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Plating system for semiconductor materials

  • US 7,087,143 B1
  • Filed: 07/15/1996
  • Issued: 08/08/2006
  • Est. Priority Date: 07/15/1996
  • Status: Expired due to Fees
First Claim
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1. A workpiece processing apparatus, comprising:

  • a fluid cup having an upper rim forming an overflow weir over which a processing fluid can exit the cup;

    an electrode in the fluid cup to facilitate electrochemical processing of a workpiece having a plating surface and a perimeter edge; and

    a head assembly having a workpiece holder and a rotor attached to the workpiece holder to rotate the workpiece holder, the workpiece holder being configured to hold the workpiece in a processing plane with the plating surface facing downward, and the workpiece holder including a plurality of electrodes having first portions mounted to the workpiece holder and second portions projecting from the first portions upwardly toward the processing plane such that the second portions have tips that bear against a peripheral region of the plating surface of the workpiece, wherein the first and second portions are spaced apart from the peripheral edge of the workpiece such that the electrodes only contact the plating surface of the workpiece, and wherein the head assembly is moveable along a height adjustment path to place the workpiece in the processing plane.

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