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Antenna structure for inductively coupled plasma generator

  • US 7,079,085 B2
  • Filed: 01/27/2004
  • Issued: 07/18/2006
  • Est. Priority Date: 07/30/2001
  • Status: Expired due to Fees
First Claim
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1. An antenna for an inductively coupled plasma generator with a chamber for processing an object received in the chamber with plasma, the antenna comprising:

  • a set of at least two loop antenna elements each having a powered end for applying radio frequency power thereto and a ground end for connecting to a ground, each of the loop antenna elements disposed adjacent to one another and in generally parallel relation with one another, each of the loop antenna elements having a lowered portion at a central area between the powered end and the ground end thereof such that the powered end and the ground end of each of the loop antenna elements are disposed at a location far from the chamber of the plasma generator and the lowered portion of each of the loop antenna elements are disposed at a location closer to the chamber.

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