Antenna structure for inductively coupled plasma generator
First Claim
1. An antenna for an inductively coupled plasma generator with a chamber for processing an object received in the chamber with plasma, the antenna comprising:
- a set of at least two loop antenna elements each having a powered end for applying radio frequency power thereto and a ground end for connecting to a ground, each of the loop antenna elements disposed adjacent to one another and in generally parallel relation with one another, each of the loop antenna elements having a lowered portion at a central area between the powered end and the ground end thereof such that the powered end and the ground end of each of the loop antenna elements are disposed at a location far from the chamber of the plasma generator and the lowered portion of each of the loop antenna elements are disposed at a location closer to the chamber.
1 Assignment
0 Petitions
Accused Products
Abstract
An antenna structure for an inductively coupled plasma generator suitable for processing large-diameter wafers or large, flat-panel display devices by making a plasma density distribution uniform and symmetrical with respect to a rotating direction inside a circular or rectangular chamber in which a wafer is processed. In the antenna structure having a powered end to which RF power is applied and a ground end connected to the ground, at least two loop antenna elements are disposed electrically in parallel with each other, the powered ends and ground ends of the respective antennas are disposed symmetrically with respect to the center of the antennas, and the antennas crossing each other such that the powered ends and ground ends thereof are disposed at a part far from a chamber and central parts thereof are disposed at a part close to the chamber.
-
Citations
11 Claims
-
1. An antenna for an inductively coupled plasma generator with a chamber for processing an object received in the chamber with plasma, the antenna comprising:
a set of at least two loop antenna elements each having a powered end for applying radio frequency power thereto and a ground end for connecting to a ground, each of the loop antenna elements disposed adjacent to one another and in generally parallel relation with one another, each of the loop antenna elements having a lowered portion at a central area between the powered end and the ground end thereof such that the powered end and the ground end of each of the loop antenna elements are disposed at a location far from the chamber of the plasma generator and the lowered portion of each of the loop antenna elements are disposed at a location closer to the chamber. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
-
11. An antenna for an inductively coupled plasma generator with a chamber for processing an object received in the chamber with plasma, wherein an internal antenna and an external antenna, each rectangular shaped, are parallel connected to each other, the internal antenna being installed such that two rectangular antenna elements are symmetrically superposed in two-ply loops, and the external antenna being installed such that four L-shaped antenna elements, each having two sides, are symmetrically disposed in two-ply loops, and wherein each powered end is disposed farthest from the chamber and each ground end is disposed near to the chamber.
Specification