Operation monitoring method for treatment apparatus
First Claim
1. An operation monitoring method for monitoring an operation of a processing system by utilizing a plurality of detected values as operation data, the detected values being detected for every object to be processed by means of a plurality of detectors provided in the processing system, the method comprising the steps of:
- obtaining previously a plurality of operation data with respect to a plurality of objects to be processed as references;
carrying out a principal component analysis using the operation data;
dividing the operation data into relatively high contribution principal components and low contribution principal components;
deriving a residual matrix of operation data belonging to the low contribution principal components; and
evaluating an operation state of the processing system on the basis of a first and a second principal component score and a residual score obtained by the residual matrix.
1 Assignment
0 Petitions
Accused Products
Abstract
In an operation monitoring method according to the present invention, operation data of a plasma processing system (1) are detected for every wafer (W) by means of a plurality of detectors, and a principal component analysis using the operation data is carried out by means of a controller (10). An operation state of the plasma processing system (1) is evaluated by using the results of the principal component analysis.
-
Citations
30 Claims
-
1. An operation monitoring method for monitoring an operation of a processing system by utilizing a plurality of detected values as operation data, the detected values being detected for every object to be processed by means of a plurality of detectors provided in the processing system, the method comprising the steps of:
-
obtaining previously a plurality of operation data with respect to a plurality of objects to be processed as references; carrying out a principal component analysis using the operation data; dividing the operation data into relatively high contribution principal components and low contribution principal components; deriving a residual matrix of operation data belonging to the low contribution principal components; and evaluating an operation state of the processing system on the basis of a first and a second principal component score and a residual score obtained by the residual matrix. - View Dependent Claims (2, 3)
-
-
4. A processing system evaluating method for evaluating a difference in characteristics between a plurality of processing systems by utilizing a plurality of detected values as operation data, the detected values being detected for every object to be processed by means of a plurality of detectors provided in the processing systems, the method comprising the steps of:
-
obtaining first operation data for each of the objects to be processed by using a reference processing system; carrying out a principal component analysis using the first operation data to derive a first residual matrix; obtaining second operation data for each of the objects to be processed by using a comparative processing system to be compared with the reference processing system; applying the second operation data to results of the principal component analysis to derive a second residual matrix; and comparing the first residual matrix based on the first operation data with the second residual matrix based on the second operation data to evaluate a difference in performance between the processing systems. - View Dependent Claims (5)
-
-
6. A processing system monitoring method for measuring a plurality of electrical data of a high frequency source varying in accordance with a state in a processing system, by means of a measuring device, when a high frequency power is applied to an electrode in a processing vessel from the high frequency source for processing an object with plasma in the processing system, and for carrying out a multivariate analysis using the measured electrical data to detect a power application state of the high frequency source, the method comprising the steps of:
-
measuring the electrical data as reference data when the power application state of the high frequency source is stabilized in accordance with the state in the processing vessel in a reference processing system; carrying out a multivariate analysis for reference using the obtained reference data; measuring successively the electrical data as comparative data in a comparative processing system to be monitored, after the system is started; carrying out a multivariate analysis for comparison using the obtained comparative data and comparing results of the multivariate analysis for comparison with a result of the multivariate analysis for reference to determine, on the basis of a difference therebetween, whether the power application state of the high frequency source in the comparative processing system reaches a stable condition in accordance with the state in the processing vessel. - View Dependent Claims (7, 8, 9, 10)
-
-
11. An abnormality detecting method for detecting an abnormality of a processing system by measuring a plurality of electrical data of a high frequency source varying in accordance with a state in the processing system, by means of a measuring device, when a high frequency power is applied to an electrode in a processing vessel from the high frequency source for processing an object with plasma in the processing system, and by carrying out a multivariate analysis using the measured electrical data to detect a power application state of the high frequency source, the method comprising the steps of:
-
