System for scatterometric measurements and applications
First Claim
1. A method for finding a value of one or more parameters of a diffracting structure wherein a measurement is carried out by directing a polychromatic beam of electromagnetic radiation at said diffracting structure and detecting corresponding changes in polarization state of a diffraction of said beam at a number of wavelengths from said structure, comprising:
- carrying out a measurement of the structure to obtain measured changes in polarization state of a diffraction from the structure;
providing a set of change in polarization state data of the diffraction at the wavelengths corresponding to a first set of values of said one or more parameters; and
performing an optimized estimation within a neighborhood of the set of change in polarization state data using said measured changes in polarization state to arrive at a second set of values of the one or more parameters.
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Accused Products
Abstract
Instead of constructing a full multi-dimensional look up table as a model to find the critical dimension or other parameters in scatterometry, regression or other optimized estimation methods are employed starting from a “best guess” value of the parameter. Eigenvalues of models that are precalculated may be stored and reused later for other structures having certain common characteristics to save time. The scatterometric data that is used to find the value of the one or more parameter can be limited to those at wavelengths that are less sensitive to the underlying film characteristics. A model for a three-dimensional grating may be constructed by slicing a representative structure into a stack of slabs and creating an array of rectangular blocks to approximate each slab. One dimensional boundary problems may be solved for each block which are then matched to find a two-dimensional solution for the slab. A three-dimensional solution can then be constructed from the two-dimensional solutions for the slabs to yield the diffraction efficiencies of the three-dimensional grating. This model can then be used for finding the one or more parameters of the diffracting structure in scatterometry. Line roughness of a surface can be measured by directing a polarized incident beam in an incident plane normal to the line grating and measuring the cross-polarization coefficient. The value of the one or more parameters may then be supplied to a stepper or etcher to adjust a lithographic or etching process.
56 Citations
125 Claims
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1. A method for finding a value of one or more parameters of a diffracting structure wherein a measurement is carried out by directing a polychromatic beam of electromagnetic radiation at said diffracting structure and detecting corresponding changes in polarization state of a diffraction of said beam at a number of wavelengths from said structure, comprising:
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carrying out a measurement of the structure to obtain measured changes in polarization state of a diffraction from the structure;
providing a set of change in polarization state data of the diffraction at the wavelengths corresponding to a first set of values of said one or more parameters; and
performing an optimized estimation within a neighborhood of the set of change in polarization state data using said measured changes in polarization state to arrive at a second set of values of the one or more parameters. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 32)
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9. A method for finding a value of one or more parameters of a diffracting structure wherein a measurement is carried out by directing a polychromatic beam of electromagnetic radiation at said diffracting structure and detecting corresponding intensities or changes in polarization state of a diffraction of said beam at a number of wavelengths from said structure, comprising:
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providing a model to approximate the structure, said model including calculation of eigenvalues;
storing the eigenvalues;
carrying out a measurement of the structure to obtain measured intensities or changes in polarization state of a diffraction from the structure; and
employing the eigenvalues to obtain said value of said one or more parameters of the diffracting structure from the measured intensities or changes in polarization state. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 31)
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21. A method for finding a value of one or more parameters of a diffracting structure on or under one or more layers wherein a measurement is carried out by directing a polychromatic beam of electromagnetic radiation at said diffracting structure and detecting corresponding intensities or changes in polarization state of a diffraction of said beam at a number of wavelengths from said structure, comprising:
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carrying out a measurement of the structure to obtain measured intensities or changes in polarization state of a diffraction from the structure;
providing one or more sets of intensity or change in polarization state data of the diffraction at the wavelengths corresponding to one or more sets of values of said one or more parameters, wherein the wavelengths of the intensity or change in polarization state data in the one or more sets are chosen as a function of the properties of the one or more layers; and
deriving the value of the one or more parameters of the diffracting structure from the measured intensities or changes in polarization state and the one or more sets of intensity or change in polarization state data. - View Dependent Claims (22, 23, 24, 25, 26)
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27. A method for finding a value of one or more parameters of a diffracting structure wherein a measurement is carried out by directing a polychromatic beam of electromagnetic radiation at said diffracting structure and detecting corresponding intensities or changes in polarization state of a diffraction of said beam at a number of wavelengths from said structure, comprising:
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carrying out a measurement of the structure to obtain measured intensities or changes in polarization state of a diffraction from the structure;
