Vacuum processing apparatus and operating method therefor

• US 7,089,680 B1
• Filed: 01/23/2001
• Issued: 08/15/2006
• Est. Priority Date: 08/29/1990
• Status: Expired due to Fees

• Current Assignee: Hitachi, Ltd.
• Original Assignee: Hitachi, Ltd.
• Inventors: Itou, Atsushi, Tsubone, Tsunehiko, Kato, Shigekazu, Nishihata, Kouji
• Primary Examiner(s): Rinehart, Kenneth
• Application Number:
  US09/766,596
• Time in Patent Office: 2,030 Days
• Field of Search: 34/60, 34/92, 342/18, 342/28, 342/29, 342/32, 414/939, 414/940, 414/225, 414/226, 414/207, 414/217, 414/222, 414/231, 134/84, 134/85, 134/902, 156/345, 156/345.C, 156/345.PC, 118/723.F, 118/723.I, 118/730, 118/719
• US Class Current: 34/92
• CPC Class Codes: B41J 2/36 Print density control
• CPC Class Codes: B41J 2/365 by compensation for variation in temperature
• CPC Class Codes: C23C 14/564 Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
• CPC Class Codes: H01L 21/67028 for cleaning followed by drying, rinsing, stripping, blasting or the like
• CPC Class Codes: H01L 21/67167 surrounding a central transfer chamber
• CPC Class Codes: H01L 21/67253 Process monitoring, e.g. flow or thickness monitoring
• CPC Class Codes: H01L 21/67748 horizontal transfer of a single workpiece
• CPC Class Codes: Y10S 134/902 Semiconductor wafer
• CPC Class Codes: Y10S 414/139 including wafer charging or discharging means for vacuum chamber
• CPC Class Codes: Y10S 414/14 Wafer cassette transporting

Abstract

A vacuum processing apparatus which includes a means for transferring substrates from a loader, with a transferring device, to a double lock chamber; and, then to a selected vacuum processing chamber. The substrates are returned to a substrate, by the vacuum loader, into their original position in the substrate table. The surfaces of the substrates are maintained in a horizontal position during processing.

Claims

1. A conveyor system for processing substrates in plural vacuum processing chambers, the conveyor system including:

a loader;

a vacuum loader; and

double lock chambers, having a loader side and a vacuum loader side, and having a gate valve for said loader side and another gate valve for said vacuum loader side, wherein said vacuum loader has

(1) a transfer chamber connected to said double lock chambers via the another gate valve;

(2) a conveyor structure; and

(3) plural vacuum processing chambers,

wherein said loader has a transfer device transferring substrates to be processed from a cassette in said loader to one of said double lock chambers,

wherein said vacuum loader has said conveyor structure which transfers substrates to be processed, from said one of the double lock chambers to at least one of said plural vacuum processing chambers, via said transfer chamber;

wherein each of said plural vacuum processing chambers has a substrate table to maintain a surface of a substrate, treated in the at least one of the plural vacuum processing chambers, horizontal during a vacuum processing,

wherein said conveyor structure in said vacuum loader transfers processed substrates from said at least one of said plural vacuum processing chambers to one of said double lock chambers, via said transfer chamber, and

wherein said transfer device in said loader returns said substrates from the other one of the double lock chambers to their original positions in the cassette in which said substrates are stored prior to processing, surfaces of the substrates which have been processed being kept horizontal when said transfer device returns said substrates.

2. The conveyor system according to claim 1, wherein said substrates are transferred between said either one of the double lock chambers and the at least one of said plural vacuum processing chambers by said conveyor structure, said conveyor structure being a single conveyor located in said transfer chamber.

3. The conveyor system according to claim 1, wherein, in transferring said substrates between said one of the double lock chambers and the at least one of said plural vacuum processing chambers, said substrates are transferred via said transfer chamber of said vacuum loader, and gate valves therefor.

