the cleaning chamber, in which apparatus
Specification