Methods for forming protective layers on semiconductor device substrates

• US 7,084,013 B2
• Filed: 12/15/2004
• Issued: 08/01/2006
• Est. Priority Date: 06/08/2000
• Status: Expired due to Fees

• Current Assignee: Micron Technology, Inc.
• Original Assignee: Micron Technology, Inc.
• Inventors: Farnworth, Warren M., Wood, Alan G.
• Primary Examiner(s): Zarneke, David A.
• Application Number:
  US11/012,569
• Publication Number:
  US 20050101158A1
• Time in Patent Office: 594 Days
• Field of Search: None
• US Class Current: 438/127
• CPC Class Codes: B33Y 10/00 Processes of additive manufacturing
• CPC Class Codes: B33Y 30/00 Apparatus for additive manufacturing; Details thereof or accessories therefor
• CPC Class Codes: B33Y 80/00 Products made by additive manufacturing
• CPC Class Codes: H01L 21/44 Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/38 - H01L21/428
• CPC Class Codes: H01L 2224/29099 Material
• CPC Class Codes: H01L 23/3157 Partial encapsulation or coating mask layer used as insulation layer H01L21/31
• CPC Class Codes: H01L 23/3192 Multilayer coating
• CPC Class Codes: H01L 2924/00 Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
• CPC Class Codes: H01L 2924/00013 Fully indexed content
• CPC Class Codes: H01L 2924/0002 Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Abstract

Methods for forming protective layers on semiconductor devices, including semiconductor devices that are carried by fabrication substrates, that are parts of assemblies, and that include individual dies, include at least partially consolidating previously unconsolidated material selectively, in accordance with a program. The method may include use of a machine vision system or other object recognition apparatus to provide precise die-specific alignment. A protective structure may be formed to include at least one layer or segment of dielectric material having a controlled thickness or depth and a precise boundary. The layer or segment may include precisely sized, shaped, and located apertures through which conductive terminals, such as bond pads, on the surface of the die may be accessed. Dielectric material may also be employed as a structure to mechanically reinforce a die-to-substrate (e.g., die-to-lead frame) attachment.

Claims

1. A method for fabricating a protective structure on a semiconductor device, comprising selectively altering a state of a protective material over at least a portion of a surface of a semiconductor device structure from an unconsolidated state to an at least partially consolidated state, without at least partially consolidated protective material located over another portion of the surface.

2. The method of claim 1, wherein selectively altering is effected in accordance with a program.

3. The method of claim 1, wherein selectively altering comprises directing a controlled, discrete beam of radiation onto the protective material located over at least the portion.

4. The method of claim 3, wherein directing comprises directing a controlled, discrete beam of focused ultraviolet laser radiation.

5. The method of claim 1, further comprising forming at least one layer of unconsolidated protective material over the surface before selectively altering the state of the protective material.

6. The method of claim 1, wherein selectively consolidating is effected over a surface of a substrate carrying a plurality of semiconductor devices.

7. The method of claim 1, further comprising removing unconsolidated protective material from the surface of the at least one semiconductor device structure following the selectively consolidating.

8. The method of claim 1, further comprising further consolidating the at least partially consolidated protective material.

9. The method of claim 1, wherein selectively altering is effected without forming at least partially consolidated protective material over at least one bond pad on the surface of the semiconductor device structure.

10. A method for forming a layer of protective material on at least one specified area on an active surface of one or more selected dice of a plurality of semiconductor dice of a semiconductor substrate, comprising:

selectively altering the state of a protective material over the active surface to at least partially consolidate the protective material over the at least one specified area without forming at least partially consolidated protective material over other regions of the active surface, including regions between at least two adjacent semiconductor dice.

11. The method of claim 10, wherein selectively altering is effected in accordance with a program.

12. The method of claim 10, wherein selectively altering comprises directing a controlled, discrete beam of radiation onto the protective material located over the at least one specified area.

13. The method of claim 10, further comprising:

forming at least one layer of unconsolidated protective material over a surface of the semiconductor substrate before selectively altering the state of the protective material.

14. The method of claim 10, further comprising:

removing unconsolidated protective material from the surface of the at least one semiconductor die following the selectively consolidating.

15. The method of claim 10, further comprising:

further consolidating the at least partially consolidated protective material.

16. The method of claim 10, wherein selectively altering comprises leaving the protective material over at least one bond pad on the active surface of the one or more selected dice in the unconsolidated state.

17. The method of claim 10, further comprising:

removing protective material in an unconsolidated state from the active surface.

18. The method of claim 10, further comprising:

further consolidating protective material in an at least partially consolidated state.

19. The method of claim 10, further comprising:

singulating at least the one or more selected dice from the wafer.

20. A method for forming a protective layer on a selected portion of a surface of a semiconductor device, comprising:

providing a semiconductor die with an active surface thereof secured to a lead frame of a lead frame strip; and

selectively altering a protective material from an unconsolidated state to an at least partially consolidated state over only selected areas of the active surface to form the protective layer.

21. The method of claim 20, further comprising:

storing data including at least one physical parameter of the semiconductor die in computer memory and using the stored data in conjunction with a machine vision system to recognize the location and orientation of at least one feature of the semiconductor device.

22. The method of claim 21, further comprising:

using the stored data, in conjunction with the machine vision system, to selectively form the protective layer over at least one selected region of the active surface in accordance with a program.

23. The method of claim 20, wherein selectively altering is effected in accordance with a program.

24. The method of claim 20, wherein selectively altering comprises directing a controlled, discrete beam of radiation onto the protective material located over the selected portion.

25. The method of claim 20, further comprising:

forming at least one layer of unconsolidated protective material over the surface before selectively altering the state of the protective material.

26. The method of claim 20, further comprising:

removing unconsolidated protective material from the active surface of the semiconductor die or the lead frame following the selectively consolidating.

27. The method of claim 20, further comprising:

further consolidating the at least partially consolidated protective material.

28. A method for forming a protective layer on a selected portion of a surface of a semiconductor device structure, comprising:

recognizing a location and orientation of at least one feature of the semiconductor device structure; and

selectively altering a state of a protective material over at least a portion of the surface from an unconsolidated state to an at least partially consolidated state.

29. The method of claim 28, wherein selectively altering is effected without forming at least partially consolidated protective material over another portion of the surface.

30. The method of claim 28, wherein selectively altering is effected in accordance with a program.

31. The method of claim 30, further comprising:

storing data including at least one physical parameter of the surface of the semiconductor device structure in computer memory and using the stored data in cooperation with a machine vision system to recognize the location and orientation of the at least one feature.

32. The method of claim 31, wherein storing data comprises merging the data for at least one physical parameter for the semiconductor device structure with data for controlling the selectively altering.

33. The method of claim 28, wherein selectively altering comprises directing a controlled, discrete beam of radiation onto the protective material located over at least the portion.

34. The method of claim 28, further comprising forming at least one layer of unconsolidated protective material over the surface before selectively altering the state of the protective material.

35. The method of claim 28, wherein selectively consolidating is effected over a surface of a substrate carrying a plurality of semiconductor devices.

36. The method of claim 28, further comprising:

removing unconsolidated protective material from the surface of the semiconductor device structure following the selectively consolidating.

37. The method of claim 28, further comprising:

further consolidating the at least partially consolidated protective material.