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Step and repeat imprint lithography processes

  • US 7,077,992 B2
  • Filed: 07/11/2002
  • Issued: 07/18/2006
  • Est. Priority Date: 07/11/2002
  • Status: Active Grant
First Claim
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1. A method of forming a pattern on a substrate, the method comprising:

  • applying a first predetermined volume of an activating light curable liquid to a first portion of the substrate in a first predetermined pattern;

    positioning a patterned template and the substrate in a first spaced relation to each other so that a first gap is created between the patterned template and the substrate, wherein the first gap is established such that the activating light curable liquid contacts substantially an entirety of a first patterning area of the patterned template but does not substantially extend past a perimeter of the first patterning area;

    applying an activating light to the activating light curable liquid, wherein the application of the activating light substantially cures the activating light curable liquid, forming a first patterned area of a cured liquid;

    separating the patterned template from the cured liquid;

    applying a second predetermined volume of the activating light curable liquid to a second portion of the substrate in a second predetermined pattern;

    positioning the patterned template and the substrate in a second spaced relation to each other so that a second gap is created between the patterned template and the substrate, wherein the second gap is established such that the activating light curable liquid contacts substantially an entirety of a second patterning area of the patterned template but does not substantially extend past the perimeter of the second patterning area; and

    applying the activating light to the activating light curable liquid on the second portion of the substrate, wherein the application of the activating light substantially cures the activating light curable liquid on the second portion of the substrate, forming a second patterned area.

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