System and method for run-time integration of an inset geometry into a background geometry

• US 7,053,911 B2
• Filed: 11/01/2004
• Issued: 05/30/2006
• Est. Priority Date: 10/09/2002
• Status: Expired due to Term

• Current Assignee: Rockwell Collins Simulation and Training Solutions, LLC (Rtx Corporation)
• Original Assignee: Evans & Sutherland Computer Corp. (Elevate Entertainment, Inc.)
• Inventors: Cosman, Michael A.
• Primary Examiner(s): Bella, Matthew C.
• Assistant Examiner(s): BRAUTIGAM, ALYSA N
• Application Number:
  US10/979,442
• Publication Number:
  US 20050093864A1
• Time in Patent Office: 575 Days
• Field of Search: 345/420, 345422-423, 345/502, 345/592, 345/611, 345/597, 348586-588
• US Class Current: 345/611
• CPC Class Codes: G06T 17/20 Finite element generation, e.g. wire-frame surface description, tesselation
• CPC Class Codes: G06T 19/20 Editing of 3D images, e.g. changing shapes or colours, aligning objects or positioning parts
• CPC Class Codes: G06T 2219/2021 Shape modification

Abstract

The invention provides a method for integrating an inset geometry within a background geometry. The method comprises the step of identifying a perimeter of the inset geometry. A further step is extending a skirt, having an outer perimeter and an inner perimeter, from the perimeter of the inset geometry out over the background geometry. An additional step is removing portions of the background geometry that are covered by the inset geometry and skirt. Another step is modifying the skirt so that the outer perimeter of the skirt matches background geometry behavior and the inner perimeter matches inset geometry behavior and a continuous transition exists between the outer perimeter and the inner perimeter.

Claims

1. A method for incorporating an inset geometry into a background geometry within a computer graphics system, the method comprising the steps of:

constructing a skirt with skirt polygons, around a perimeter of the inset geometry with the skirt extending out to the background geometry;

constructing a cutter polygon from outside perimeter vertices of the skirt;

removing portions of the background geometry that are surrounded by the cutter polygon;

clipping the skirt polygons against background polygons in the background geometry so that the polygons in the skirt overlay the background polygons to form clipped skirt fragment polygons;

computing updated vertex coordinates in a projection direction for the clipped skirt fragment polygons;

constructing a first drop wall with top vertices that are shared with perimeter vertices of the inset geometry;

constructing a second drop wall with top vertices that are shared with the skirt polygons along the perimeter of the inset geometry; and

intersecting the first drop wall with the second drop wall to prevent visual anomalies along the perimeter of the inset geometry.

2. A method as in claim 1, further comprising the step of shifting bottom vertices of the first drop wall out from the inset geometry.

3. A method as in claim 2, further comprising the step of shifting bottom vertices of the second drop wall in toward the inset geometry.

4. A method as in claim 1, further comprising the step of displaying the resultant polygons and geometry.

5. A method as in claim 1, wherein the step of computing updated vertex coordinates further comprises the step computing blended vertex coordinates between background geometry coordinates and inset geometry coordinates.