4. The conveyor system according to claim 1, wherein said substrates are semiconductor wafers.

5. The conveyor system according to claim 1, wherein substrates to be processed are transferred one by one from said one of the lock chambers to said at least one of said plural vacuum processing chambers, via the transfer chamber;

wherein the substrate are processed one by one in each of the plural vacuum processing chambers; and

wherein processed substrates are transferred one by one from the at least one of the plural vacuum processing chambers to one of said double lock chambers, via said transfer chamber.

6. The conveyor system according to claim 1, wherein said substrates to be processed are transferred directly from said loader to said one of the double lock chambers.

7. A conveyor system used for transferring substrates to be processed to vacuum processing chambers, comprising:

a conveyor for transferring said substrates to be processed in said vacuum processing chambers from a loader to one of double lock chambers;

a vacuum providing device in said one of the double lock chambers, after substrates to be processed have been transferred thereto; and

another conveyor, for transferring the substrates from said one of the double lock chambers to a vacuum loader, said vacuum loader loading said substrates into said vacuum processing chambers, said vacuum loader having gate valves for introducing substrates into said vacuum processing chambers and also having a transfer chamber and a conveyor structure, and

said conveyor in said loader returns said substrates from the other one of the double lock chambers to their original positions in the cassette in which said substrates are stored prior to processing, surfaces of the substrates which have been processed being kept horizontal when the conveyor returns said substrates.

8. The conveyor system according to claim 7, wherein the substrates are semiconductor wafers.

9. The conveyor system according to claim 7, wherein said conveyor structure is a single conveyor, which transfers said substrates, one by one, between said one of the double lock chambers and said vacuum processing chambers.

10. The conveyor system according to claim 7, wherein said substrates are transferred one by one between said one of said double lock chambers and said vacuum processing chambers.

11. The conveyor system according to claim 7, wherein said substrates to be processed are transferred directly from said atmospheric loader to said one of the double lock chambers.

12. An apparatus for transferring cassettes in operating a vacuum processing apparatus, the vacuum processing apparatus including:

a loader;

a vacuum loader; and

double lock chambers for connecting said loader and said vacuum loader,

wherein said loader includes a cassette mount unit located outside of said double lock chambers,

said cassette mount unit has a cassette positioning plane which is a substantially horizontal plane in which all cassettes, containing samples to be processed, are positioned in a row in front of a front wall of said double lock chambers, and

said cassette positioning plane is oriented such that a cassette is placed on and removed from said cassette positioning plane so as to maintain the surface of a sample to be processed substantially horizontal when the cassette containing the sample is on the cassette positioning plane,

wherein the sample is transferred by a transfer device in said loader from said loader to one lock chamber of the double lock chambers, while maintaining the surface of the sample to be processed substantially horizontal, and

wherein said transfer device returns said samples from the other one of the double lock chambers to their original positions in said cassette in which said samples are stored prior to processing, surfaces of the samples which have been processed being kept horizontal in returning the samples to their original positions.

13. An apparatus for transferring cassettes in operating a vacuum processing apparatus, the vacuum processing apparatus including:

a loader;

a vacuum loader; and

double lock chambers for connecting said loader and said vacuum loader,

wherein said loader includes a cassette mount unit located outside of said double lock chambers,

said cassette mount unit has a cassette positioning plane which is a substantially horizontal plane in which all cassettes, containing samples to be processed, are positioned in a row in front of a front wall of said lock chambers, and

said cassette positioning plane is oriented such that a cassette is placed on and removed from said cassette positioning plane so as to maintain a surface of a sample to be processed substantially horizontal when the cassette containing the sample is on the cassette positioning plane; and

an automatic cassette loader for loading cassettes on said cassette mount unit so as to maintain the sample surface to be processed substantially horizontal,

wherein the cassette is removed from said cassette positioning plane of said cassette mount unit by said automatic cassette loader, in accordance with data sent from a host control apparatus, while maintaining the sample surface substantially horizontal, and said vacuum processing apparatus automatically executes a sample processing, based on processing data, and

wherein a transfer device in said loader returns the samples from one of the double lock chambers to their original positions in said cassette in which said samples are stored prior to processing thereof, the sample surface being kept horizontal when the transfer device returns the samples.

