×

Exposure head, exposure apparatus, and application thereof

  • US 7,077,972 B2
  • Filed: 04/13/2005
  • Issued: 07/18/2006
  • Est. Priority Date: 04/10/2002
  • Status: Active Grant
First Claim
Patent Images

1. A method of forming a minute channel, the method comprising the steps of:

  • exposing a resist film formed on a substrate with a laser beam having a wavelength of 350 nm to 450 nm, which laser beam is spatially modulated according to forming pattern data of the minute channel;

    partially removing the resist film according to an exposure pattern to form a resist film having a predetermined pattern; and

    etching the substrate surface to form the minute channel, by using the resist film having the predetermined pattern.

View all claims
  • 4 Assignments
Timeline View
Assignment View
    ×
    ×