Lithographic apparatus and device manufacturing method

• US 7,079,225 B2
• Filed: 09/14/2004
• Issued: 07/18/2006
• Est. Priority Date: 09/14/2004
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Baselmans, Johannes Jacobus Matheus, Vink, Henri Johannes Petrus, De Jager, Pieter Willem Herman, Bruinsma, Anastasius Jacobus Anicetus
• Primary Examiner(s): Nguyen, Henry Hung
• Application Number:
  US10/939,947
• Publication Number:
  US 20060055905A1
• Time in Patent Office: 672 Days
• Field of Search: 355/53, 355/55, 355 67- 71, 250/548, 356399-401
• US Class Current: 355/67
• CPC Class Codes: G03F 7/70058 Mask illumination systems
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70583 Speckle reduction, e.g. coherence control or amplitude/wavefront splitting

Abstract

Use of a refraction grating to divide a beam of radiation into a plurality of sub-beams that are each directed onto an array of individually controllable elements, modulated thereby and projected onto a substrate as an array of spots.

Claims

1. A lithographic apparatus, comprising:

an illumination system that supplies a beam of radiation;

an array of cylindrical lenses arranged so that their elongated axes are parallel and so that each cylindrical lens of the array of cylindrical lenses receives a respective portion of the beam perpendicular to its elongated axis, the array of cylindrical lenses dividing the beam of radiation into a plurality of sub-beams of radiation;

an array of individually controllable elements being configured such that the plurality of sub-beams of radiation are directed onto corresponding individually controllable elements in said array of individually controllable elements to pattern the plurality of sub-beams of radiation; and

a projection system that projects the patterned plurality of sub-beams of radiation onto a target portion of a substrate.

2. The lithographic apparatus of claim 1, further comprising:

a second array of cylindrical lenses, wherein the beam of radiation passes consecutively through the first and the second arrays of cylindrical lenses.

3. The lithographic apparatus of claim 2, wherein the cross-sections of the cylindrical lenses in at least one of the first and second arrays of cylindrical lenses are substantially the same.

4. The lithographic apparatus of claim 2, wherein a distribution of intensities of the sub-beams of radiation is provided by at least one of:

a shape of the lenses in at least one of the first or the second array of cylindrical lenses;

a width of at least one of the first or the second array of cylindrical lenses;

a separation between the cylindrical lenses in at least one of the first and the second arrays of cylindrical lenses;

cross-sections of the lenses varying across at least one of the first or the second array of cylindrical lenses;

a radiation intensity profile of the beam of radiation incident on the first array of cylindrical lenses; and

one or more attenuators located between the first and the second array of cylindrical lenses and the array of individually controllable elements.

5. The lithographic apparatus of claim 1, wherein each of the plurality of sub-beams of radiation is focused onto one or more of the individually controllable elements.

6. The lithographic apparatus of claim 1, wherein a single lens or lens group is used to focus all of the plurality of sub-beams of radiation onto the array of individually controllable elements.

7. The lithographic apparatus of claim 6, further comprising:

an array of focusing elements that focus the patterned plurality of sub-beams of radiation from the array of individually controllable elements onto a plurality of spots on the substrate.

8. The lithographic apparatus of claim 7, wherein said single lens or lens group further directs the patterned plurality of sub-beams of radiation from the arrays of individually controllable elements onto the array of the focusing elements.

9. The lithographic apparatus of claim 1, wherein:

the illumination system provides at least a further beam of radiation, and

the beam of radiation and the at least a further beam of radiation are directed onto the first array of cylindrical lenses and each of the beam of radiation and the at least a further beam of radiation is divided into respective plurality of sub-beams of radiation.

10. The lithographic apparatus of claim 9, wherein the beam of radiation and the at least a further beam of radiation are directed onto the first array of cylindrical lenses at an angle relative to each other, such that at least one of the plurality of sub-beams of radiation derived from the beam of radiation and the at least a further beam of radiation coincides.

11. The lithographic apparatus of claim 10, wherein the beam of radiation and the at least a further beam of radiation provided by the illumination system are parallel to each other and are directed onto the first array of cylindrical lenses at relative angles by a lens or lens group.

15. The lithographic apparatus of claim 2, wherein the lenses of the second array of cylindrical lenses are arranged such that their elongate axes are perpendicular to those of the first array of cylindrical lenses.

16. The lithographic apparatus of claim 1, further comprising:

a first optical device that directs each of the plurality of sub-beams of radiation onto a target portion of the array of individually controllable elements; and

a second optical device that directs each of the patterned plurality of sub-beams of radiation from a corresponding one of the target portions of the individually controllable elements onto a corresponding section of the target portion of the substrate.

17. The lithographic apparatus of claim 1, wherein the array of cylindrical lenses is configured to diffract the beam of radiation to form the plurality of sub-beams of radiation.

12. A device manufacturing method, comprising:

(a) providing a beam of radiation perpendicular to respective elongated axes of an array of cylindrical lenses;

(b) dividing the beam of radiation into a plurality of sub-beams using the array of cylindrical lenses;

(c) patterning each one of the plurality of said sub-beams using selected individually controllable elements in an array of individually controllable elements;

(d) projecting the patterned sub-beams of radiation onto a target portion of a substrate.

13. The method of claim 12, wherein before step (c) the method further comprises:

dividing the sub-beams of radiation using another array of cylindrical lenses.

14. The method of claim 12, wherein step (b) comprises diffracting the beam of radiation using the array of cylindrical lenses to form the plurality of sub-beams.