Cyclic error reduction in average interferometric position measurements

• US 7,057,736 B2
• Filed: 03/25/2005
• Issued: 06/06/2006
• Est. Priority Date: 03/13/2001
• Status: Expired due to Fees

• Current Assignee: Zygo Corporation (Ametek Incorporated)
• Original Assignee: Zygo Corporation (Ametek Incorporated)
• Inventors: Hill, Henry A.
• Primary Examiner(s): LEE, HWA S
• Application Number:
  US11/089,595
• Publication Number:
  US 20050168754A1
• Time in Patent Office: 438 Days
• Field of Search: 356/500, 356/498, 356/496, 356/486, 356/490, 356/508, 356/485, 356/510
• US Class Current: 356/486
• CPC Class Codes: G01B 2290/70 Using polarization in the interferometer
• CPC Class Codes: G01B 9/02003 using beat frequencies
• CPC Class Codes: G01B 9/02018 Multipass interferometers, e.g. double-pass
• CPC Class Codes: G01B 9/02059 Reducing effect of parasitic reflections, e.g. cyclic errors
• CPC Class Codes: G01B 9/02087 Combining two or more images of the same region
• CPC Class Codes: G03F 7/70775 Position control, e.g. interferometers or encoders for determining the stage position
• CPC Class Codes: H01J 2237/20292 Means for position and/or orientation registration

Abstract

The invention features a system and method for reducing the contribution of cyclic errors to an interferometric position measurement of a movable stage. An initial interferometric position measurement of the stage is averaged with at least one additional measurement corresponding to a displacement(s) of the stage from its initial position. The displacements are selected to reduce the overall cyclic error contribution to an average position measurement. As a result, the average position of the stage can be measured more accurately than any of its individual positions. The average position can be used to more accurately determine the average position of an alignment mark on a wafer carried by the stage. Furthermore, the averaging described above can be applied to additional interferometric measurement axes. For example, the averaging can be applied to two laterally displacement measurement axes that are substantially parallel to one another to more accurately determine an average angular orientation of the stage. The result can be used to more correctly determine an Abbe offset error in the average position of an off-axis alignment mark (i.e., an alignment mark that is not aligned with one of the interferometric measurement axes).

Claims

1. An interferometric stage system comprising:

a translatable stage;

a base defining a reference frame;

a positioning system coupled to the stage for adjusting the position of the stage relative to the reference frame;

an alignment scope;

an interferometry system which during operation directs a measurement beam along a first path between the stage and a portion of the base to produce an interferometric signal indicative of a position of the stage along the first path, wherein a defect in the interferometry system produces a cyclic error contribution to the interferometric signal; and

an electronic controller coupled to the interferometry system and the positioning system, wherein during operation the electronic controller determines a position for the stage along the first path based on the interferometric signal corresponding to each of multiple positions of the stage, wherein the multiple positions of the stage include an initial position and at least one additional position, to reduce the cyclic error contribution in the determined position,

wherein during operation the electronic controller determines whether an alignment mark on a wafer carried by the stage is within view of the alignment scope based on the determined position.

2. The system of claim 1, wherein the electronic controller determines the position by applying a digital filter to the interferometric signals corresponding to the multiple positions.

3. The system of claim 1, wherein the determined position is an average position based on the interferometric signal corresponding to each of the multiple positions of the stage.

4. The system of claim 3, wherein during operation the electronic controller determines a second average position of the stage corresponding to a second set of multiple positions of the stage, and wherein the electronic controller further determines a speed for the stage based on the first-mentioned average position and the second average position.

5. The system of claim 1, wherein the initial position and the additional positions are selected by the electronic controller to be positions in which the alignment mark is within the view of the alignment scope.

6. The system of claim 1, wherein the interferometry system comprises an interferometer secured to the portion of the base and a measurement object secured to the stage, wherein during operation the interferometer directs the measurement beam to reflect from the measurement object.

7. The system of claim 1, wherein the interferometry system comprises an interferometer secured to the stage and a measurement object secured to the portion of the base, wherein during operation the interferometer directs the measurement beam to reflect from the measurement object.

8. The system of claim 1, wherein during operation the interferometry system directs the measurement beam to pass between the stage and the portion of the base more than once.

9. An interferometric stage system comprising:

a translatable stage;

a base defining a reference frame;

a positioning system coupled to the stage for adjusting the position of the stage relative to the reference frame;

an interferometry system which during operation directs a measurement beam along a first path between the stage and a portion of the base to produce a first interferometric signal indicative of a position of the stage along the first path, directs a second measurement beam along a second path between the stage and the portion of the base to produce a second interferometric signal indicative of a position of the stage along the second path, wherein a defect in the interferometry system produces a cyclic error contribution to at least the first interferometric signal; and

an electronic controller coupled to the interferometry system and the positioning system, wherein during operation the electronic controller determines a position for the stage along each of the first and second paths based on the interferometric signals corresponding to each of multiple positions of the stage, wherein the multiple positions of the stage include an initial position and at least one additional position, to reduce the cyclic error contribution to the determined position for at least the first path, and

wherein the electronic controller further determines an angular orientation for the stage based on the determined positions of the stage along the first and second paths.

10. The system of claim 9, wherein the interferometry system comprises two separate interferometers, the first interferometer directing the first measurement beam and the second interferometer directing the second measurement beam.

11. The system of claim 9, wherein the interferometry system comprises a multi-axis interferometer providing measurement axes along the first and second paths.

12. The system of claim 9, wherein the first and second paths are parallel to one another.

13. The system of claim 9, wherein translation of the stage to each of the additional positions causes the first and second interferometric signals to change by the same amount relative to the first and second interferometric signals for the initial position.

14. The system of claim 9, further comprising an alignment scope coupled to the electronic controller, wherein during operation the electronic controller determines whether an alignment mark on a wafer carried by the stage is within view of the alignment scope.

15. The system of claim 14, wherein the initial position and the additional positions are selected by the electronic controller to be positions in which the alignment mark is within the view of the alignment scope.

16. The system of claim 14, wherein the electronic controller further determines an Abbe offset error for the alignment mark based on the angular orientation determined by the processor and an off-set distance corresponding to a lateral displacement between the alignment mark and the first measurement beam path.

17. The system of claim 9, wherein the interferometry system comprises an interferometer secured to the portion of the base and a measurement object secured to the stage, wherein during operation the interferometer directs the first measurement beam to reflect from the measurement object.

18. The system of claim 9, wherein the interferometry system comprises an interferometer secured to the stage and a measurement object secured to the portion of the base, wherein during operation the interferometer directs the first measurement beam to reflect from the measurement object.

19. The system of claim 9, wherein during operation the interferometry system directs the first measurement beam to pass between the stage and the portion of the base more than once.

20. The system of claim 9, wherein the electronic controller determines the positions by applying a digital filter to each of the interferometric signals corresponding to the multiple positions.