providing one or more sets of intensity or change in polarization state data of the diffraction at the wavelengths corresponding to one or more sets of values of said one or more parameters, wherein density of the intensity or change in polarization state data provided at the wavelengths in the one or more sets is chosen as a function of sensitivity of the intensity or change in polarization state data to changes in wavelengths;
deriving the value of the one or more parameters of the diffracting structure from the measured intensities or changes in polarization state and the one or more sets of intensity or change in polarization state data. - View Dependent Claims (28, 29, 30)
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33. An apparatus for finding a value of one or more parameters of a diffracting structure wherein a measurement is carried out by directing a polychromatic beam of electromagnetic radiation at said diffracting structure and detecting corresponding changes in polarization state of a diffraction of said beam at a number of wavelengths from said structure, comprising:
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a system carrying out a measurement of the structure to obtain measured change in polarization state of a diffraction from the structure; and
a processor providing a set of change in polarization state data of the diffraction at the wavelengths corresponding to a first set of values of said one or more parameters, and performing an optimized estimation within a neighborhood of the set of change in polarization state data using said measured changes in polarization state to arrive at a second set of values of the one or more parameters. - View Dependent Claims (34, 35, 36, 37, 38, 39)
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40. An apparatus for finding a value of one or more parameters of a diffracting structure wherein a measurement is carried out by directing a polychromatic beam of electromagnetic radiation at said diffracting structure and detecting corresponding intensities or changes in polarization state of a diffraction of said beam at a number of wavelengths from said structure, comprising:
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a processor providing a model to approximate the structure, said model including calculation of eigenvalues and storing the eigenvalues; and
a system carrying out a measurement of the structure to obtain measured intensities or changes in polarization state of a diffraction from the structure, said processor employing the eigenvalues to obtain said value of said one or more parameters of the diffracting structure from the measured intensities or changes in polarization state. - View Dependent Claims (41, 42, 43, 44, 45, 46, 47, 48, 49, 50)
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51. An apparatus for finding a value of one or more parameters of a diffracting structure on or under one or more layers wherein a measurement is carried out by directing a polychromatic beam of electromagnetic radiation at said diffracting structure and detecting corresponding intensities or changes in polarization state of a diffraction of said beam at a number of wavelengths from said structure, comprising:
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a system carrying out a measurement of the structure to obtain measured intensities or changes in polarization state of a diffraction from the structure; and
a processor providing one or more sets of intensity or change in polarization state data of the diffraction at the wavelengths corresponding to one or more sets of values of said one or more parameters, wherein the wavelengths of the intensity or change in polarization state data in the one or more sets are chosen as a function of the properties of the one or more layers; and
deriving the value of the one or more parameters of the diffracting structure from the measured intensities or changes in polarization state and the one or more sets of intensity or change in polarization state data. - View Dependent Claims (52, 53, 54)
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55. An apparatus for finding a value of one or more parameters of a diffracting structure wherein a measurement is carried out by directing a polychromatic beam of electromagnetic radiation at said diffracting structure and detecting corresponding intensities or changes in polarization state of a diffraction of said beam at a number of wavelengths from said structure, comprising:
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a system carrying out a measurement of the structure to obtain measured intensities or changes in polarization state of a diffraction from the structure; and
a processor providing one or more sets of intensity or change in polarization state data of the diffraction at the wavelengths corresponding to one or more sets of values of said one or more parameters, wherein density of the intensity or change in polarization state data provided at the wavelengths in the one or more sets is chosen as a function of sensitivity of the intensity or change in polarization state data to changes in wavelengths; and
deriving the value of the one or more parameters of the diffracting structure from the measured intensities or changes in polarization state and the one or more sets of intensity or change in polarization state data. - View Dependent Claims (56)
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57. An apparatus for finding a value related to one or more parameters of a three-dimensional diffracting structure wherein a measurement is carried out by directing a polychromatic beam of electromagnetic radiation at said diffracting structure and detecting corresponding intensities or changes in polarization state of a diffraction of said beam at a number of wavelengths from said structure, comprising:
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a system carrying out a measurement of the structure to obtain measured intensities or changes in polarization state of a diffraction from the structure; and
a data source that supplies a library of sets of intensity or change in polarization state data of the diffraction at the wavelengths, wherein each set corresponds to a set of values of said one or more parameters, and wherein said library is arrived at by means of a mulitmodal process; and
a processor comparing the measured intensities or changes in polarization state to the library to finding a value related to one or more parameters of the three-dimensional diffracting structure.
