Position detection apparatus and exposure apparatus
First Claim
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1. An exposure apparatus comprising:
- a projection optical system for projecting a pattern onto a substrate;
a chuck on which the substrate is placed; and
a position detection section for detecting a position of a mark on the substrate placed on said chuck,wherein the substrate is aligned on the basis of a detection result by said position detection section, and then, the substrate is exposed using the pattern,said position detection section comprising;
an extraction section for observing the mark and extracting a plurality of edge information of the mark in correspondence with attribute information representing features of the edge information, respectively;
a position determination section for comparing each edge information with one of a plurality of templates, which is specified by attribute information corresponding to the edge information and evaluating a plurality of comparison results obtained by comparison to determine the position of the mark; and
a control section for changing at least one of an extraction rule in said extraction section and an evaluation rule in said position determination section on the basis of the plurality of comparison results by said position determination section and causing said extraction section and said position determination section to execute processing again.
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Abstract
A position detection apparatus for detecting a position of a mark on an object includes a camera which captures an image of the mark, an extraction section which extracts a plurality of edge positions of the mark based on a signal derived from the image of the mark, each of the edge positions being associated with a combination of a direction and a polarity of the signal, and a determination section which determines a position of the mark, by comparing each of the plurality of extracted edge positions with a corresponding one of templates prepared for the respective combinations.
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Citations
19 Claims
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1. An exposure apparatus comprising:
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a projection optical system for projecting a pattern onto a substrate; a chuck on which the substrate is placed; and a position detection section for detecting a position of a mark on the substrate placed on said chuck, wherein the substrate is aligned on the basis of a detection result by said position detection section, and then, the substrate is exposed using the pattern, said position detection section comprising; an extraction section for observing the mark and extracting a plurality of edge information of the mark in correspondence with attribute information representing features of the edge information, respectively; a position determination section for comparing each edge information with one of a plurality of templates, which is specified by attribute information corresponding to the edge information and evaluating a plurality of comparison results obtained by comparison to determine the position of the mark; and a control section for changing at least one of an extraction rule in said extraction section and an evaluation rule in said position determination section on the basis of the plurality of comparison results by said position determination section and causing said extraction section and said position determination section to execute processing again. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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19. An exposure apparatus comprising:
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a projection optical system for projecting a pattern onto a substrate; a chuck on which the substrate is placed; and a position detection section for detecting a position of a mark on the substrate placed on said chuck, wherein the substrate is aligned on the basis of a detection result by said position detection section, and then, the substrate is exposed using the pattern, said position detection section comprising; an extraction section for observing the mark and extracting edge information of the mark; a position determination section for comparing the edge information with a template and evaluating a comparison result to determine the position of the mark; and a control section for changing at least one of an extraction rule in said extraction section and an evaluation rule in said position determination section on the basis of the evaluation result by said position determination section and causing said extraction section and said position determination section to execute processing again.
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Specification