Methods and apparatus for evaluating mechanical and thermal strains in electronic materials, semiconductor materials, and other structures

• US 7,079,257 B1
• Filed: 04/15/2003
• Issued: 07/18/2006
• Est. Priority Date: 04/08/2002
• Status: Expired due to Fees

• Current Assignee: Providence Health Systems
• Original Assignee: Providence Health System
• Inventors: Kirkpatrick, Sean J., Duncan, Donald D.
• Primary Examiner(s): Toatley, Gregory J.
• Assistant Examiner(s): Lyons, Michael A.
• Application Number:
  US10/414,707
• Time in Patent Office: 1,190 Days
• Field of Search: 356/502, 356/504, 356/484, 356/488, 356/491, 356/35.5, 356/432, 356/496, 356/498, 73/18.2, 736/03
• US Class Current: 356/502
• CPC Class Codes: G01L 1/24 by measuring variations of optical properties of material when it is stressed, e.g. by photoelastic stress analysis using infrared, visible light, ultraviolet

Abstract

Methods for measuring strains in circuit substrates such as circuit boards and semiconductor wafers include illuminating a specimen with a substantially collimated laser flux. A temperature change is produced in the specimen and a series of laser speckle patterns produced by a laser flux scattered or reflected by the specimen is recorded. Localized strains are detected based on speckle pattern shifts that are calculated using the recorded speckle patterns. Stains can be recorded as a function of temperature or rate of change of temperature, and strains at one or more circuit substrate locations can be detected.

Claims

1. An apparatus for assessing strain, comprising:

a light source configured to deliver a light flux to a specimen and produce a speckle pattern;

a thermal source configured to produce a temperature change in at least a portion of the specimen;

an image capture device configured to receive a series of speckle patterns produced by the light flux and associated with the temperature change produced by the thermal source; and

a signal processor configured to receive the series of speckle patterns and determine a speckle shift based on an estimated shifted speckle pattern obtained from the series of speckle patterns received by the image capture device.

2. The apparatus of claim 1, further comprising a memory configured to store the series of received speckle patterns.

3. The apparatus of claim 1, further comprising a lens configured so that the speckle pattern received by the image capture device is an imaged speckle pattern.

4. The apparatus of claim 1, wherein the image capture device is configured to receive two-dimensional speckle patterns.

5. The apparatus of claim 4, wherein the signal processor is configured to determine speckle shifts associated with a plurality of specimen locations.

6. The apparatus of claim 1, wherein the specimen includes a circuit element, and the thermal source is configured to provide an electrical signal to the circuit element.

7. The apparatus of claim 1, wherein the signal processor is configured to determine the speckle shift based on a maximum entropy method.

8. The apparatus of claim 1, wherein the signal processor is configured to determine the speckle shift based on a minimum mean square method.

9. The apparatus of claim 1, wherein the signal processor is configured to associate the speckle shift with a specimen strain.

10. An apparatus, comprising:

a thermal source configured to produced a temperature change in a specimen;

at least one light source configured to alternately illuminate a specimen at a first angle of incidence and a second angle of incidence, and produce a first series of speckle patterns and a second series of speckle patterns, respectively, wherein the speckle patterns are associated with the temperature change;

an image capture device configured to capture the first and second series of speckle patterns; and

a signal processor configured to determine first and second speckle shifts based on estimated shifted speckle patterns obtained with the first and second series of recorded speckle patterns.

11. The apparatus of claim 10, wherein the first angle of incidence and the second angle of incidence are approximately equal and opposite.

12. An apparatus for assessing a substrate, comprising:

a light source configured to illuminate the substrate and produce speckle patterns;

an image capture device configured to record the speckle patterns;

a thermal driver configured to produce a temperature change in at least a portion of the substrate; and

a speckle record processor configured to detect strain at at least one substrate location based on a shift in the speckle patterns recorded by the image capture device, wherein the speckle record processor obtains the shift based on estimated shifted speckle patterns obtained by processing the recorded speckle patterns.

13. The apparatus of claim 12, further comprising an indicator configured to provide an assessment metric based on the speckle shift.

14. The apparatus of claim 13, wherein the thermal driver is configured to produce the temperature change by applying an electrical signal to the substrate.

15. The apparatus of claim 12, wherein the speckle record processor is configured to estimate speckle shifts associated with at least two regions of the substrate.

16. A strain measurement apparatus, comprising:

a first laser diode configured to irradiate a specimen;

a second laser diode configure to irradiate the specimen;

a controller configured to alternately activate the first laser diode and the second laser diode;

an image capture device configured to detect a first series of speckle patterns associated with irradiation of the specimen with the first laser diode and a second set of speckle patterns associated with irradiation with the second laser diode; and

a signal processor configured to calculate a speckle pattern shift based the first set of speckle patterns and the second set of speckle patterns, wherein the signal processor is configured to produce estimated shifted speckle patterns from the first and second sets of speckle patterns, and to determine the speckle pattern shift based on the estimated shifted speckle patterns.

17. The apparatus of claim 16, wherein the first laser diode and the second laser diode are configured to irradiate the specimen at respective first and second angles of incidence selected to reduce contributions of specimen motion to the speckle pattern shift determined by the signal processor.

18. The apparatus of claim 17, where the image capture device is a linear diode array.

19. The apparatus of claim 17, where the image capture device is a CCD camera.

20. An apparatus for assessing strain, comprising:

a light source configured to deliver a light flux to a specimen and produce a speckle pattern;

a thermal source configured to produce a temperature change in at least a portion of the specimen;

an image capture device configured to receive a series of two-dimensional speckle patterns produced by the light flux and associated with the temperature change produced by the thermal source; and

a signal processor configured to receive the series of two-dimensional speckle patterns and determine a speckle shift associated with a plurality of specimen locations.

21. The apparatus of claim 20, further comprising a memory configured to store the series of received speckle patterns.

22. The apparatus of claim 20, further comprising a lens configured so that the speckle pattern received by the image capture device is an imaged speckle pattern.

23. The apparatus of claim 20, wherein the specimen includes a circuit element, and the thermal source is configured to provide an electrical signal to the circuit element.

24. The apparatus of claim 20, wherein the signal processor is configured to determine the speckle shift based on a maximum entropy method.

25. The apparatus of claim 20, wherein the signal processor is configured to determine the speckle shift based on a minimum mean square method.

26. The apparatus of claim 20, wherein the signal processor is configured to associate the speckle shift with a specimen strain.

27. An apparatus for assessing a substrate, comprising:

a light source configured to illuminate the substrate and produce speckle patterns;

an image capture device configured to record the speckle patterns;

a thermal driver configured to produce a temperature change in at least a portion of the substrate; and

a speckle record processor configured to detect strain at at least one substrate location based on a shift in the speckle patterns recorded by the image capture device, wherein the speckle record processor is configured to estimate speckle shifts associated with at least two regions of the substrate.

28. The apparatus of claim 27, further comprising an indicator configured to provide an assessment metric based on the speckle shift.

29. The apparatus of claim 28, wherein the thermal driver is configured to produce the temperature change by applying an electrical signal to the substrate.

30. An apparatus for strain detection, comprising:

means for generating a speckle pattern associated with a surface of a test sample;

means for thermally inducing a strain the sample;

means for recording a speckle pattern history; and

means for processing the speckle pattern history, wherein a test sample strains are detected at a plurality of test sample positions based on the processed speckle pattern history.