Maskless lithography systems and methods utilizing spatial light modulator arrays
First Claim
1. A method for controlling dose in maskless lithography, comprising:
- measuring a dose delivered in each pulse in a series of pulses from SLMs;
calculating a dose error based on the measuring steps;
calculating a correctional blanket dose based on the dose error; and
applying the correctional blanket dose using a final set of SLMs.
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Abstract
A maskless lithography system that writes patterns on an object. The system can include an illumination system, the object, spatial light modulators (SLMs), and a controller. The SLMs can pattern light from the illumination system before the object receives the light. The SLMs can include a leading set and a trailing set of the SLMs. The SLMs in the leading and trailing sets change based on a scanning direction of the object. The controller can transmit control signals to the SLMs based on at least one of light pulse period information, physical layout information about the SLMs, and scanning speed of the object. The system can also correct for dose non-uniformity using various methods.
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Citations
13 Claims
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1. A method for controlling dose in maskless lithography, comprising:
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measuring a dose delivered in each pulse in a series of pulses from SLMs; calculating a dose error based on the measuring steps; calculating a correctional blanket dose based on the dose error; and applying the correctional blanket dose using a final set of SLMs. - View Dependent Claims (2, 3, 4, 5)
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6. A method for controlling dose in maskless lithography, comprising:
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measuring an intensity of a dose from a leading set of SLMs; subtracting the measured intensity from a predetermined value to generate an error signal; delaying the error signal; adding the delayed signal to another predetermined value to generate a control signal; and using the control signal to control a dose from a trailing set of SLMs. - View Dependent Claims (7, 8, 9, 10, 11, 12)
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13. A method for controlling dose of an exposure field in maskless lithography, comprising:
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measuring a dose delivered to the exposure field in each pulse in a series of pulses from a first SLM; calculating a dose error based on the measuring steps; calculating a correctional blanket dose based on the dose error; and applying the correctional blanket dose to the exposure field using another SLM.
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Specification