Fast high-accuracy multi-dimensional pattern inspection
DC CAFCFirst Claim
1. A geometric pattern matching method for refining an estimate of a true pose of an object in a run-time image, the method comprising:
- generating a low-resolution model pattern using a training image, the low-resolution model pattern including a geometric description of the expected shape of the object at a low spatial resolution, each geometric description including a list of pattern boundary points;
generating a high-resolution model pattern using the training image, the high-resolution model pattern including a geometric description of the expected shape of the object at a high spatial resolution, each geometric description including a list of pattern boundary points;
receiving a starting pose, the starting pose representing an initial estimate of the true pose of the object in the run-time image;
receiving a run-time image;
using the low-resolution model pattern, and the starting pose, analyzing the run-time image so as to provide a low-resolution pose that is a more refined estimate of the true pose than the starting pose; and
using the high-resolution model pattern, and the low-resolution pose, analyzing the run-time image so as to provide a high-resolution pose that is a more refined estimate of the true pose than the low-resolution pose.
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Abstract
A method and apparatus are provided for identifying differences between a stored pattern and a matching image subset, where variations in pattern position, orientation, and size do not give rise to false differences. The invention is also a system for analyzing an object image with respect to a model pattern so as to detect flaws in the object image. The system includes extracting pattern features from the model pattern; generating a vector-valued function using the pattern features to provide a pattern field; extracting image features from the object image; evaluating each image feature, using the pattern field and an n-dimensional transformation that associates image features with pattern features, so as to determine at least one associated feature characteristic; and using at least one feature characteristic to identify at least one flaw in the object image. The invention can find at least two distinct kinds of flaws: missing features, and extra features. The invention provides pattern inspection that is faster and more accurate than any known prior art method by using a stored pattern that represents an ideal example of the object to be found and inspected, and that can be translated, rotated, and scaled to arbitrary precision much faster than digital image re-sampling, and without pixel grid quantization errors. Furthermore, since the invention does not use digital image re-sampling, there are no pixel quantization errors to cause false differences between the pattern and image that can limit inspection performance.
41 Citations
55 Claims
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1. A geometric pattern matching method for refining an estimate of a true pose of an object in a run-time image, the method comprising:
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generating a low-resolution model pattern using a training image, the low-resolution model pattern including a geometric description of the expected shape of the object at a low spatial resolution, each geometric description including a list of pattern boundary points; generating a high-resolution model pattern using the training image, the high-resolution model pattern including a geometric description of the expected shape of the object at a high spatial resolution, each geometric description including a list of pattern boundary points; receiving a starting pose, the starting pose representing an initial estimate of the true pose of the object in the run-time image; receiving a run-time image; using the low-resolution model pattern, and the starting pose, analyzing the run-time image so as to provide a low-resolution pose that is a more refined estimate of the true pose than the starting pose; and using the high-resolution model pattern, and the low-resolution pose, analyzing the run-time image so as to provide a high-resolution pose that is a more refined estimate of the true pose than the low-resolution pose. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29)
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30. A geometric pattern matching method for refining an estimate of a true pose of an object in a run-time image, the method comprising:
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storing a plurality of model patterns, each model pattern including a geometric description of the expected shape of the object at a respective spatial resolution, each geometric description including a list of pattern boundary points; providing a starting pose that represents an initial estimate of the true pose of the object in the run-time image; using the starting pose and a lowest-resolution model pattern to determine an intermediate estimate of the true pose of the object in the run-time image; using the intermediate estimate of the true pose from the previous step, and the next-higher resolution stored model pattern, to determine a further refined intermediate estimate of the true pose of the object in the run-time image; and using a further refined intermediate estimate of the true pose as the final estimate of the true pose of the object in the run-time image. - View Dependent Claims (31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50, 51, 52, 53, 54, 55)
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Specification