Polarization maintaining dispersion controlled fiber laser source of ultrashort pulses
First Claim
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1. A saturable absorber mirror for passive modelocking of lasers, comprising:
- a film of a semiconductor material implanted with high energy ions at a penetration depth which differs from the penetration depth of optical signals reflected from said saturable absorber mirror, said semiconductor material having an ion implantation depth profile selected to provide saturable absorption having a multi-temporal carrier relaxation.
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Abstract
A modelocked linear fiber laser cavity with enhanced pulse-width control includes concatenated sections of both polarization-maintaining and non-polarization-maintaining fibers. Apodized fiber Bragg gratings and integrated fiber polarizers are included in the cavity to assist in linearly polarizing the output of the cavity. Very short pulses with a large optical bandwidth are obtained by matching the dispersion value of the fiber Bragg grating to the inverse of the dispersion of the intra-cavity fiber.
173 Citations
62 Claims
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1. A saturable absorber mirror for passive modelocking of lasers, comprising:
a film of a semiconductor material implanted with high energy ions at a penetration depth which differs from the penetration depth of optical signals reflected from said saturable absorber mirror, said semiconductor material having an ion implantation depth profile selected to provide saturable absorption having a multi-temporal carrier relaxation. - View Dependent Claims (2, 3, 4, 6, 7, 11, 12, 13, 17, 18, 19, 20, 21, 22)
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5. A saturable absorber mirror as defined in 1, wherein said high energy ions comprise protons and wherein the implantation energy of said high energy ions is in the range of 5 keV–
- 200 keV.
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8. A saturable absorber mirror for passive modelocking of lasers, comprising:
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a film of a semiconductor material implanted with high energy ions at a penetration depth which differs from the penetration depth of optical signals reflected from said saturable absorber mirror, said film exhibiting multi-temporal relaxation, wherein the thickness of said film controls the phase of the reflected light signal within opposite surfaces of said mirror. - View Dependent Claims (23)
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9. A saturable absorber mirror for passive modelocking of lasers, comprising:
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a film of a semiconductor material implanted with high energy ions at a penetration depth which differs from the penetration depth of optical signals reflected from said saturable absorber mirror, wherein said semiconductor material exhibits multi-temporal relaxation under optical excitation with short optical pulses. - View Dependent Claims (10, 24)
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14. A saturable absorber mirror for passive modelocking of lasers, comprising:
a film of a semiconductor material implanted with high energy ions at a penetration depth which is smaller than the penetration depth of optical signals reflected from said saturable absorber mirror, said high energy ions creating a first trap concentration at a first depth region and a second trap concentration at a second depth region such that said film exhibits saturable absorption governed by a fast time constant and a slow time constant. - View Dependent Claims (25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37)
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15. A saturable absorber to be operated in transmission for passive modelocking of lasers, comprising:
a film of a semiconductor material implanted with high energy ions at a penetration depth which is smaller than the thickness of said film such that said film exhibits multi-temporal relaxation. - View Dependent Claims (38, 39, 40, 41, 42, 43, 44, 45)
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16. A saturable absorber for passive modelocking of lasers operating in the 1.0–
- 1.1 um wavelength range, comprising;
a film of bulk InGaAsP or quantum wells fabricated with a bandgap in the 1.0–
1.1 um wavelength region, said film implanted with high energy ions at a penetration depth which differs from the penetration depth of optical signals, and said film exhibit multi-temporal relaxation. - View Dependent Claims (46, 47, 48, 49, 50, 51, 52)
- 1.1 um wavelength range, comprising;
- 53. A method of producing optical pulses, said method comprising directing light into a saturable absorber comprising a semiconductor material implanted with high energy ions at a penetration depth which is smaller than the penetration depth of said light directed into said saturable absorber, said high energy ions having a depth profile such said saturable absorber exhibits multi-temporal carrier relaxation.
- 58. A method of manufacturing a saturable absorber, said method comprising implanting a semiconductor material with high energy ions at a penetration depth which is smaller than the thickness of said semiconductor material thereby creating a first trap concentration at a first depth region and a second trap concentration at a second depth region such that said semiconductor material exhibits saturable absorption governed by a first predetermined fast time constant and a second predetermined slow time constant.
Specification