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Photomask, method for producing the same, and method for forming pattern using the photomask

  • US 7,060,398 B2
  • Filed: 12/24/2002
  • Issued: 06/13/2006
  • Est. Priority Date: 12/26/2001
  • Status: Expired due to Fees
First Claim
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1. A photomask in which, on a transparent substrate having light transmitting properties with respect to exposure light, a mask pattern having a semi-light shielding portion and a phase shifter, and a light-transmitting portion where the mask pattern is not located are provided, characterized in thatthe semi-light shielding portion has a transmittance which allows the exposure light to be partially transmitted, and transmits the exposure light in the same phase as that of the light-transmitting portion,the phase shifter transmits the exposure light in a phase opposite to that of the light-transmitting portion,the mask pattern is provided so as to surround the light-transmitting portion, the phase shifter is formed in a ring-shape around the light-transmitting portion, andthe outline of the ring-shaped phase shifter is similar to the outline of the light-transmitting portion.

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