Low on resistance power MOSFET with variably spaced trenches and offset contacts
First Claim
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1. A MOS-gated semiconductor power device comprising:
- a semiconductor body having a first major surface and a second opposing major surface;
a base region of a first conductivity type formed in said semiconductor body below said first major surface;
a first trench and a second trench formed in said semiconductor body, said first trench being spaced from said second trench by a first semiconductor region and a second semiconductor region, said first region being wider than said second region, and including access to said base region;
a gate structure formed in each of said trenches;
a conductive region of a second conductivity type formed adjacent each of said trenches; and
an external contact in electrical contact with said conductive regions of said second conductivity type and said base region at said first region;
wherein said trenches follow a serpentine path, wherein said trenches advance along a common direction of advancement, and wherein said serpentine path is comprised of smooth curves that together form a sinusoidal pattern.
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Abstract
A power semiconductor device of the trench variety in which the trenches follow a serpentine path.
38 Citations
10 Claims
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1. A MOS-gated semiconductor power device comprising:
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a semiconductor body having a first major surface and a second opposing major surface; a base region of a first conductivity type formed in said semiconductor body below said first major surface; a first trench and a second trench formed in said semiconductor body, said first trench being spaced from said second trench by a first semiconductor region and a second semiconductor region, said first region being wider than said second region, and including access to said base region; a gate structure formed in each of said trenches; a conductive region of a second conductivity type formed adjacent each of said trenches; and an external contact in electrical contact with said conductive regions of said second conductivity type and said base region at said first region;
wherein said trenches follow a serpentine path, wherein said trenches advance along a common direction of advancement, and wherein said serpentine path is comprised of smooth curves that together form a sinusoidal pattern. - View Dependent Claims (2, 3, 4)
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5. A MOS-gated semiconductor power device comprising:
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a silicon body having a first major surface and a second opposing major surface, and including a substrate portion and an epitaxial portion formed over a major surface of said substrate portion; a base region of a first conductivity type formed in said epitaxial portion below said first major surface of said silicon body; a first trench and a second trench formed in said epitaxial portion, said first trench being spaced from said second trench by a first silicon region and a second silicon region, said first region being wider than said second region; a gate structure formed in each of said trenches; a conductive region of a second conductivity type formed adjacent each of said trenches; and an external contact in electrical contact with said conductive regions of said second conductivity type and making electrical connection to said base region;
wherein said trenches follow a serpentine path, and wherein said serpentine path is generally sinusoidal and is comprised of smooth curves that alternately change direction. - View Dependent Claims (6, 7, 8, 9, 10)
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Specification