Externally excited torroidal plasma source

• US 7,094,316 B1
• Filed: 08/11/2000
• Issued: 08/22/2006
• Est. Priority Date: 08/11/2000
• Status: Expired due to Fees

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Ye, Yan, Tanaka, Tsutomu, Ramaswamy, Kartik, Hanawa, Hiroji, Nguyen, Andrew, Collins, Kenneth S
• Primary Examiner(s): MCDONALD, RODNEY GLENN
• Application Number:
  US09/638,075
• Time in Patent Office: 2,202 Days
• Field of Search: 156/345, 156/345.33, 156/345.34, 156/345.35, 156/345.48, 118/723.I, 118/723.ME, 118/723.IR, 118/723.MP, 204/298.06
• US Class Current: 156/345.48
• CPC Class Codes: H01J 37/32082 Radio frequency generated discharge H01J37/32357, H01J37/32366, H01J37/32394 and H01J37/32403 take precedence
• CPC Class Codes: H01J 37/321 the radio frequency energy being inductively coupled to the plasma

Abstract

A plasma reactor for processing a workpiece, including an enclosure defining a vacuum chamber, a workpiece support within the enclosure facing an overlying portion of the enclosure, the enclosure having at least first and second openings therethrough near generally opposite sides of the workpiece support. At least one hollow conduit is connected to the first and second openings. A closed torroidal path is provided through the conduit and extending between the first and second openings across the wafer surface. A process gas supply is coupled to the interior of the chamber for supplying process gas to the torroidal path. A coil antenna is coupled to an RF power source and inductively, coupled to the interior of the hollow conduit and capable of maintaining a plasma in the torroidal path.

Claims

1. A plasma reactor for processing a workpiece, said plasma reactor comprising:

an enclosure;

a workpiece support within the enclosure facing an overlying portion of the enclosure, said workpiece support the overlying portion of said enclosure defining a process region therebetween extending generally across the diameter of said workpiece support;

said enclosure having at least first and second openings therethrough near generally opposite sides of said workpiece support;

at least one hollow conduit outside of said process region and connected to said first and second openings, providing a first torroidal path extending through said conduit and across said process region;

a first coil antenna adapted to accept RF power, and inductively coupled to the interior of said hollow conduit and capable of maintaining a plasma in said torroidal path; and

wherein said hollow conduit comprises a plenum extending around an axis of symmetry of said chamber and wherein said first and second openings are comprised within a continuous opening in said enclosure extending around the axis of symmetry of said chamber.

2. The plasma reactor of claim 1 wherein said plenum and said continuous opening extend 360 degrees around the axis of symmetry of said enclosure.

3. The plasma reactor of claim 1 wherein said coil antenna is wound around an axis generally parallel with a plane of said workpiece support.

4. The plasma reactor of claim 3 wherein said coil antenna comprises a first winding extending on one side of and along said conduit.

5. A plasma reactor for processing a workpiece, said plasma reactor comprising:

an enclosure;

a workpiece support within the enclosure, said workpiece support and the overlying portion of said enclosure defining a process region therbetween extending generally across the diameter of said workpiece support;

said enclosure having at least first and second openings therethrough near generally opposite sides of said workpiece support;

at least one hollow conduit outside of said process region and connected to said first and second opening, providing a first torroidal path extending through said conduit and across said process region;

a first coil antenna adapted to accept RF power, and inductively coupled to the interior of said hollow conduit and capable of maintaining a plasma in said torroidal path; and

wherein said conduit is formed of a metal material, said conduit having an insulating gap within a wall of the conduit extending transversely to said torriodal path and separating said conduit into two portions so as to prevent formation of a closed electrical path along the lenght of said conduit.

6. The plasma reactor of claim 5 further comprising a closed magnetic core surrounding said conduit so as to have one portion of the magnetic core extending through a region between said enclosure and said conduit, said coil antenna being wound around said closed magnetic core.

7. The plasma reactor of claim 6 wherein said closed magnetic core has a second portion outside the region between said enclosure and said conduit, said coil antenna being wound around a section of said second portion.

8. The reactor of claim 5 wherein said conduit has a width along an axis parallel with a plane of said workpiece support which is at least as great as the diameter of said workpiece support.

9. The reactor of claim 8 wherein said conduit has a height along an axis perpendicular to the plane of said workpiece support which is less than said width.

10. The reactor of claim 9 wherein said conduit has a rectangular cross-section whereby to produce a relatively thin wide belt of plasma in said closed torroidal path.

11. The plasma reactor of claim 9 further comprising:

a first magnetic core extending between said conduit and said enclosure across at least a portion of a first half of said width, said coil antenna comprising a first winding surrounding said first magnetic core;

a second magnetic core extending between said conduit and said enclosure across at least a portion of a remaining half of said width, said coil antenna further comprising a second winding wound surrounding said second magnetic core.

