Lithographic apparatus and device manufacturing method
First Claim
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1. A lithographic projection apparatus, comprising:
- a radiation system that provides a beam of radiation;
a plurality of patterning devices;
a radiation distribution device having radiation distribution channels that distribute respective portions of the radiation from the radiation system to respective patterning devices in the plurality of patterning devices, wherein the respective patterning devices pattern corresponding ones of the respective portions of the beam of radiation;
a radiation detection system that measures intensity of the radiation associated with each of the patterning devices; and
a projection system that projects the respective patterned beams onto a target portion of a substrate.
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Abstract
A detector, feedback and compensation system for use with a radiation distribution system for distributing the radiation from a radiation system to two or more arrays of individually controllable elements, each for patterning beams of radiation, which are subsequently projected onto a substrate. The detector determines the radiation lost in the radiation distribution system and feeds this information back to a compensation system, which compensates for the loss and keeps the radiation projected onto the substrate uniform.
36 Citations
22 Claims
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1. A lithographic projection apparatus, comprising:
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a radiation system that provides a beam of radiation; a plurality of patterning devices; a radiation distribution device having radiation distribution channels that distribute respective portions of the radiation from the radiation system to respective patterning devices in the plurality of patterning devices, wherein the respective patterning devices pattern corresponding ones of the respective portions of the beam of radiation; a radiation detection system that measures intensity of the radiation associated with each of the patterning devices; and a projection system that projects the respective patterned beams onto a target portion of a substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
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20. A method of calibrating the radiation intensity in a lithographic projection apparatus, comprising:
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detecting intensity of radiation at any of a number of stages in a lithographic projection apparatus when individually controllable elements of each patterning device in a plurality of patterning devices are set to a same state; storing the radiation intensity data for any of the number of stages in a storage medium; detecting the intensity of the radiation at the same stages in the lithographic projection apparatus while it is in use; using a control system to compare the stored data with data acquired while the lithographic projection apparatus is in use; and using a compensation system to adjust the intensity of the radiation associated with at least one of the patterning devices in accordance with an output of the control system.
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21. A device manufacturing method, comprising:
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distributing portions of a beam of radiation from a radiation system through radiation distribution channels of a radiation distribution device to respective patterning devices in a plurality of patterning devices; detecting radiation intensity of the respective portions of the beam of radiation in the radiation distribution channels; patterning the respective portions of the beam using the respective patterning devices; and projecting the patterned beams of radiation onto a target portion of a substrate.
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22. A device manufacturing method, comprising:
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distributing respective beams of radiation via a plurality of radiation distribution channels of a radiation distribution device from a radiation source to respective patterning devices in a plurality of patterning devices; determining a radiation intensity value for each respective one of the radiation distribution channels; compensating the respective beams of radiation for any difference between the radiation intensity values before the respective beams of radiation reach the respective patterning devices; patterning the respective beams of radiation; and projecting the patterned beams of radiation onto a target portion of a substrate.
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Specification