Lithographic apparatus and device manufacturing method

• US 7,094,506 B2
• Filed: 03/09/2004
• Issued: 08/22/2006
• Est. Priority Date: 03/09/2004
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Van Buel, Henricus Wilhelmus Maria
• Primary Examiner(s): McPherson, John A.
• Assistant Examiner(s): CHACKO DAVIS, DABORAH
• Application Number:
  US10/795,801
• Publication Number:
  US 20050200819A1
• Time in Patent Office: 896 Days
• Field of Search: None
• US Class Current: 430/5
• CPC Class Codes: G03F 7/70275 Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70383 Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams maskless lithography using a programmable mask G03F7/70291

Abstract

A lithographic apparatus has a plurality of patterning arrays (e.g., 2, 4, etc.), which are spaced apart in an object plane. A combined, overlapped image of the patterning arrays is projected onto the substrate. Because the image is formed from radiation produced from spaced apart patterning arrays, the image arrives from different angles and has a higher effective numerical aperture (NA).

Claims

1. A lithographic apparatus, comprising:

an illumination system that produces a plurality of sub-beams of radiation;

a plurality of patterning arrays of individually controllable elements arranged in different predetermined positions in an object plane, wherein each patterning array patterns a respective sub-beam with a pattern; and

a projection system that projects the patterned sub-beams onto a substrate, such that the patterned sub-beams overlap to form a combined image on a target portion of the substrates,

wherein, based on the patterning arrays being arranged in different predetermined positions in the object plane, respective sub-beams arrive at different angles at a pupil plane, such that the combined image has a high numerical aperture.

2. The apparatus according to claim 1, wherein the projection system comprises:

a plurality of field lens systems corresponding in number to the patterning arrays; and

a common part, whereby the field lens systems form images of their respective patterning arrays in a pupil plane of the common part.

3. The apparatus according to claim 2, wherein said projection system has an overall magnification of from about 1/2 to about ⅕

.

4. The apparatus according to claim 1, wherein said illumination system comprises a single radiation source from which the plurality of sub-beams are derived.

5. The apparatus according to claim 4, wherein said illumination system further comprises phase adjustors in the paths of the separate sub-beams.

6. The apparatus according to claim 1, wherein said illumination system comprises light guides that guide the sub-beams to their respective patterning arrays.

7. The apparatus according to claim 1, wherein said illumination system comprises an optical system including one or more beam directing mirrors.

8. The apparatus according to claim 1, wherein the plurality of patterning arrays comprises two patterning arrays.

9. The apparatus according to claim 1, wherein the plurality of patterning arrays comprises four patterning arrays.

10. A device manufacturing method, comprising:

producing a plurality of sub-beams of radiation using an illumination system;

positioning each patterning array of individually controllable elements in a plurality of patterning arrays of individually controllable elements at a different predetermined position in an object plane;

imparting respective ones of said sub-beams with a pattern using the plurality of patterning arrays of individually controllable elements, such that each of the patterned sub-beams arrives at a pupil plane from a different angle; and

projecting the patterned sub-beams of radiation onto a substrate, such that the patterned sub-beams overlap to form a combined image having a high numerical aperture on a target portion of the substrate.

11. A method, comprising:

patterning individual beams of radiation generated from an illumination source using a respective individual patterning array in a plurality of patterning arrays of individually controllable elements, the patterning arrays being located at different predetermined positions in an object plane, such that each of the patterned sub-beams arrives at a pupil plane from a different angle; and

overlapping the individual patterned beams to form a combined image on a target portion of a substrate, so that the combined image has a higher effective numerical aperture.