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Reduction of oxides in a fluid-based switch

  • US 7,071,432 B2
  • Filed: 07/26/2005
  • Issued: 07/04/2006
  • Est. Priority Date: 04/14/2003
  • Status: Expired due to Fees
First Claim
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1. A method, comprising:

  • in an environment having a low partial pressure of oxygen, wherein the low partial pressure of oxygen is at or below a critical limit to reduce formation of oxides;

    i) depositing a switching fluid on a first substrate; and

    ii) mating the first substrate to a second substrate, the first substrate and the second substrate defining therebetween a cavity holding the switching fluid, the cavity being sized to allow movement of the switching fluid between first and second states.

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