14. An apparatus for vacuum processing a substrate by using plural vacuum processing chambers, comprising:

a transfer conveyor for carrying in the substrate into one vacuum processing chamber of said plural vacuum processing chambers, via one lock chamber selected from double lock chambers,

said transfer conveyor carrying out the substrate processed in said vacuum processing chamber via another lock chamber of the double lock chambers, and

said transfer conveyor returns the substrate from said another lock chamber of the double lock chambers to its original position in said cassette in which said substrate is stored prior to processing thereof, a surface of the substrate which has been processed being kept horizontal when the transfer conveyor returns the substrate.

15. The apparatus according to claim 14, wherein carrying in and carrying out of said substrate are performed sequentially.

16. The apparatus according to claim 14, wherein at least one of dry etching, chemical vapor deposition and sputtering is performed in said plural vacuum processing chambers.

17. An apparatus for vacuum processing a substrate by using plural vacuum processing chambers, such that the substrates are processed one by one, comprising:

a transfer conveyor for carrying in a substrate into at least one of the vacuum processing chambers, via a lock chamber of double lock chambers,

wherein said substrate is carried in from a cassette which is placed on a cassette table, said substrate being processed in said at least one of said vacuum processing chambers,

wherein said transfer conveyor carries out said substrate, processed in said at least one of said vacuum processing chambers, via another lock chamber of said double load lock chambers,

wherein said transfer conveyor includes a first conveyor, of a loader, that faces to a set of substrates disposed in the cassette and transfers said substrates one by one to the lock chamber, and a second conveyor that is disposed in a conveyor chamber of a vacuum loader, and

wherein said first conveyor in said loader returns the substrates from said another of the double lock chambers to their original positions in said cassette in which said substrates are stored prior to processing thereof, surfaces of the substrates which have been processed being kept horizontal when the first conveyor returns the substrates.

18. The apparatus according to claim 17, wherein the substrate is carried directly from the cassette on the cassette table, into said one of the lock chambers, and said first conveyor carries the substrate directly from the another lock chamber to the cassette.

19. An apparatus for vacuum processing a substrate by using plural vacuum processing chambers, comprising:

a transfer conveyor for carrying in said substrate, disposed in an atmosphere different from an atmosphere in one of said plural vacuum processing chambers, into said one of the plural vacuum processing chambers, via one lock chamber selected from double lock chambers, wherein the substrate is carried in from a cassette which is placed on a cassette table, to the one of the plural vacuum processing chambers processing the substrate; and

said transfer conveyor carrying out the substrate, processed in the one of the plural vacuum processing chambers, into said atmosphere different from said atmosphere in the one of the plural vacuum processing chambers, via another lock chamber of the double lock chambers,

wherein the transfer conveyor includes a first conveyor, in a loader, that faces to a set of substrates disposed in the cassette and transfers the substrates one by one to the one lock chamber, and a second conveyor is disposed in a conveyor chamber of a vacuum loader so as to make a rotative movement and a horizontal movement of X and Y axes, and

said first conveyor in said loader returns said substrates from said another double lock chamber to their original positions in the cassette in which said substrates are stored prior to processing thereof, surfaces of the substrates which have been processed being kept horizontal when the first conveyor returns the substrates.

20. The apparatus according to claim 19, wherein the substrate is carried directly from the cassette on the cassette table, into said one lock chamber.

21. A vacuum processing apparatus, including:

(a) a plurality of cassette mount tables for mounting cassettes storing substrates;

an atmospheric transfer device for transferring said substrates in an atmosphere;

a plurality of vacuum processing chambers for processing said substrates one by one;

a load lock chamber for loading non-processed substrates from the atmosphere into one vacuum processing chamber of said vacuum processing chambers; and

an unload lock chamber for unloading processed substrates from one vacuum processing chamber of said vacuum processing chambers to the atmosphere;

(b) said plurality of cassette mount tables being located at a front side of said atmospheric transfer device and arranged on a substantially horizontal plane;

(c) said load lock chamber and said unload lock chamber being positioned at a rear side of said atmospheric transfer device;

