Method of using a sensor gas to determine erosion level of consumable system components
First Claim
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1. A method of monitoring erosion of a system component in a plasma processing system, the method comprising:
- exposing a system component having a gas emitter to a plasma process, wherein the gas emitter comprises a discrete cavity having a predetermined shape and is embedded within the system component to contain a sensor gas therein; and
monitoring the plasma processing system for release of a sensor gas from the gas emitter during said process to determine erosion of the system component.
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Abstract
A method and system are provided for monitoring erosion of system components in a plasma processing system. The system components contain a gas emitter that can release a sensor gas into a plasma process environment. The sensor gas can produce characteristic fluorescent light emission when exposed to a plasma. The method can evaluate erosion of system components in a plasma, by monitoring fluorescent light emission and a mass signal from the sensor gas. Consumable system components that can be monitored using the method include rings, shields, electrodes, baffles, and liners.
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Citations
51 Claims
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1. A method of monitoring erosion of a system component in a plasma processing system, the method comprising:
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exposing a system component having a gas emitter to a plasma process, wherein the gas emitter comprises a discrete cavity having a predetermined shape and is embedded within the system component to contain a sensor gas therein; and monitoring the plasma processing system for release of a sensor gas from the gas emitter during said process to determine erosion of the system component. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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16. A plasma processing system, comprising:
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a plasma processing chamber; a plasma source configured to create a plasma from a process gas; a system component having a gas emitter, wherein the gas emitter comprises a discrete cavity having a predetermined shape and is embedded within the system component to contain a sensor gas therein; a monitoring system configured to monitor for the release of the sensor gas from the gas emitter to determine erosion level of the system component; and a controller configured to control the plasma processing system. - View Dependent Claims (17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31)
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32. A monitorable consumable system component, comprising:
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a system element that is consumed during processing performed by the system; and a gas emitter being a discrete cavity having a predetermined shape and embedded within the system element to contain a sensor gas therein. - View Dependent Claims (33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46)
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47. A monitorable consumable system component, comprising:
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a system element that is consumed during processing performed by the system; and a gas emitter containing a sensor gas coupled to the system element, further comprising a gas supply line configured to connect said gas emitter to a sensor gas source that supplies said sensor gas to the gas emitter.
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48. A method of monitoring erosion of a system component in a plasma processing system, the method comprising:
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exposing a system component having a gas emitter to a plasma process; and monitoring the plasma processing system for release of a sensor gas from the gas emitter during said process to determine erosion of the system component, wherein said monitoring comprises monitoring for release of said sensor gas from said gas emitter, a supply of sensor gas being supplied from a gas source to said gas emitter.
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49. A plasma processing system, comprising:
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a plasma processing chamber; a plasma source configured to create a plasma from a process gas; a system component having a gas emitter, wherein the gas emitter contains a sensor gas; a monitoring system configured to monitor for the release of the sensor gas from the gas emitter to determine erosion level of the system component; and a controller configured to control the plasma processing system, further comprising; a sensor gas source configured to provide a supply of said sensor gas; and a gas supply line configured to connect said gas emitter to said sensor gas source in order to supply said sensor gas to said gas emitter.
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50. A method of monitoring erosion of a system component in a plasma processing system, the method comprising:
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providing the system component in plasma processing system, the system component having a first gas emitter at a first spatial location along an area of the system component, and a second gas emitter at a second spatial location along the area of the system component; exposing the system component to a plasma process; and monitoring the plasma processing system for a first sensor gas from the first gas emitter and a second sensor gas from the second gas emitter during the plasma process in order to determine erosion of the system component at the first and second spatial locations, wherein the first and second process gas are different from one another.
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51. A monitorable consumable system component, comprising:
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a system element that is consumed during processing performed by the system;
a first gas emitter embedded within the system component at a first spatial location along an area of the system element; anda second gas emitter embedded within the system element at a second spatial location along an area of the system component, wherein the first gas emitter contains a first sensor gas and the second gas emitter contains a second sensor gas different from the first sensor gas.
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Specification