Exposure apparatus including micro mirror array and exposure method using the same
First Claim
1. An exposure apparatus for use in the manufacturing of semiconductor devices, the exposure apparatus comprising:
- a light source that emits light which propagates along an optical axis of the apparatus;
a pattern transfer unit including a photomask that bears a pattern to be transcribed, said mask being situated along said optical axis; and
a reflecting mirror unit disposed along said optical axis between said light source and said pattern transfer unit, said reflecting mirror unit including a micro mirror array (MMA) comprising a plurality of micro mirrors positioned in the apparatus so as to reflect light emitted by said light source to said pattern transfer unit;
wherein the reflecting mirror unit directs the light emitted by the light source onto the photomask at oblique angles relative to a plane of the photomask to prevent 0th order incident light from reaching the photomask.
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Accused Products
Abstract
An exposure method and apparatus for use in exposing a photoresist on a semiconductor wafer do not employ an aperture for shaping the exposure light. The exposure apparatus includes a light source unit, a reflecting mirror unit having a micro mirror array (MMA) and a control unit that controls the MMA, and a pattern transfer unit that transfers the pattern of a photomask onto the photoresist. The angles of inclination of the respective mirrors of the MMA are adjusted to reflect incident light in a manner that shapes the incident light. Accordingly, it is possible to form a pattern having the highest degree of resolution and optimum depth of focus (DOF) in the shortest amount of processing time.
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Citations
12 Claims
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1. An exposure apparatus for use in the manufacturing of semiconductor devices, the exposure apparatus comprising:
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a light source that emits light which propagates along an optical axis of the apparatus; a pattern transfer unit including a photomask that bears a pattern to be transcribed, said mask being situated along said optical axis; and a reflecting mirror unit disposed along said optical axis between said light source and said pattern transfer unit, said reflecting mirror unit including a micro mirror array (MMA) comprising a plurality of micro mirrors positioned in the apparatus so as to reflect light emitted by said light source to said pattern transfer unit; wherein the reflecting mirror unit directs the light emitted by the light source onto the photomask at oblique angles relative to a plane of the photomask to prevent 0th order incident light from reaching the photomask. - View Dependent Claims (2, 3, 4, 5)
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6. A method of exposing a photoresist, the method comprising:
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generating exposure light; providing a photomask having a pattern that is to be transferred to the photoresist; and reflecting the exposure light along an optical axis through the photomask and towards the photoresist with an array of micro mirrors disposed side-by-side; wherein the array of micro mirrors directs the exposure light onto the photomask at oblique angles relative to a plane of the photomask to prevent 0th order incident light from reaching the photomask. - View Dependent Claims (7, 8, 9)
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10. A method of exposing a photoresist, the exposure method comprising:
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providing a photomask having a pattern to be transferred to the photoresist; quantifying information regarding the pattern to be transferred to the photoresist; generating exposure light; determining, from the information regarding the pattern of the photomask, a form for the shape of the exposure light to be directed through the photomask and onto the photoresist; and reflecting rays of the exposure light, along an optical axis through the photomask, with an array of micro mirrors disposed side-by-side and oriented to shape the exposure light into said form; wherein the array of micro mirrors directs the exposure light onto the photomask at oblique angles relative to a plane of the photomask to prevent 0th order incident light from reaching the photomask. - View Dependent Claims (11, 12)
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Specification