×

Semiconductor laser apparatus and production method thereof

  • US 7,075,960 B2
  • Filed: 01/09/2004
  • Issued: 07/11/2006
  • Est. Priority Date: 01/10/2003
  • Status: Expired due to Fees
First Claim
Patent Images

1. A semiconductor laser apparatus comprising:

  • a semiconductor substrate whose main surface has a recess, a side wall of the recess having an optical reflector that receives a laser beam and reflects the received laser beam outward in a substrate-thickness direction;

    a semiconductor laser element that is deposited in the recess and emits the laser beam toward the optical reflector in a direction substantially parallel to the main surface of the semiconductor substrate;

    a heat sink layer that is formed in a bottom face of the recess so as to adjust a position of the semiconductor laser element in the substrate-thickness direction and to let heat, which is generated as the semiconductor laser element operates, escape toward the semiconductor substrate;

    a bonding layer formed in contact with a surface, which faces the bottom face of the recess, of the semiconductor laser element; and

    a diffusion preventing layer that is embedded between the heat sink layer and the bonding layer, possesses electrical conductivity, and prevents a diffusion from occurring between the heat sink layer and the bonding layer.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×