measuring the electrical data as reference data when the power application state of the high frequency source is stabilized in accordance with the state in the processing vessel in a normal reference processing system; carrying out a multivariate analysis for reference using the obtained reference data; measuring the electrical data as comparative data in a comparative processing system, the abnormality of which is to be detected; carrying out a multivariate analysis for comparison using the obtained comparative data; and comparing a result of the multivariate analysis for comparison with a result of the multivariate analysis for reference to detect the abnormality of the comparative processing system on the basis of a difference therebetween. - View Dependent Claims (12, 13, 14, 15)
-
-
16. A processing system control unit for monitoring an operation of a processing system by utilizing a plurality of detected values as operation data, the detected values being detected for every object to be processed by means of a plurality of detectors provided in the processing system, the control unit executing a procedure comprising the steps of:
-
obtaining previously a plurality of operation data with respect to a plurality of objects to be processed as references; carrying out a principal component analysis using the operation data; dividing the operation data into relatively high contribution principal components and low contribution principal components; deriving a residual matrix of operation data belonging to the low contribution principal components; and evaluating an operation state of the processing system on the basis of a first and a second principal component score and a residual score obtained by the residual matrix. - View Dependent Claims (17, 18)
-
-
19. A processing system control unit for evaluating a difference in characteristics between a plurality of processing systems by utilizing a plurality of detected values as operation data, the detected values being detected for every object to be processed by means of a plurality of detectors provided in the processing systems, the control unit executing a procedure comprising the steps of:
-
obtaining first operation data for each of the objects to be processed by using a reference processing system; carrying out a principal component analysis using the first operation data to derive a first residual matrix; obtaining second operation data for each of the objects to be processed by using a comparative processing system to be compared with the reference processing system; applying the second operation data to results of the principal component analysis to derive a second residual matrix; and comparing the first residual matrix based on the first operation data with the second residual matrix based on the second operation data to evaluate a difference in performance between the processing systems. - View Dependent Claims (20)
-
-
21. A processing system control unit for measuring a plurality of electrical data of a high frequency source varying in accordance with a state in a processing system, by means of a measuring devise, when a high frequency power is applied to an electrode in a processing vessel from the high frequency source for processing an object with plasma in the processing system, and for carrying out a multivariate analysis using the measured electrical data to detect a power application state of the high frequency source, the control unit executing a procedure comprising the steps of:
-
measuring the electrical data as reference data when the power application state of the high frequency source is stabilized in accordance with the state in the processing vessel in a reference processing system; carrying out a multivariate analysis for reference using the obtained reference data; measuring successively the electrical data as comparative data in a comparative processing system to be monitored, after the system is started; carrying out a multivariate analysis for the comparison using the obtained comparative data; and comparing results of the multivariate analysis for comparison with a result of the multivariate analysis for reference to determine, on the basis of a difference therebetween, whether the power application state of the high frequency source in the comparative processing system reaches a stable condition in accordance with the state in the processing vessel. - View Dependent Claims (22, 23, 24, 25)
-
-
26. A processing system control unit for detecting an abnormality of a processing system by measuring a plurality of electrical data of a high frequency source varying in accordance with a state in the processing system, by means of a measuring device, when a high frequency power is applied to an electrode in a processing vessel from the high frequency source for processing an object with plasma in the processing system, and by carrying out a multivariate analysis using the measured electrical data to detect a power application state of the high frequency source, the control unit executing a procedure comprising the steps of:
-
measuring the electrical data as reference data when the power application state of the high frequency source is stabilized in accordance with the state in the processing vessel in a normal reference processing system; carrying out a multivariate analysis for reference using the obtained reference data; measuring the electrical data as comparative data in a comparative processing system, the abnormality of which is to be detected; carrying out a multivariate analysis for comparison using the obtained comparative data; and comparing a result of the multivariate analysis for comparison with a result of the multivariate analysis for reference to detect the abnormality of the comparative processing system on the basis of a difference therebetween. - View Dependent Claims (27, 28, 29, 30)
-
Specification