Alternating phase-shift mask inspection method and apparatus

• US 7,072,502 B2
• Filed: 06/07/2001
• Issued: 07/04/2006
• Est. Priority Date: 06/07/2001
• Status: Expired due to Term

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Goldenshtein, Alex, Hemar, Shirley, Greenberg, Gadi, Friedman, Mula, Kenan, Boaz
• Primary Examiner(s): Mehta, Bhavesh M.
• Assistant Examiner(s): Strege, John B.
• Application Number:
  US09/876,955
• Publication Number:
  US 20020186879A1
• Time in Patent Office: 1,853 Days
• Field of Search: 382/144, 382/149, 356/237.1, 430/5, 430/30, 250/559, 250/45, 348/125, 348/126
• US Class Current: 382/144
• CPC Class Codes: G01N 21/95607 using a comparative method
• CPC Class Codes: G03F 1/30 Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof
• CPC Class Codes: G03F 1/84 Inspecting
• CPC Class Codes: G03F 7/70483 Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring

Abstract

A reticle inspection system and method for complete and fast inspection of phase shift mask reticles, both for incoming inspection and for periodic and pre-exposure inspection tool, is employable by facilities such as mask shops as an inspection tool compatible to the mask shop'"'"'s customers. The inventive system and method detect phase errors in an aerial image by acquiring the image of the phase shift mask under the same optical conditions as the exposure conditions (i.e. wavelength, numerical aperture, sigma, and illumination aperture type). Images are acquired at a positive out-of-focus and a negative out-of-focus, and are compared in order to enhance possible phase error. The term “phase error” refers to the acceptable range of the phase deviation from the programmed 180° on the phase shift mask, by using the exposure system to achieve the image on the photoresist, satisfying the requirements of the wafer specification.

Claims

1. A method for inspecting a phase shift mask that is used with a photolithographic optical exposure system under a set of exposure conditions, said method comprising:

acquiring a plurality of aerial images produced by said phase shift mask using a transmitted light, said plurality of aerial images being acquired in an aerial imaging inspection system and within a process window of said exposure system by emulating said set of exposure conditions;

said plurality of aerial images including a first and a second aerial image produced by said phase shift mask;

wherein said first aerial image produced by said phase shift mask is in a first out of focus condition, and said second aerial image produced by said phase shift mask is in a second out of focus condition; and

comparing said first and said second aerial images to each other to detect phase defects and errors in said phase shift mask, wherein

said first and said second aerial images are concurrently produced from the same light transmitted by the mask; and

,

wherein prior to said comparison step, said first and second aerial images are transformed to simulate a behavior of an exposure system and photoresist.

2. The method of claim 1, wherein said first out of focus condition is a positive out of focus condition, and said second out of focus condition is a negative out of focus condition.

3. The method of claim 1, wherein said acquired aerial images produced by said phase shift mask are magnified in relation to corresponding images created on photoresist by said optical exposure system using said phase shift mask.

4. The method of claim 1, further comprising automatically processing results of said comparison.

5. The method of claim 1, further comprising using results of said comparison to produce a map of said variations in said phase of said phase shift mask for the entire phase shift mask.

6. The method of claim 1, wherein said transmitted light is provided using a pulsating light source.

7. The method of claim 6, wherein said pulsating light source is a pulsating laser.

8. The method of claim 1, wherein said acquiring said plurality of aerial images comprises providing continuous relative movement between said transmitted light and said phase shift mask.

9. The method of claim 6, wherein said acquiring said plurality of aerial images comprises providing continuous relative movement between said laser and said phase shift mask.

10. An apparatus for inspecting a phase shift mask that is used with an optical exposure system under a set of exposure conditions, said apparatus comprising:

a scanner for acquiring a plurality of aerial images produced by light transmitted through said phase shift mask while emulating said set of exposure conditions;

said plurality of aerial images generated by said phase shift mask comprising a first and a second aerial image generated by said phase shift mask;

wherein said first aerial image generated by said phase shift mask is in a first out of focus condition, and said second aerial image generated by said phase shift mask is in a second out of focus condition; and

an image processing module for detecting variations in phase of said phase shift mask by, first transforming said first and second aerial images to simulate a behavior of an exposure system and photoresist and then comparing said first and said second aerial images generated by said phase shift mask to each other, wherein

said first and said second aerial images are concurrently produced from the same light transmitted by the mask.

