Lithographic projection apparatus and device manufacturing method utilizing two arrays of focusing elements

• US 7,081,944 B2
• Filed: 11/29/2005
• Issued: 07/25/2006
• Est. Priority Date: 12/22/2003
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: de Jager, Pieter Willem Herman
• Primary Examiner(s): RUTLEDGE, DELLA J
• Application Number:
  US11/288,134
• Publication Number:
  US 20060072093A1
• Time in Patent Office: 238 Days
• Field of Search: None
• US Class Current: 355/52
• CPC Class Codes: G03F 7/70275 Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70866 of mask or workpiece
• CPC Class Codes: G03F 7/70916 Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
• CPC Class Codes: G03F 7/70933 Purge, e.g. exchanging fluid or gas to remove pollutants

Abstract

A system and method is used to pattern a substrate. A projection beam received from a radiation system is patterned using an array of individually controllable elements. A portion of the projection beam is directed directly onto one of the individually controllable elements and collecting radiation reflected therefrom using each one of a first array of focusing elements. An image of the first array of focusing elements is projected onto a second array of focusing elements using a projection system, such that radiation reflected from one of the individually controllable elements is projected via one of the focusing elements in the first array of focusing elements and the projection system to one of the focusing elements in the second array which focuses the radiation onto a spot on the substrate.

Claims

1. A system, comprising:

an illumination system that conditions a beam of radiation;

an array of individually controllable elements that pattern the beam;

a projection system that projects that pattered beam onto an image plane; and

first and second arrays of focusing elements,

wherein each focusing element in the first array of focusing elements directs a portion of the beam onto a corresponding one of the individually controllable elements and directs a portion of the patterned beam onto a corresponding focusing element in the second array of focusing elements, which focuses the portion of the patterned beam onto a spot in the image plane.

2. The system of claim 1, wherein the portion of the beam directed onto each of the individually controllable elements by the first array of focusing elements is focused onto an active part of the individually controllable element.

3. The system of claim 1, wherein the first array of focusing elements comprises:

one of an array of micro lenses, a Fresnel lens, and a zone plate lens,

wherein each element in the one of the array of micro lenses, the Fresnel lens, and the zone plate directs the portion of the beam onto the corresponding one of the individually controllable elements and directs the portion of the patterned beam onto the corresponding focusing element in the second array of focusing elements.

4. The system of claim 1, wherein the first array of focusing elements is a final element in a path of the beam before it is incident on the array of individually controllable elements.

5. The system of claims 1, wherein each of the individually controllable elements is a diffractive optical MEMS device, whereby at a first setting an active surface of the MEMS device acts as a plane reflector reflecting zero order radiation back into the corresponding one of the focusing elements in the first array of focusing elements and at a second setting the active surface of the MEMS device forms a grating that diffracts first order radiation away from the one of the corresponding focusing elements in the first array of focusing elements.

6. The system of claim 1, wherein the second array of focusing elements comprises one of an array of micro lenses, a Fresnel lens, and a zone plate.

7. The apparatus according claim 1, wherein the array of individually controllable elements and the first array of focusing elements are at least one of located in or positioned to form a gas tight enclosure.

8. The system of claim 7, wherein the gas tight enclosure is substantially evacuated.

9. The system of claim 7, wherein the gas tight enclosure is evacuated to less than about 100 mTorr.

10. The system of claim 7, wherein the gas tight enclosure is filled with a substantially pure and clean gas.

11. The system of claim 10, further comprising:

a gas inlet coupled between the enclosure and a source of the gas; and

a gas outlet coupled to the enclosure that permits the gas to be flushed through the enclosure.

12. The system of claim 1, further comprising:

an actuator that adjusts a position of the first array of focusing elements relative to the array of individually controllable elements.

13. The system of claim 1, further comprising:

actuators that adjust positions of each focusing elements within the first array of focusing elements relative to one another.

14. A method, comprising:

patterning a beam of radiation using an array of individually controllable elements;

directing a portion of the beam onto corresponding ones of the individually controllable elements using respective focusing elements in a first array of focusing elements;

directing a portion of the pattered beam onto corresponding focusing elements in a second array of focusing elements using respective focusing elements in the first array of focusing elements; and

focusing the patterned radiation as corresponding focus spots in an image plane using respective focusing elements in the second array of focusing elements.