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Plasma processing apparatus, method for operating the same, designing system of matching circuit, and plasma processing method

  • US 7,095,178 B2
  • Filed: 11/21/2002
  • Issued: 08/22/2006
  • Est. Priority Date: 11/27/2001
  • Status: Active Grant
First Claim
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1. A plasma processing apparatus comprising:

  • a radio frequency generator;

    a plasma processing chamber;

    a matching circuit for impedance matching between the radio frequency generator and the plasma processing chamber; and

    a matching circuit adjusting means for matching a output impedance of the matching circuit to the impedance of the plasma processing chamber in a nondischarge state.

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