System and method for run-time integration of an inset geometry into a background geometry

• US 7,053,912 B2
• Filed: 11/01/2004
• Issued: 05/30/2006
• Est. Priority Date: 10/09/2002
• Status: Active Grant

• Current Assignee: Rockwell Collins Simulation and Training Solutions, LLC
• Original Assignee: Evans & Sutherland Computer Corp. (Elevate Entertainment, Inc.)
• Inventors: Cosman, Michael A.
• Primary Examiner(s): Bella, Matthew C.
• Assistant Examiner(s): Brautigam, Alysa N.
• Application Number:
  US10/979,443
• Publication Number:
  US 20050062761A1
• Time in Patent Office: 575 Days
• Field of Search: 345586-588, 345/611, 345/597
• US Class Current: 345/611
• CPC Class Codes: G06T 17/20 Finite element generation, e.g. wire-frame surface description, tesselation
• CPC Class Codes: G06T 19/20 Editing of 3D images, e.g. changing shapes or colours, aligning objects or positioning parts
• CPC Class Codes: G06T 2219/2021 Shape modification

Abstract

The invention provides a method for integrating an inset geometry within a background geometry. The method comprises the step of identifying a perimeter of the inset geometry. A further step is extending a skirt, having an outer perimeter and an inner perimeter, from the perimeter of the inset geometry out over the background geometry. An additional step is removing portions of the background geometry that are covered by the inset geometry and skirt. Another step is modifying the skirt so that the outer perimeter of the skirt matches background geometry behavior and the inner perimeter matches inset geometry behavior and a continuous transition exists between the outer perimeter and the inner perimeter.

Claims

1. A method for integrating an inset geometry within a background geometry in a video graphics display system, comprising:

determining a perimeter geometry of the inset geometry;

defining a skirt geometry to match the perimeter geometry of the inset geometry and the skirt geometry extends out to the background geometry;

joining the geometry of the inset geometry to the skirt geometry to form a boundary region between the inset geometry and die skirt geometry;

covering the boundary region with a first polygon wall connected to the inset geometry below a viewable surface of the inset geometry;

covering the boundary region with a second polygon wall connected to the skirt geometry below a viewable surface of the inset geometry and the skirt geometry;

covering the boundary region by intersecting the first polygon wall and the second polygon wall; and

displaying the inset geometry and skirt geometry within the background geometry.

2. A method as in claim 1, wherein the step of covering the boundary region further comprises the step of covering the boundary region with intersecting polygons below a viewable surface of the inset geometry and background geometry.

3. A method as in claim 1, wherein the step of defining a skirt geometry further comprises the step of defining a polygonal geometry that is used to match the inset geometry to the background geometry.

4. A method as in claim 1, wherein the step defining a skirt geometry to match the perimeter geometry further comprises the step of defining a polygon skirt that is used to transition the inset geometry to the background geometry.