Mirror substrate, mirror body using the same, and optical device using mirror body
First Claim
1. A mirror substrate, wherein the substrate is made of a particle-dispersed silicon material composed of silicon carbide and silicon, and the surface of said substrate to be used as a reflecting surface is polished to a mirror finish,wherein the Vickers hardness of said mirror substrate is 1,500 Hv or more, the 3 point bending hardness is 500 MPa or more, and the thermal conductivity is 100 W/m-K or more.
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Accused Products
Abstract
The present invention adopts a particle dispersed silicon material, comprising silicon carbide as dispersion particles, as a mirror substrate, subjects the mirror substrate to mirror finish polishing to form a mirror body, forms a reflecting film on the mirror body to form a mirror, and uses the mirror to form a large aperture optical system.
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Citations
23 Claims
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1. A mirror substrate, wherein the substrate is made of a particle-dispersed silicon material composed of silicon carbide and silicon, and the surface of said substrate to be used as a reflecting surface is polished to a mirror finish,
wherein the Vickers hardness of said mirror substrate is 1,500 Hv or more, the 3 point bending hardness is 500 MPa or more, and the thermal conductivity is 100 W/m-K or more.
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12. A mirror substrate, wherein the substrate is made of a particle-dispersed silicon material composed of silicon carbide and silicon, and the surface of said substrate is to be used as a reflecting surface is polished to a mirror finish,
wherein the maximum diameter of the concavities and convexities, or pores on the surface of said mirror substrate is 40 nm or less.
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13. A mirror substrate made of a particle-dispersed silicon material composed of silicon carbide and silicon, and the surface of said substrate is to be used as a reflecting surface is polished to a mirror finish,
wherein a maximum diameter of concavities and convexities, or pores is 20 nm or less.
Specification