11. The apparatus according to claim 10, wherein said first out of focus condition is a positive out of focus condition, and said second out of focus condition is a negative out of focus condition.

12. The apparatus according to claim 10, wherein said scanner comprises a plurality of cameras for acquiring said plurality of aerial images generated by said phase shift mask.

13. The apparatus according to claim 12, wherein said plurality of cameras comprises:

a first camera for acquiring said first image generated by said phase shift mask; and

a second camera for acquiring said second image generated by said phase shift mask.

14. The apparatus according to claim 13, wherein:

said first camera is out of focus in a positive direction; and

said second camera is out of focus in a negative direction.

15. The apparatus according to claim 12, wherein:

said scanner further comprises a light source for illuminating said phase shift mask with an illuminating light; and

said plurality of cameras are sensitive to said illuminating light.

16. The apparatus according to claim 15, wherein said light source is a pulsating light source.

17. The apparatus according to claim 16, wherein said pulsating light source is a pulsating laser.

18. The apparatus according to claim 10, further comprising a means for effecting continuous relative movement between said scanner and said phase shift mask.

19. The apparatus according to claim 16, further comprising a means for effecting continuous relative movement between said laser and said phase shift mask.

20. The apparatus according to claim 13, wherein said scanner further comprises:

a transmission light illumination system for illuminating said phase shift mask; and

an optical system for collecting light emerging from said phase shift mask and creating aerial images generated by said phase shift mask in said first and said second cameras.

21. The apparatus according to claim 20, wherein said optical system of said scanner further comprises a numerical aperture diaphragm for reproducing said set of exposure conditions.

22. An apparatus for inspecting a phase shift mask that is used with an optical exposure system under a set of exposure conditions, said apparatus comprising:

a light source;

transmission light illumination means for illuminating said phase shift mask;

optical means for producing a plurality of magnified aerial images generated by said phase shift mask while emulating said set of exposure conditions, said optical means having a numerical aperture diaphragm for reproducing said set of exposure conditions;

imaging means for acquiring said plurality of magnified aerial images generated by said phase shift mask;

said plurality of aerial images generated by said phase shift mask comprising a first and a second aerial images generated by said phase shift mask;

wherein said first aerial image generated by said phase shift mask is in a first out of focus condition, and said second aerial image generated by said phase shift mask is in a second out of focus condition; and

image processing means for analyzing a condition of said phase shift mask using said plurality of aerial images generated by said phase shift mask, wherein said first and said second aerial images generated by said phase shift mask are first transformed to simulate the behavior of an exposure system and a photoresist and then compared to each other and said first and said second aerial images are concurrently produced from the same light transmitted by the mask.

23. The apparatus according to claim 22, wherein said first out of focus condition is a positive out of focus condition, and said second out of focus condition is a negative our of focus condition.

24. The apparatus according to claim 22, wherein said light source is a pulsating light source.

25. The apparatus according to claim 24, wherein said pulsating light source is a pulsating laser.

26. The apparatus according to claim 22, further comprising a means for effecting continuous relative movement between said scanner and said phase shift mask.

27. The apparatus according to claim 25, further comprising a means for effecting continuous relative movement between said laser and said phase shift mask.

28. The apparatus according to claim 22, wherein said imaging means further comprises a plurality of cameras for acquiring said plurality of magnified aerial images generated by said phase shift mask when the phase shift mask is illuminated by said transmission light illumination means.

29. The apparatus according to claim 28, wherein said plurality of cameras comprises:

a first camera for acquiring said first image generated by said phase shift mask;

a second camera for acquiring said second image generated by said phase shift mask; and

said first and said second aerial images generated by said phase shift mask being respectively acquired by said first and said second cameras when the phase shift mask is illuminated by said transmission light illumination means.

30. The apparatus according to claim 29, wherein:

said first camera is out of focus in a positive direction; and

said second camera is out of focus in a negative direction.

31. The apparatus according to claim 22, further comprising a post process and review means for displaying said condition of said phase shift mask in a graphical form.

32. The apparatus according to claim 29, wherein:

a wavelength of the light source is identical to the wavelength of the exposure system; and

said first and said second cameras are sensitive to said spectrum of said light source.

33. The apparatus according to claim 22 further comprising a homogenizer disposed in the vicinity of said transmission light illumination means for reducing speckle resulting from use of said light source.