Hydrophobically modified solution polymers and their use in surface protecting formulations

• US 7,063,895 B2
• Filed: 08/01/2001
• Issued: 06/20/2006
• Est. Priority Date: 08/01/2001
• Status: Expired due to Term

• Current Assignee: Nouryon Chemicals International B.V. (Nouryon BV)
• Original Assignee: National Starch and Chemical Investment Holding Corporation (Ingredion Incorporated)
• Inventors: Eknoian, Michael, Crossman, Martin, Rodrigues, Klein
• Primary Examiner(s): TARAZANO, DONALD LAWRENCE
• Application Number:
  US09/920,498
• Publication Number:
  US 20030072950A1
• Time in Patent Office: 1,784 Days
• Field of Search: 428/461, 428/500, 428/473, 428/510, 428/522, 428/411.1, 427/384, 526/328, 526/328.5, 523/105, 523/535
• US Class Current: 428/461
• CPC Class Codes: A61K 8/86 Polyethers
• CPC Class Codes: A61Q 17/00 Barrier preparations; Preparations brought into direct contact with the skin for affording protection against external influences, e.g. sunlight, X-rays or other harmful rays, corrosive materials, bacteria or insect stings
• CPC Class Codes: A61Q 17/04 Topical preparations for affording protection against sunlight or other radiation; Topical sun tanning preparations
• CPC Class Codes: A61Q 19/00 Preparations for care of the skin
• CPC Class Codes: A61Q 5/004 Preparations used to protect coloured hair
• CPC Class Codes: C08F 2/06 Organic solvent
• CPC Class Codes: C09D 133/04 Homopolymers or copolymers of esters C09D143/04 takes precedence
• CPC Class Codes: C09D 135/06 Copolymers with vinyl aromatic monomers
• CPC Class Codes: D06M 15/263 of unsaturated carboxylic acids; Salts or esters thereof
• CPC Class Codes: D06M 2200/12 Hydrophobic properties
• CPC Class Codes: D06P 1/525 Polymers of unsaturated carboxylic acids or functional derivatives thereof
• CPC Class Codes: D06P 5/08 macromolecular
• CPC Class Codes: D06P 5/137 with other compounds
• CPC Class Codes: Y10T 428/3163 Next to acetal of polymerized unsaturated alcohol [e.g., formal butyral, etc.]
• CPC Class Codes: Y10T 428/31692 Next to addition polymer from unsaturated monomers
• CPC Class Codes: Y10T 428/31855 Of addition polymer from unsaturated monomers
• CPC Class Codes: Y10T 428/31891 Where addition polymer is an ester or halide
• CPC Class Codes: Y10T 428/31935 Ester, halide or nitrile of addition polymer

Abstract

The present invention is directed to an aqueous polymer composition comprising a copolymer and water, the copolymer containing at least one hydrophilic base or acid-neutralizable monomer and at least one hydrophobic ethylenically unsaturated monomer. A film formed from the contains essentially no crosslinking. The polymer composition is formed by polymerizing the hydrophilic monomer and hydrophobic monomer in a non-aqueous solvent; forming an aqueous polymer dispersion from the non-aqueous polymer solution, and adding a base or acid to form an aqueous polymer composition.

Claims

1. An aqueous polymer composition comprising:

a copolymer having at least one hydrophilic and at least one hydrophobic ethylenically unsaturated monomer; and

water;

wherein said aqueous polymer composition is a solution or a dispersion having substantially no stabilizing surfactants, and

wherein a film formed from said aqueous polymer composition comprises substantially no crosslinking.

2. The composition of claim 1 wherein said hydrophilic monomer is a cationic, anionic, or amphoteric monomer.

3. The composition of claim 1 wherein said film formed from said polymer composition is insoluble in water.

4. The composition of claim 1 wherein said aqueous polymer composition is clear.

5. A surface-protecting formulation comprising:

the polymer composition of claim 1; and

a component selected from the group consisting of fillers, anti-fungal and anti-microbial agents, pigments, perfumes, surfactants, builders, co-builders, anti-oxidants, enzymes, brighteners, dispersants, anti-foaming agents, preservatives, water-softening agents, sunscreen agents and mixtures thereof.

6. The composition of claim 5 wherein said film formed from said polymer composition is insoluble in water.

7. The formulation of claim 5 comprising no volatile base.

8. The formulation of claim 5 further comprising sodium hydroxide.

9. The formulation of claim 5 wherein said copolymer further comprises an acid functionality.

10. The formulation of claim 5 wherein said film formed from said copolymer composition is removable using an acid or alkaline cleaning solution.

11. The formulation of claim 5 wherein said copolymer further comprises a star polymer.

12. The formulation of claim 5 wherein said aqueous polymer composition is clear.

13. The formulation of claim 5 wherein said hydrophilic monomer is cationic, anionic or amphoteric.

14. The formulation of claim 5 comprising from 0.00001 to 40 percent by weight of said aqueous polymer composition, based on the surface-protecting formulation.

15. The formulation of claim 5 comprising 0.1 to 20 percent by weight of said copolymer n a solids/solids basis.

16. A process for imparting water resistance to a substrate comprising applying to a substrate the surface-protecting formulation of claim 5.

20. The process comprising the use of the polymer of claim 1 in an application selected from the group consisting of fabric cleaning, hard surface cleaning, fabric softening, autodish washing, control release, textile processing, oilfield processing, water treatment, metal working, personal care product formulating, fabric protection, and paint formulation.

17. A coated substrate comprising:

a substrate;

a film on at least one surface of said substrate formed from the aqueous polymer composition of claim.

18. The coated substrate of claim 17 wherein said film is applied to said substrate by spray, brushing, immersion, or flow-through.

19. One or more computer readable media as recited in claim 18, wherein the indexing structure contains a root and zero or more intervening nodes between the root and the leaf nodes, further comprising computer-executable instructions that, when executed, direct a computing device to authenticity of the root and any intervening nodes on a path from the root to the leaf node associated with the target encrypted block.