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58. A computer readable storage device embodying a program of instructions executable by a computer to perform a method for finding a value of one or more parameters of a diffracting structure wherein a measurement is carried out by directing a polychromatic beam of electromagnetic radiation at said diffracting structure and detecting corresponding intensities or changes in polarization state of a diffraction of said beam at a number of wavelengths from said structure to obtain measured changes in polarization state of the diffraction from the structure;
- sad method comprising;
providing a set of change in polarization state data of the diffraction at the wavelengths corresponding to a first set of values of said one or more parameters; and
performing an optimized estimation within a neighborhood of the set of change in polarization state data using said measured changes in polarization state to arrive at a second set of values of the one or more parameters. - View Dependent Claims (59, 60, 61, 62, 63, 64)
- sad method comprising;
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65. A computer readable storage device embodying a program of instructions executable by a computer to perform a method for finding a value of one or more parameters of a diffracting structure wherein a measurement is carried out by directing a polychromatic beam of electromagnetic radiation at said diffracting structure and detecting corresponding intensities or changes in polarization state of a diffraction of said beam at a number of wavelengths from said structure to obtain measured intensities or changes in polarization state of the diffraction from the structure;
- said method comprising;
providing a model to approximate the structure, said model including calculation of eigenvalues;
storing the eigenvalues; and
employing the eigenvalues to obtain said value of said one or more parameters of the diffracting structure from the measured intensities or changes in polarization state. - View Dependent Claims (66, 67, 68, 69, 70, 71, 72, 73, 74)
- said method comprising;
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75. A computer readable storage device embodying a program of instructions executable by a computer to perform a method for finding a value of one or more parameters of a diffracting structure on or under one or more layers wherein a measurement is carried out by directing a polychromatic beam of electromagnetic radiation at said diffracting structure and detecting corresponding intensities or changes in polarization state of a diffraction of said beam at a number of wavelengths from said structure to obtain measured intensities or changes in polarization state of the diffraction from the structure;
- said method comprising;
providing one or more sets of intensity or change in polarization state data of the diffraction at the wavelengths corresponding to one or more sets of values of said one or more parameters, wherein the wavelengths of the intensity or change in polarization state data in the one or more sets are chosen as a function of the properties of the one or more layers; and
deriving the value of the one or more parameters of the diffracting structure from the measured intensities or changes in polarization state and the one or more sets of intensity or change in polarization state data. - View Dependent Claims (76, 77, 78)
- said method comprising;
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79. A computer readable storage device embodying a program of instructions executable by a computer to perform a method for finding a value of one or more parameters of a diffracting structure wherein a measurement is carried out by directing a polychromatic beam of electromagnetic radiation at said diffracting structure and detecting corresponding intensities or changes in polarization state of a diffraction of said beam at a number of wavelengths from said structure to obtain measured intensities or changes in polarization state of the diffraction from the structure;
- said method comprising;
providing one or more sets of intensity or change in polarization state data of the diffraction at the wavelengths corresponding to one or more sets of values of said one or more parameters, wherein density of the intensity or change in polarization state data provided at the wavelengths in the one or more sets is chosen as a function of sensitivity of the intensity or change in polarization state data to changes in wavelengths; and
deriving the value of the one or more parameters of the diffracting structure from the measured intensities or changes in polarization state and the one or more sets of intensity or change in polarization state data. - View Dependent Claims (80)
- said method comprising;
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81. A method for transmitting a program of instructions executable by a computer to perform a process for finding a value of one or more parameters of a diffracting structure wherein a measurement is carried out by directing a polychromatic beam of electromagnetic radiation at said diffracting structure and detecting corresponding intensities or changes in polarization state of a diffraction of said beam at a number of wavelengths from said structure to obtain measured changes in polarization state of the diffraction from the structure;
- said method comprising;
causing a program of instructions to be transmitted to a client device, thereby enabling the client device to perform, by means of such program, the following process;
providing a set of change in polarization state data of the diffraction at the wavelengths corresponding to a first set of values of said one or more parameters; and
performing an optimized estimation within a neighborhood of the set of change in polarization state data using said measured changes in polarization state to arrive at a second set of values of the one or more parameters. - View Dependent Claims (82, 83, 84, 85, 86, 87)
- said method comprising;
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88. A method for transmitting a program of instructions executable by a computer to perform a process for finding a value of one or more parameters of a diffracting structure wherein a measurement is carried out by directing a polychromatic beam of electromagnetic radiation at said diffracting structure and detecting corresponding intensities or changes in polarization state of a diffraction of said beam at a number of wavelengths from said structure to obtain measured intensities or changes in polarization state of the diffraction from the structure;
- said method comprising;
causing a program of instructions to be transmitted to a client device, thereby enabling the client device to perform, by means of such program, the following process;
providing a model to approximate the structure, said model including calculation of eigenvalues;
storing the eigenvalues; and
employing the eigenvalues to obtain said value of said one or more parameters of the diffracting structure from the measured intensities or changes in polarization state. - View Dependent Claims (89, 90, 91, 92, 93, 94, 95, 96, 97)
- said method comprising;