(d) said load lock chamber having, at an atmospheric side and a vacuum side, gate valves opened or closed every time each of said non-processed substrates is loaded or unloaded one by one, for changing over said load lock chamber to either the atmosphere or the vacuum;

(e) said unload lock chamber having, at an atmospheric side and a vacuum side, gate valves opened or closed every time each of said processed substrates is loaded or unloaded one by one, for changing over said unload lock chamber to either the atmosphere or the vacuum;

(f) said atmospheric transfer device being capable of moving at least vertically and being controlled by control means such that each of said non-processed substrates can be taken out of any location in said plurality of cassettes mounted on said plurality of cassette mount tables for transferring to said load lock chamber one by one through said atmospheric side gate valve, and

each of said processed substrates can be transferred one by one from said unload lock chamber to the original location of the original cassette, in which each of said substrates is stored prior to processing, through said atmospheric side gate valve.

22. A vacuum processing apparatus, including:

(a) a plurality of cassette mount tables for mounting cassettes storing substrates;

an atmospheric transfer device for transferring said substrates in an atmosphere;

a plurality of vacuum processing chambers for processing said substrates;

a load lock chamber for loading non-processed substrates from the atmosphere into said vacuum processing chambers; and

an unload lock chamber for unloading processed substrates from said vacuum processing chambers to the atmosphere;

(b) said plurality of cassette mount tables being located at a front side of said atmospheric transfer device and arranged on a substantial horizontal plane;

(c) said load lock chamber and said unload lock chamber being positioned at a rear side of said atmospheric transfer device;

(d) said load lock chamber having, at an atmospheric side and a vacuum side, gate valves opened or closed every time at least one of said non-processed substrates is loaded or unloaded, for changing over said load lock chamber to either the atmosphere or the vacuum;

(e) said unload load chamber having, at an atmospheric side and a vacuum side, gate valves opened or closed every time at least one of said processed substrates is loaded or unloaded, for changing over said unload lock chamber to either the atmosphere or the vacuum;

(f) said atmospheric transfer device being capable of moving at least vertically and being controlled by control means such that said non-processed substrates can be taken out of any location in said plurality of cassettes mounted on said plurality of cassette mount tables for transferring to said load lock chamber through said atmospheric side gate valve, and

said processed substrates can be transferred from said unload lock chamber to the original locations of the original cassettes, in which the substrates are stored prior to processing, through said atmospheric side gate valve.

23. A vacuum processing apparatus, including:

(a) a plurality of cassette mount tables for mounting cassettes storing substrates;

an atmospheric transfer device for transferring said substrates in an atmosphere;

a plurality of vacuum processing chambers for processing said substrates;

double lock chambers either for loading non-processed substrates from the atmosphere into said vacuum processing chambers or for unloading processed substrates from said vacuum processing chambers to the atmosphere;

(b) said plurality of cassette mount tables being located at a front side of said atmospheric transfer device and arranged on a substantial horizontal plane;

(c) said double lock chambers being positioned at a rear side of said atmospheric transfer device;

(d) said double lock chambers having, at an atmospheric side and a vacuum side, gate valves opened or closed every time at least one of said non-processed substrates is loaded or unloaded for changing over said double lock chambers to either the atmosphere or the vacuum;

(e) said atmospheric transfer device being capable of moving at least vertically and being controlled by control means such that at least one of said non-processed substrates can be taken out of any location in said plurality of cassettes mounted on said plurality of cassette mount tables for transferring to said double lock chambers through said atmospheric side gate valve, and

said processed substrates can be transferred from said double lock chambers to the original locations of the original cassettes, in which the substrates are stored prior to processing, through said atmospheric side gate valve.

24. An apparatus for vacuum processing a substrate, comprising:

plural vacuum processing chambers;

a transfer conveyor for carrying in the substrate into one vacuum processing chamber of said plural vacuum processing chambers, via one lock chamber selected from double lock chambers,

said transfer conveyor carrying out the substrate processed in said vacuum processing chamber via another lock chamber of the double lock chambers, and

said transfer conveyor returns the substrate from said another lock chamber of the double lock chambers to its original position in a cassette, of plural cassettes, in which said substrate is stored prior to processing thereof.