Atmospheric glow discharge with concurrent coating deposition
First Claim
1. A method for manufacturing a coated substrate by a process of vapor deposition and concurrent glow-discharge plasma treatment at substantially atmospheric pressure, comprising the following steps:
- providing a first electrode and a second electrode separated by a dielectric material and facing a process space;
applying a voltage across the electrodes;
mixing a vaporized precursor with a plasma gas;
diffusing the vaporized precursor and plasma gas through a porous material into the process space at substantially atmospheric pressure;
depositing the vaporized precursor over said substrate; and
curing the precursor to produce a polymeric film.
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Accused Products
Abstract
A plasma is produced in a treatment space by diffusing a plasma gas at atmospheric pressure and subjecting it to an electric field created by two metallic electrodes separated by a dielectric material, a precursor material is mixed with the plasma, and a substrate film or web is coated by vapor deposition of the vaporized substance at atmospheric pressure in the plasma field. The deposited precursor is cured by electron-beam, infrared-light, visible-light, or ultraviolet-light radiation, as most appropriate for the particular material being-deposited. Plasma pre-treatment and post-treatment steps are used to enhance the properties of the resulting coated products. Similar results are obtained by atomizing and spraying the liquid precursor in the plasma field.
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Citations
28 Claims
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1. A method for manufacturing a coated substrate by a process of vapor deposition and concurrent glow-discharge plasma treatment at substantially atmospheric pressure, comprising the following steps:
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providing a first electrode and a second electrode separated by a dielectric material and facing a process space; applying a voltage across the electrodes; mixing a vaporized precursor with a plasma gas; diffusing the vaporized precursor and plasma gas through a porous material into the process space at substantially atmospheric pressure; depositing the vaporized precursor over said substrate; and curing the precursor to produce a polymeric film. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 24)
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13. A method for manufacturing a coated substrate by a process of vapor deposition and concurrent glow-discharge plasma treatment at substantially atmospheric pressure, comprising the following steps:
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providing a first electrode and a second electrode separated by a dielectric material and facing a process space; applying a voltage across the electrodes; diffusing a plasma gas through a porous material into the process space at substantially atmospheric pressure; depositing a vaporized precursor over said substrate upstream of the process space; and curing the precursor to produce a polymeric film. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 25, 26, 27, 28)
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Specification