Displacement estimation system and method
First Claim
1. A displacement estimation system comprising:
- a data acquisition system; and
a processing system;
wherein the data acquisition system is configured to capture a first frame from a first substrate that includes a first pattern and a second substrate that includes a second pattern at a first time and capture a second frame from a third substrate that includes a third pattern and a fourth substrate that includes a fourth pattern at a second time subsequent to the first time,wherein the first pattern and the third pattern are substantially identical, wherein the second pattern and the fourth pattern are substantially identical,wherein the processing system is configured to calculate a first displacement between the first pattern and the third pattern using the first frame and the second frame and calculate a second displacement between the second pattern and the fourth pattern using the first frame and the second frame.
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Abstract
A displacement estimation system including a data acquisition system and a processing system is provided. The data acquisition system is configured to capture a first frame from a first substrate including a first pattern and a second substrate including a second pattern at a first time and capture a second frame from a third substrate including a third pattern and a fourth substrate including a fourth pattern at a second time subsequent to the first time. The first pattern and the third pattern are substantially identical, and the second pattern and the fourth pattern are substantially identical. The processing system is configured to calculate a first displacement between the first pattern and the third pattern using the first frame and the second frame and calculate a second displacement between the second pattern and the fourth pattern using the first frame and the second frame.
47 Citations
37 Claims
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1. A displacement estimation system comprising:
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a data acquisition system; and a processing system; wherein the data acquisition system is configured to capture a first frame from a first substrate that includes a first pattern and a second substrate that includes a second pattern at a first time and capture a second frame from a third substrate that includes a third pattern and a fourth substrate that includes a fourth pattern at a second time subsequent to the first time, wherein the first pattern and the third pattern are substantially identical, wherein the second pattern and the fourth pattern are substantially identical, wherein the processing system is configured to calculate a first displacement between the first pattern and the third pattern using the first frame and the second frame and calculate a second displacement between the second pattern and the fourth pattern using the first frame and the second frame. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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17. A method comprising:
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capturing a first frame from a first substrate including a first pattern and a second substrate including a second pattern at a first time; capturing a second frame from a third substrate including a third pattern substantially identical to the first pattern and a fourth substrate including a fourth pattern substantially identical to the second pattern at a second time subsequent to the first time; identifying the first pattern and the second pattern in the first frame; identifying the third pattern and the fourth pattern in the second frame; calculating a first displacement between the first pattern and the third pattern using the first frame and the second frame; and calculating a second displacement between the second pattern and the fourth pattern using the first frame and the second frame. - View Dependent Claims (18, 19, 20, 21, 22)
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23. A system comprising:
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means for capturing a first frame at a first time from a first substrate including a first pattern and a second substrate including a second pattern; means for capturing a second frame at a second time subsequent to the first time from a third substrate including a third pattern substantially identical to the first pattern and a fourth substrate including a fourth pattern substantially identical to the second pattern; means for calculating a first displacement between the first pattern and the third pattern using the first frame and the second frame; and means for calculating a second displacement between the second pattern and the fourth pattern using the first frame and the second frame. - View Dependent Claims (24, 25, 26, 27, 28, 29, 30, 31, 32)
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33. A computer-readable medium having computer-executable instructions for performing a method of calculating first and second displacements, comprising:
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receiving a first frame that comprises a first pattern embodied in a first substrate and a second pattern embodied in a second substrate; receiving a second frame that comprises a third pattern embodied in a third substrate and substantially identical to the first pattern, and a fourth pattern embodied in a fourth substrate and substantially identical to the second pattern; identifying the first pattern and the second pattern in the first frame; identifying the third pattern and the fourth pattern in the second frame; calculating the first displacement between the first pattern and the third pattern using the first frame and the second frame; and calculating the second displacement between the second pattern and the fourth pattern using the first frame and the second frame. - View Dependent Claims (34, 35, 36, 37)
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Specification