Exposure head, exposure apparatus, and application thereof
First Claim
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1. A method of forming a minute channel, the method comprising the steps of:
- exposing a resist film formed on a substrate with a laser beam having a wavelength of 350 nm to 450 nm, which laser beam is spatially modulated according to forming pattern data of the minute channel;
partially removing the resist film according to an exposure pattern to form a resist film having a predetermined pattern; and
etching the substrate surface to form the minute channel, by using the resist film having the predetermined pattern.
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Abstract
A method of creating a micro-channel in a substrate surface by exposing a resist film with a laser beam, removing the exposed resist film per the predetermined pattern, and etching the substrate using the predetermined pattern to form the micro-channel.
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5 Claims
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1. A method of forming a minute channel, the method comprising the steps of:
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exposing a resist film formed on a substrate with a laser beam having a wavelength of 350 nm to 450 nm, which laser beam is spatially modulated according to forming pattern data of the minute channel; partially removing the resist film according to an exposure pattern to form a resist film having a predetermined pattern; and etching the substrate surface to form the minute channel, by using the resist film having the predetermined pattern. - View Dependent Claims (2, 3, 4, 5)
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Specification