12. The plasma reactor of claim 11 wherein said first and second magnetic cores are longitudinally movable toward and away from a center locus overlying a center of said wafer support, whereby to enable adjustment of plasma ion density near the center of said workpiece support relative to plasma ion density near a periphery of said workpiece support.

13. The plasma reactor of claim 11 wherein said first and second windings are closely wound around said first and second magnetic cores respectively.

14. The plasma reactor of claim 12 wherein said first and second windings comprise a continuous winding having first and second portions around said first and second magnetic cores respectively.

15. The reactor of claim 11 wherein said conduit has a smaller cross-sectional area at an intermediate portion thereof than at its ends.

16. A plasma reactor for processing a workpiece, said plasma reactor comprising:

an enclosure;

a workpiece support within the enclosure facing an overlying portion of the enclosure, said workpiece support and the overlying portion of said enclosure defining a process region therebetween extending generally across the diameter of said workpiece support;

said enclosure having at least first and second openings therethrough near generally opposite sides of said workpiece support;

at least one hollow conduit outside of said process region and connected to said first and second openings, providing a first torroidal path extending through said conduit and across said process region;

a first coil antenna adapted to accept RF power, and inductively coupled to the interior of said hollow conduit and capable of maintaining a plasma in said torroidal path;

wherein said coil antennais wound around an axis generally parallel with the axis of said closed torroidal path;

wherein said coil antenna comprises a first winding extending on one side of and along said conduit; and

wherein said coil antenna comprises a second winding extending on an opposite side of and along said conduit.

17. The plasma reactor of claim 16 wherein said coil antenna comprises a winding disposed between said conduit and said enclosure.

18. The plasma reactor of claim 17 wherein said winding has an outer diameter less than an inner diameter of said conduit.

19. The plasma reactor of claim 17 further comprising at least one magnetic core extending between said enclosure and said conduit in a direction generally parallel to the axis of said closed torroidal path, said winding extending around said magnetic core.

20. The plasma reactor of claim 16 further comprising at least one magnetic core extending between said enclosure and said conduit in a direction generally parallel to the axis of said closed torroidal path, said first winding extending around said magnetic core.

21. The plasma reactor of claim 17 further comprising at least one magnetic core extending between said enclosure and said conduit in a direction generally parallel to the axis of said closed torroidal path, said first and second windings extending around said magnetic core.

22. A plasma reactor for processing a workpiece, said plasma reactor comprising:

an enclosure;

a workpiece support within the enclosure facing an portion of the enclosure, said workpiece support and the overlying portion of said enclosure defining a process region therebetween extending generally across the diameter of said workpiece support;

said enclosure having at least first and second openings therethrough near generally opposite sides of said workpiece support;

at least one hollow conduit outside of said process region and connected to said first and second openings, providing a first torroidal path extending through said conduit and across said process region;

a first coil antenna adapted to accept RF power, and inductively coupled to the interior of said hollow conduit and capable of maintaining a plasma in said torroidal path; and

wherein the height of said closed torroidal path along an axis generally perpendicular to a plane of said wafer support in a process region overlying said workpiece support is less than elsewhere in said closed torroidal path, whereby to enhance the plasma ion density in said process region relative to the plasma ion density elsewhere in said closed torroidal path.

23. The plasma reactor of claim 22 further comprising a conductive body between said workpiece support and said vacuum enclosure and constricting said torroidal path in a processing region overlying said workpiece support.

24. The plasma reactor of claim 22 further comprising an RF bias power supply coupled to said workpiece support capable of maintaining a plasma sheath over a workpiece on said workpiece support of a thickness which constricts said closed torroidal path so as to enhance plasma ion density in a process region overlying said workpiece support.

25. The plasma reactor of claim 22 further comprising an RF bias power supply coupled to said workpiece support.

26. The plasma reactor of claim 22 wherein said vacuum enclosure comprises a longitude side wall and an overlying lateral ceiling, and wherein said first and second openings extend through said ceiling.

27. The reactor of claim 22 wherein said conduit is elongate and tubular of a cross-sectional shape that is one of curved or rectangular, said first and second openings mating with respective ends of said conduit.

28. The plasma reactor of claim 22 wherein said conduit is formed of a metal material, said conduit having an insulating gap within a wall of the conduit extending transversely to said torroidal path and separating said conduit into two portions so as to prevent formation of a closed electrical path along the length of said conduit.

29. The plasma reactor of claim 28 wherein said vacuum enclosure comprises a longitude side wall and an overlying lateral ceiling, and wherein said first and second openings extend through said ceiling.

30. The plasma reactor of claim 28 wherein said enclosure comprises a longitudinal side wall and an overlying lateral ceiling, and wherein said first and second openings extend through said side wall.

31. The plasma reactor of claim 28 wherein said overlying portion of said enclosure comprises a gas distribution plate, and wherein said height of said closed torroidal path along an axis perpendicular to a plane of said workpiece support is the distance between said gas distribution plate and said workpiece support.