Lithographic apparatus and device manufacturing method

• US 7,061,586 B2
• Filed: 03/02/2004
• Issued: 06/13/2006
• Est. Priority Date: 03/02/2004
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: de Jager, Pieter Willem Herman, Sytsma, Joost
• Primary Examiner(s): NGUYEN, HUNG
• Application Number:
  US10/790,257
• Publication Number:
  US 20050195380A1
• Time in Patent Office: 833 Days
• Field of Search: 355/53, 355 67- 71, 250/548, 356399-401
• US Class Current: 355/69
• CPC Class Codes: G03F 7/70208 Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
• CPC Class Codes: G03F 7/70275 Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
• CPC Class Codes: G03F 7/70283 Mask effects on the imaging process
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70558 Dose control, i.e. achievement of a desired dose

Abstract

A detector, feedback and compensation system for use with a radiation distribution system for distributing the radiation from a radiation system to two or more arrays of individually controllable elements, each for patterning beams of radiation, which are subsequently projected onto a substrate. The detector determines the radiation lost in the radiation distribution system and feeds this information back to a compensation system, which compensates for the loss and keeps the radiation projected onto the substrate uniform.

Claims

1. A lithographic projection apparatus, comprising:

a radiation system that provides a beam of radiation;

a plurality of patterning devices;

a radiation distribution device having radiation distribution channels that distribute respective portions of the radiation from the radiation system to respective patterning devices in the plurality of patterning devices, wherein the respective patterning devices pattern corresponding ones of the respective portions of the beam of radiation;

a radiation detection system that measures intensity of the radiation associated with each of the patterning devices; and

a projection system that projects the respective patterned beams onto a target portion of a substrate.

2. A lithographic projection system according to claim 1, wherein the radiation detection system comprises a detector that sequentially detects radiation associated with each of the patterning devices.

3. A lithographic projection system according to claim 2, wherein the detector moves across the respective portions of the radiation associated with each of the patterning devices.

4. A lithographic projection system according to claim 2, further comprising a probe associated with the detector, wherein the detector is substantially stationary and the probe moves across the respective portions of the radiation associated with each of the patterning devices.

5. A lithographic projection system according to claim 1, wherein the radiation detection system comprises detectors wherein each is associated with respective ones of the patterning devices.

6. A lithographic projection system according to claim 1, wherein the radiation detection system detects radiation exiting the radiation distribution system.

7. A lithographic projection system according to claim 1, wherein the radiation detection system detects radiation exiting the distribution channel.

8. A lithographic projection system according to claim 1, wherein the detection system detects radiation between the patterning devices and the projection system.

9. A lithographic projection system according to claim 1, wherein the detection system detects radiation exiting the projection system.

10. A lithographic projection apparatus according to claim 1, further comprising a compensation system that adjusts intensity of the radiation that is associated with at least one of the patterning devices and that is projected by the projection system.

11. A lithographic projection apparatus according to claim 10, wherein the compensation system independently adjusts the intensity of the radiation associated with each of the patterning devices.

12. A lithographic projection apparatus according to claim 10, wherein:

at least one of the patterning devices is an array of individually controllable elements that can be set to impart a beam of radiation with a desired pattern in its cross-section;

each of the individually controllable elements is set to one of a plurality of states during which a different proportion of the radiation is directed to the projection system; and

the compensation system adjusts the radiation by changing the settings for each of the individually controllable elements, such that the pattern of the radiation is maintained, while the intensity of the radiation changes.

13. A lithographic projection apparatus according to claim 12, further comprising a control system that updates the compensation system with previously detected and stored radiation intensity data when the radiation is projected onto a portion of the substrate, wherein the stored data is a measure of the intensity variation when the at least one patterning device is set so that all the individually controllable elements are set to the same state.

14. A lithographic projection apparatus according to claim 10, wherein the compensation system comprises a radiation attenuator that attenuates the radiation that is associated with at least one patterning device and that is projected by the projection system.

15. A lithographic projection apparatus according to claim 10, wherein the compensation system adjusts the intensity of the respective portion of the radiation that is associated with at least one patterning device and that is projected by the projection system.

16. A lithographic projection apparatus according to claim 10, further comprising a control system that updates the compensation system with previously detected and stored radiation intensity data when the radiation is projected onto a portion of the substrate.

17. A lithographic projection apparatus according to claim 10, further comprising a control system that updates the compensation system with previously detected radiation intensity data when radiation is projected onto a portion of the substrate, wherein the previously detected radiation intensity data corresponds to data detected by the radiation detection system before a current operation that is stored in a storage medium.

18. A lithographic projection apparatus according to claim 10, wherein:

the radiation detection system detects variation in radiation intensity in at least one of the radiation distribution system and the radiation distribution channels for each of the patterning devices; and

the compensation system is arranged to compensate for this variation in radiation intensity.

19. A lithographic projection apparatus according to claim 10, wherein:

the radiation detection system is arranged to detect variation in radiation intensity in the projection system for each of the patterning devices; and

the compensation system is arranged to compensate for this variation in radiation intensity.

20. A method of calibrating the radiation intensity in a lithographic projection apparatus, comprising:

detecting intensity of radiation at any of a number of stages in a lithographic projection apparatus when individually controllable elements of each patterning device in a plurality of patterning devices are set to a same state;

storing the radiation intensity data for any of the number of stages in a storage medium;

detecting the intensity of the radiation at the same stages in the lithographic projection apparatus while it is in use;

using a control system to compare the stored data with data acquired while the lithographic projection apparatus is in use; and

using a compensation system to adjust the intensity of the radiation associated with at least one of the patterning devices in accordance with an output of the control system.

21. A device manufacturing method, comprising:

distributing portions of a beam of radiation from a radiation system through radiation distribution channels of a radiation distribution device to respective patterning devices in a plurality of patterning devices;

detecting radiation intensity of the respective portions of the beam of radiation in the radiation distribution channels;

patterning the respective portions of the beam using the respective patterning devices; and

projecting the patterned beams of radiation onto a target portion of a substrate.

22. A device manufacturing method, comprising:

distributing respective beams of radiation via a plurality of radiation distribution channels of a radiation distribution device from a radiation source to respective patterning devices in a plurality of patterning devices;

determining a radiation intensity value for each respective one of the radiation distribution channels;

compensating the respective beams of radiation for any difference between the radiation intensity values before the respective beams of radiation reach the respective patterning devices;

patterning the respective beams of radiation; and

projecting the patterned beams of radiation onto a target portion of a substrate.