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98. A method for transmitting a program of instructions executable by a computer to perform a process for finding a value of one or more parameters of a diffracting structure on or under one or more layers wherein a measurement is carried out by directing a polychromatic beam of electromagnetic radiation at said diffracting structure and detecting corresponding intensities or changes in polarization state of a diffraction of said beam at a number of wavelengths from said structure to obtain measured intensities or changes in polarization state of the diffraction from the structure;
- said method comprising;
causing a program of instructions to be transmitted to a client device, thereby enabling the client device to perform, by means of such program, the following process;
providing one or more sets of intensity or change in polarization state data of the diffraction at the wavelengths corresponding to one or more sets of values of said one or more parameters, wherein the wavelengths of the intensity or change in polarization state data in the one or more sets are chosen as a function of the properties of the one or more layers; and
deriving the value of the one or more parameters of the diffracting structure from the measured intensities or changes in polarization state and the one or more sets of intensity or change in polarization state data. - View Dependent Claims (99, 100, 101)
- said method comprising;
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102. A method for transmitting a program of instructions executable by a computer to perform a process for finding a value of one or more parameters of a diffracting structure wherein a measurement is carried out by directing a polychromatic beam of electromagnetic radiation at said diffracting structure and detecting corresponding intensities or changes in polarization state of a diffraction of said beam at a number of wavelengths from said structure to obtain measured intensities or changes in polarization state of the diffraction from the structure;
- said method comprising;
causing a program of instructions to be transmitted to a client device, thereby enabling the client device to perform, by means of such program, the following process;
providing one or more sets of intensity or change in polarization state data of the diffraction at the wavelengths corresponding to one or more sets of values of said one or more parameters, wherein density of the intensity or change in polarization state data provided at the wavelengths in the one or more sets is chosen as a function of sensitivity of the intensity or change in polarization state data to changes in wavelengths; and
deriving the value of the one or more parameters of the diffracting structure from the measured intensities or changes in polarization state and the one or more sets of intensity or change in polarization state data. - View Dependent Claims (103)
- said method comprising;
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104. An apparatus for finding and using a value of one or more parameters of a diffracting structure of a sample wherein a measurement is carried out by directing a polychromatic beam of electromagnetic radiation at said diffracting structure and detecting corresponding data of a diffraction of said beam from said structure, comprising:
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a system carrying out a measurement of the structure to obtain measured data of a diffraction from the structure; and
a processor using said measured data to arrive at a set of value(s) of the one or more parameters; and
an instrument processing the sample according to one or more processing parameters, said instrument altering said one or more processing parameters in response to the set of value(s). - View Dependent Claims (105, 106, 107)
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108. A method for finding and using a value of one or more parameters of a diffracting structure of a sample wherein a measurement is carried out by directing a polychromatic beam of electromagnetic radiation at said diffracting structure and detecting corresponding data of a diffraction of said beam from said structure, comprising:
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carrying out a measurement of the structure to obtain measured data of a diffraction from the structure; and
using said measured data to arrive at a set of value(s) of the one or more parameters; and
processing the sample according to one or more processing parameters, said processing including altering said one or more processing parameters in response to the set of value(s). - View Dependent Claims (109)
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110. A method for finding a value of one or more parameters of a diffracting structure wherein a measurement is carried out by directing a polychromatic beam of electromagnetic radiation at said diffracting structure and detecting corresponding changes in polarization state of a diffraction of said beam at a number of wavelengths from said structure, comprising:
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carrying out a measurement of the structure to obtain measured intensity or change in polarization state of a diffraction from the structure;
providing a set of intensity or change in polarization state data of the diffraction at the wavelengths corresponding to a first set of values of said one or more parameters, said providing including obtaining a coarse library of sets of diffraction data at different wavelengths with corresponding sets of values of the parameters at a coarse resolution; and
performing an optimized estimation within a neighborhood of the set of intensity or change in polarization state data using said measured change in polarization state to arrive at a second set of values of the one or more parameters at a resolution finer than the coarse resolution. - View Dependent Claims (111, 112, 113, 114, 115, 116, 117)
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118. An apparatus for finding a value of one or more parameters of a diffracting structure wherein a measurement is carried out by directing a polychromatic beam of electromagnetic radiation at said diffracting structure and detecting corresponding changes in polarization state of a diffraction of said beam at a number of wavelengths from said structure, comprising:
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a system carrying out a measurement of the structure to obtain measured intensity or change in polarization state of a diffraction from the structure;
a processor providing a set of intensity or change in polarization state data of the diffraction at the wavelengths corresponding to a first set of values of said one or more parameters, said processor obtaining a coarse library of sets of diffraction data at different wavelengths with corresponding sets of values of the parameters at a coarse resolution, and performing an optimized estimation within a neighborhood of the set of intensity or change in polarization state data using said measured change in polarization state to arrive at a second set of values of the one or more parameters at a resolution finer than the coarse resolution. - View Dependent Claims (119, 120, 121, 122, 123, 124, 125)
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Specification