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Lithographic actuator mechanism, lithographic apparatus, and device manufacturing method

  • US 7,079,226 B2
  • Filed: 03/11/2004
  • Issued: 07/18/2006
  • Est. Priority Date: 03/11/2003
  • Status: Active Grant
First Claim
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1. A lithographic apparatus, comprising:

  • a radiation system configured to provide a beam of radiation;

    a support structure configured to support a patterning device is, said patterning configured to impart a pattern to said beam of radiation;

    a substrate holder configured to hold a substrate;

    a projection system that projects said patterned beam onto a target portion of said substrate; and

    an actuator configured to position at least one part within said radiation system, said support structure, said substrate holder, or said projection system, said actuator comprising a coil arrangement that includes a plurality of coils separated train each other by one or more separation layers of high thermal conductivity material arranged to be in substantial thermal contact with at least one cooling element that circulates coolant fluid and is distinct from said one or more separation layers.

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